近年來，由於光電半導體應用的快速發展，與其相關的產業不斷被研發出，主要的光電產品如太陽能電池、平面顯示器、發光二極體、光波導元件等。在光電元件的應用中導電率及透明度皆為重要考量因素，因玻璃並無法導電，故加上透明導電金屬氧化物(Transparent conductive oxide, TCO)即可作為一個很好的透明導電基板材料。
本論文與廠商合作製作完成一5.5代垂直式MOCVD(Metal-organic Chemical Vapor Deposition)鍍膜設備，配合TwinCAT (The Windows Control and Automation Technology)工業自動化控制軟體達到自動化，以二乙基鋅(DEZn)及水(H2O)作為前驅物於玻璃上沉積氧化鋅薄膜，提供給太陽能電池廠商透明導電極。
使用COMSOL Multiphisics模擬軟體，將設備實體腔體之幾何使用3D 繪圖軟體Inventor繪製建立模型，載入COMSOL模擬後，得知濃度、壓力、氣流速度分布，分析各實驗參數對於與薄膜均勻性的影響，將MOCVD設備鍍膜成品與模擬結果相比較改善製程參數。

In recent years, due to the rapid development of optoelectronic semiconductor material, it’s related research with applications is proposed, such as the main optoelectronic products of solar cells, flat-panel displays, light emitting devices and waveguide devices, etc. Conductivity and transparency are important considerations in the application of the optoelectronics. Since the glass is not conductive, so a good transparent conductive substrate material needs to be coated with the transparent conductive oxide.
In this thesis, a 5.5-generation vertical MOCVD(Metal-Organic Chemical Vapor Deposition) coating equipment has been built in cooperation with the industrial manufacturers together. With the help of TwinCAT(The Windows Control And Automation Technology), DEZn and H2O as precursors, the MOCVD is automafed to deposite zinc oxide thin films on glass, to provide transparent conductive electrodes of ZnO to solar cell glass substrate.
Using the simulation software of COMSOL Multiphysics and 3D CAD program of Inventor the concentration, pressure and velocity distribution of precursors are analyzed various experimental parameters for the deposition rate and film uniformity. Appling MOCVD equipment the sample has been coated with ZnO and compared with simulation results. This work supplies a basic data and simulation to improve the process parameters of MOCVD.

致謝 i
摘要 ii
Abstract iii
目錄 iv
表次 vi
圖次 vii
第一章 緒論 1
第二章 文獻回顧 2
2.1 氧化鋅特性 2
2.2 氧化鋅鍍膜製程 4
2.3 二乙基鋅特性 5
第三章 多重物理耦合軟體模擬 7
3.1多重物理量耦合模擬軟體操作介面 7
3.2 COMSOL模擬結果 8
3.2.1 模擬Shower噴氣口至玻璃基板不同距離下速度分布 9
3.2.2 模擬Shower噴氣口至玻璃基板不同距離下壓力分布 12
3.2.3 模擬Shower噴氣口至玻璃基板不同距離下濃度分布 15
第四章 MOCVD設備製作 18
4.1腔體結構 20
4.2支撐骨架 22
4.3 Shower氣體管路結構 23
4.4 載盤電熱線配置 25
4.5洗滌塔廢氣處理系統 26
第五章TwinCAT 29
5.1 TwinCAT自動控制軟體 29
5.1.1 PID控制方式 30
5.1.2 PWM原理 32
5.2 TwinCat 工業自動控制人機介面 33
5.3 TwinCAT MOCVD圖形化操作介面 36
第六章 製程結果與討論 39
6.1 機台操作流程 39
6.2 實驗製程條件及薄膜分析結果 40
6.3 結果與討論 43
第七章 結論 44
參考文獻 45

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