近十年來，材料的非線性特性已被廣泛的應用在積體集成光學中，例如全光調變、頻率光梳、四波混頻等。本研究中，由於五氧化二鉭(Ta2O5)相較於氮化矽(Si3N4)與二氧化矽(SiO2)具有高非線性折射率潛能，因此我們期望透過製備高品質五氧化二鉭微環形共振腔結構來達到四波混頻光參量震盪(Four-wave mixing optical parametric oscillation,FWM OPO)。
首先，我們利用反應式射頻磁控濺鍍成長五氧化二鉭薄膜，藉由650度恆溫1小時的後退火處理，得到低粗糙度且非晶相的緻密表面。其薄膜折射率(Refractive index, n)為2.1，並具有低消光係數(Extinction coefficient, k)。
接著我們透過電子束微影、乾蝕刻等步驟製備出導光層為700 x 400nm2的U型波導與直徑100m大小的微環形共振腔，波導間距(gap)設計在400nm~1300nm。最後我們在量測系統上輸入1.55m為中心波長的可調式雷射(Tunable laser)至波導，並分析環形共振腔造成的穿透率變化，結果顯示最佳品質因子(Quality factor, Q)出現在間距1100nm，其值達85451，共振腔傳播損耗係數(α)為0.85cm-1，比所有文獻上的Ta2O5共振腔之Q值都要來的大。
此外,我們透過商用數值模擬軟體(Rsoft)，針對五氧化二鉭光波導的色散曲線進行設計，透過不同導光層的尺寸大小改變光場分布，進而影響波導的色散曲線，設計出正的波導色散曲線以抵消材料色散特性，找出一條接近零色散的曲線來達到色散補償效應。藉由以上實驗配合模擬的成果,預期在五氧化二鉭光參量震盪上能有更進一步的研究成果。

Recently, nonlinearity of material has been demonstrated in photonic integrated circuits, including all optical modulation, frequency combs, and four-wave mixing. Typically, materials with high nonlinearity, device with high optical quality and dispersion compensation are important issue. In this thesis, using high optical quality Ta2O5 as waveguide material, high Q micro-ring with U- shaped channel waveguide was developed. The Q as high as 85000 was achieved when the diameter of micro-ring resonator and the gap between the waveguide and ring cavity are 100 m and 1100 nm, respectively. The corresponding unloaded Q is over 100000. Additionally, the chromatic dispersion of Ta2O5 waveguide has been theoretically investigated. To compensate the material dispersion from Ta2O5, various dimension of the waveguide with air or SiO2 cladding were analyzed. The preliminary result shows that waveguide with dimension of TE1000×800nm2 and cladding of air exhibit the anomalous dispersion. Meanwhile, the estimated flat and near-zero dispersion of chromatic dispersion curve is expected to optimize the conversion efficiency as well as conversion bandwidth of FWM-OPO process in the Ta2O5 waveguide.

目錄
中文審定書 i
英文審定書 ii
致謝 iii
摘要 iv
Abstract v
目錄 vi
圖次 viii
表次 xii
第一章 緒論 1
1.1 非線性波導簡介 1
1.2 波導材料回顧 3
1.3 五氧化二鉭(Ta2O5)光電元件應用 7
1.4 研究動機 8
1.5 論文架構 12
第二章 元件製程之優化與量測方法 13
2.1 實驗流程 13
2.2 微環形共振腔與波導幾何設計 14
2.3 元件製程 15
2.3.1 薄膜沉積 16
2.3.2 熱退火(Annealing) 22
2.3.3 薄膜之光學特性量測 23
2.3.4 電子束微影(E-beam Lithography) 24
2.3.5 乾蝕刻(ICP-RIE) 30
2.3.6 電漿輔助化學氣相沉積(PECVD) 33
2.3.7 切割 34
2.3.8 研磨 35
2.4 量測方式 36
2.4.1 環形共振腔與品質因子(Quality factor) 37
2.5 章節結論 47
第三章 五氧化二鉭波導色散計算 48
3.1 色散補償議題 48
3.2 實驗動機 50
3.3 波導幾何設計 51
3.4 色度色散(Chromatic Dispersion, CD)模擬 52
3.4.1 材料特性 53
3.4.2 波導設計 54
3.4.3 數值模擬(Rsoft)計算 54
3.4.4 色度色散(Chromatic dispersion)計算 55
3.5 波長相依性 57
3.6 章節結論 58
第四章 結論與未來展望 59
4.1 結論 59
4.2 未來展望 61
參考文獻 62

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