本研究提出一種創新光阻轉印微透鏡陣列製作方法，利用曝光的方式直接在SU-8 厚膜材料上定義出兩種作用區域。SU-8 是一種負型光阻，遭受曝光後會產生硬化其玻璃轉換溫度可達攝氏200度以上，然在曝光之前其玻璃轉換溫度僅為55度，在當溫度升高至玻璃轉換溫度時SU-8材料將從如玻璃般之固態轉變為如蜂蜜般之高黏度液體。因此藉由曝光定義的方式，即可將SU-8這一種材料定義成有兩種截然不同性質之區域。而本研究將受到曝光之區域作為微透鏡陣列之模板印章，未受到曝光之部分作為墨水，當基板加溫到高於玻璃轉換溫度時把所形成之印章壓印到基板上，即可在基板上獲得一微透鏡陣列。不同於以往製程技術，本研究所提出之轉印製成可將微透鏡陣列形成於現有元件上而不需額外支基板支撐更具有降低整體元件厚度與體積之果效。
而本研究也提出了利用SU-8本身之特性，利用溫度在透鏡生產時或生產後加以調變所生產出之透鏡曲率，與靜電拉伸的方式更進一步的去產生非球狀與更短焦距之透鏡陣列，更加提升所產生之透鏡陣列之光學性能範圍。然而藉由上述技術多半只能於單一基板上產生具相同性質之微透鏡陣列，因此本研究更提出一製程技術於單一基板上製造不同曲率甚至傾斜方向之透鏡陣列。此技術為運用所開發之低成本灰階光罩製程，在電極上形成一具梯度分布之介電質層，以達成改變電極間靜電場強度分布之目標，最後成功的以此漸變強度之靜電場完成不同曲率與傾斜方向之透鏡陣列製造。
本研究亦提出一創新製程技術用於光子晶體光纖式感測器製造，一微小化之高電場感測器成功的被開發出來，用於未來能了解前述複雜靜電場微透鏡調控技術之真實電場分布情況，而本製程技術在未來更可廣泛用於光纖式元件之製造。

This research reports a simple and novel method to fabricate microlens arrays by soft stamping the unexposed SU-8 photoresist. A SU-8 based stamp composed of micro-nozzle arrays with a reservoir structure on a glass substrate is first fabricated using a process of dosage control exposure. The unexposed SU-8 is then encapsulated in the cross-linked SU-8 shell and was used as the “ink” for the stamping process. The proposed SU-8 microlens array is then formed by stamping the formed SU-8 structure on a bare glass substrate at a temperature higher than the glass transition temperature (Tg) of the unexposed SU-8 microlens array. Lenses with various radii of curvature can be formed by controlling the working temperature during the stamping process.
In addition, this work also employed a simple electric static pulling scheme to manipulate the fabricated lenses profiles. Aspherical SU-8 microlens arrays with a wide range of tunable focal lengths were fabricated with this approach. Furthermore, we develop an advanced localize E-field control technique to fabricate microlenses with various focus length and microlenses with different tilt angle in a single lens array sheet. A novel grayscale mask fabrication technique is also proposed first. This low cost and rapid method is applied on stepwise and continuous tilt plane fabrication for produces a gradually changed E-field. Hetero axes and focus lengths microlenses are fabricated with this approach. In order to farther understand the real E-field distribution, a novel PCF based E-field sensor fabrication technique is also proposed. This technique also shows the potential on various PCF based devices fabrications.

論文審定書 I
誌謝 II
中文摘要 III
Abstract IV
Table of Contents V
List of Figures VII
List of Tables XIV
Nomenclature XV
Abbreviations XVII
Chapter 1 Introduction 1
1.1 Background 1
1.2 Current MLA fabrication techniques 2
1.3 MLA turning after formation 5
1.4 MLA with hetero axes 7
1.5 Motivation and Objective 10
Chapter 2 Materials and Methods 14
2.1 SU-8 basic properties 16
2.2 Glass transition in amorphous polymers 20
2.3 Surface properties of a droplet on a solid surface 27
2.4 Taylor cone effect of a droplet in an electrical field 29
2.5 E-field distribution control between two electrodes 33
Chapter 3 Fabrication 40
3.1 Stamping method 41
3.1.1 SU-8 photoresist application 41
3.1.2 Soft-baking process 42
3.1.3 Exposure 43
3.1.4 Second exposure - Sidewall formation 44
3.1.5 SU-8 mold stamping 45
3.1.6 Demolding 46
3.2 Microlens array post stamping modification 48
3.2.1 Microlens reflow 48
3.2.2 Microlens electrostatic pulling 49
3.3 E-field control dielectric layer fabrication 51
3.3.1 Introduction of gray scale mask 51
3.3.2 The fabrication method of low cost grayscale mask 54
3.3.3 Results of grayscale mask fabrication 57
3.3.4 Results of 3-D structure fabrication 60
Chapter 4 Results of MLA fabrication 64
4.1 Results of stamping fabrication 64
4.2 Post stamping reflow adjusting 72
4.3 Post stamping electrostatic pulling adjusting 75
4.4 Hetero axes and focus lengths microlenses 81
Chapter 5 PCF based E-field sensor fabrication 85
5.1 Motivation and Background of PCF 85
5.2 The proposed PCF cross-section modification method 87
5.3 PCF selective sealing and filling process 89
5.4 Results and discussion 91
Chapter 6 Conclusions and Suggestions 100
6.1 Conclusions 100
6.2 Future perspectives 102
Reference 105
Publication list 115

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