本文中，提出以五氧化二鉭(Ta2O5)應用在光子積體電路的構想。Ta2O5是一種高穿透、低損耗的介電材料，可於高真空且無毒的環境條件下使用射頻磁控濺鍍法在石英玻璃的基板上製備，經由X光繞射儀(X-ray diffraction)系統確認我們所製備之Ta2O5薄膜為非結晶薄膜。此外，我們使用傳統黃光微影與電子束微影的方法來設計製作單模操作的光波導結構。然而，使用傳統黃光微影所製備的波導有超過12.4dB/cm的傳輸損耗，其過量的損耗可以歸咎於波導側壁不良的糙程度所引發的散射現象。
另一方面，我們使用電子束微影與三氟甲烷(CHF3)電漿蝕刻的製程來改善Ta2O5波導的傳輸損耗。單獨500m直線波導與搭配直徑300m微環(microrings)的耦合量測分別得到的插入損耗(insertion losses)為10.4dB 和11.7dB；此外，直線波導與微環在1.1m的耦合間距(coupling spacing)可量測得到超過6000的品質因子(quality factor)。

In this thesis, Tantalum pentoxide (Ta2O5) is proposed for photonic integrated circuits. Ta2O5 is a high transmittance and low-loss dielectric material. It was prepared in high vacuum and non-toxic environment using the RF-magnetron sputtering system on quartz substrates. The deposited Ta2O5 thin films were amorphous and were confirmed by X-ray diffraction system. In addition, the single-mode straight Ta2O5 waveguides were patterned by conventional photolithography method and e-beam lithography technique. However, propagation losses larger than 12.4dB/cm were obtained for the waveguides fabricated based on conventional photolithography method. The excess propagation losses could be attributed to optical scattering caused by poor sidewall roughness of the waveguides.
On the other hand, Ta2O5 waveguides fabricated by e-beam lithography technique and CHF3 plasma etching exhibited a better sidewall roughness. The insertion losses of the single straight waveguide and the straight waveguide coupled with the micro-ring (300μm in diameter) are 10.4dB and 11.7dB, respectively. Further, the quality factor of the ring larger than 6,000 was obtained at a coupling spacing of 1.1μm.

中文審定書................................................................................................. i
英文審定書................................................................................................ ii
誌謝 ........................................................................................................... iii
摘要 ........................................................................................................... iv
Abstract ...................................................................................................... v
目錄 ........................................................................................................... vi
圖目錄 ..................................................................................................... viii
表目錄 ....................................................................................................... xi
第 一 章 導論 .......................................................................................... 1
1-1 前言 ................................................................................................................ 1
1-2 光纖與光波導 ................................................................................................ 3
1-3 研究動機 ........................................................................................................ 5
第 二 章 製程材料與儀器介紹 .............................................................. 6
2-1 五氧化二鉭 ( Tantalum Pentoxide - Ta2O5 ) ................................................. 6
2-2 射頻磁控濺鍍系統 ........................................................................................ 8
2-3 熱蒸鍍系統 .................................................................................................. 10
2-4 曝光機 .......................................................................................................... 11
2-5 電子顯微鏡 .................................................................................................. 12
2-6 反應式離子蝕刻機 ...................................................................................... 13
2-7 感應耦合式蝕刻機 ...................................................................................... 14
2-8 晶圓切割機 .................................................................................................. 15
2-9 研磨機 .......................................................................................................... 16
2-10 量測儀器 .................................................................................................... 16
2-10-1薄膜特性分析儀 .............................................................................. 16
2-10-2X光繞射儀 ................................................................................... 17
2-10-3光纖耦合量測系統 ......................................................................... 18
第 三 章 實驗步驟與量測方法 ............................................................ 19
3-1 製程步驟 ...................................................................................................... 19
3-1-1 Ta2O5薄膜濺鍍 ............................................................................... 19
3-1-2 Cr 薄膜蒸鍍 ................................................................................... 21
3-1-3 黃光微影 ........................................................................................... 23
3-1-4 電子束微影 ....................................................................................... 24
3-1-5 濕蝕刻 ............................................................................................... 27
3-1-6 ICP乾蝕刻Cr ................................................................................. 27
3-1-7 RIE乾蝕刻Ta2O5 ........................................................................... 28
3-1-8 SiO2薄膜濺鍍 ................................................................................. 29
3-1-9 UV膠黏著石英層 .......................................................................... 30
3-1-10 切割 ................................................................................................. 30
3-1-11 研磨 ................................................................................................. 31
3-2 量測方法 ...................................................................................................... 33
3-2-1 長直波導傳輸損耗量測 ................................................................... 33
3-2-2 環形共振腔品質因子量測 ................................................................ 34
3-3 實驗流程 ...................................................................................................... 36
第 四 章 結果與討論 ............................................................................ 39
4-1 Ta2O5薄膜檢測 .......................................................................................... 39
4-1-1 基本性質與晶相結構 ....................................................................... 39
4-1-2 非線性折射率 ................................................................................... 41
4-2 長直波導傳輸損耗 ...................................................................................... 43
4-3 微環品質因子 .............................................................................................. 45
第 五 章 結論與未來展望 .................................................................... 50
參考文獻 ................................................................................................... 52

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