本論文以發光二極體（light-emitting diode, LED）取代傳統汞燈做為光源；以幾何光學及反射定律等基礎，在三维座標系中建立系统模型，設計出準直反射曲面，並結合橢圓曲面達到補償均光之效果。將此設計應用在高科技電子產業中佔有重要地位的曝光系統，達到系統之規格且符合目前環保綠能的趨勢；以及應用在波長調變式表面電漿共振即時感測器，有效縮減系統體積及成本，並提高檢測之訊號強度。根據光學模擬軟體之模擬結果可得，在直徑12 cm之曝光區域，平均照度約17.60 mW/cm2、均勻度為93.28 %、光半角在± 2.2˚內，且不會因工作高度不同而有太大改變。以CNC銑床加工出曲面並鍍上鋁為反射層，利用照度計及光譜儀測量其實際出光情形。根據實際量測的結果，曝光系統之平均照度約16.11 mW/cm2、均勻度為93.49 %、光半角在± 2.5˚內，符合模擬之結果，且實際曝光線寬能達到5 μm；表面電漿共振感測器之訊號強度提升了約9%，證明本文設計之可行性。

In this thesis, light-emitting diode（LED）is applied to replace the halogen lamp. Based on geometrical optics and reflection law, a module of collimated reflective curved surface is established in coordinate system. An additional elliptic reflective curved surface is combined with collimated surface to enhance the uniformity of illumination. This design can be used in exposure system, which plays an important role in hi-tech industry, and not only meet the system specification but also keep up with trend of environmental protection. Besides, the size and cost of wavelength modulation surface plasmon resonance（SPR）sensor can be reduced significantly by using this design, and the signal strength can be improved as well. According to the result of simulation, the average irradiance is about 17.60 mW/cm2, the uniformity is about 93.28 % and the half-angle is in ± 2.2˚. Besides, these results vary little with different working heights. Computer numerical control（CNC）milling machine was used to fabricate the curved surface, illuminometer and spectrum were applied to measure the actual emission results. According to the measurement result, the average irradiance is about 16.11 mW/cm2, the uniformity is about 93.49 %, and the collimation half angle is in ± 2.5˚, respectively. The measurement result is consistent with the simulation’s. The critical dimension of actual exposure can reach 5 μm. The signal of SPR sensor is enhanced about 9 %, it shows the feasibility of the thesis.

致謝 i
摘要 ii
Abstract iii
目錄 iv
圖目錄 vii
表目錄 xiv
第一章 緒論 1
1.1 前言 1
1.2 研究背景 1
1.3 研究動機與目的 1
1.4 文獻回顧 2
1.5 本文架構 6
第二章 理論基礎 7
2.1 幾何光學理論 7
2.1.1 發光點 7
2.1.2 光線概念 7
2.1.3 光線之折射現象 8
2.1.4 光線之反射及全反射現象 9
2.1.5 平行光 10
2.2 光度學與輻射度量學 10
2.2.1 通量 11
2.2.2 亮度 12
2.2.3 強度 13
2.2.4 照度 14
2.3 表面電漿共振簡介 14
2.3.1 電磁學理論 16
2.3.2 介電常數 16
2.3.3 折射率 17
2.3.4 吸收係數 19
2.3.5 橫向電磁波 19
2.3.6 Lorentz模型（諧振子模型） 21
2.3.7 電磁波在金屬中之傳導 23
2.3.8 表面電漿波之共振條件 25
2.3.9 色散關係 28
2.3.10 表面電漿波激發方式 29
2.3.11 檢測調變系統 33
第三章 實驗步驟與架構 35
3.1 研究流程 35
3.2 均光透鏡建構 37
3.2.1 設立裸光光源之光場函數 37
3.2.2 微分幾何 37
3.2.3 坐標系選取及向量表達式 39
3.2.4 司乃耳定律 41
3.2.5 能量守恒 41
3.2.6 常微分方程初值問題 42
3.2.7 均光透鏡成形 44
3.3 雙反射曲面建構 44
3.3.1 平行光反射曲面設計 44
3.3.2 橢圓反射曲面設計 46
3.3.3 雙反射曲面成形 47
3.3.4 光學模擬參數設定 49
3.4 表面電漿共振實驗 51
3.4.1 金膜樣本之製作 51
3.4.2 波長調變檢測 53
3.4.3 系統架構 54
3.5 實驗設備介紹 55
第四章 結果與討論 59
4.1 均光透鏡及雙反射曲面模擬比較 59
4.1.1 單顆LED模擬 59
4.1.2 均光透鏡模擬 61
4.1.3 雙反射曲面模擬 64
4.1.4 模擬曝光能力比較 69
4.2 曝光系統建構與量測 72
4.2.1 反射曲面成型與系統建構 72
4.2.2 實際曝光結果 79
4.3 表面電漿共振實驗 93
4.3.1 表面電漿檢測模擬 96
4.3.2 實驗結果比較 99
第五章 結論與展望 100
5.1 結論 100
5.2 未來展望 101
參考文獻 102

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