高科技產業對製程之環境要求越來越嚴苛，傳統大空間（ballroom）的生產型態已逐漸不能符合製程對環境的要求。然而全面之高潔淨度均勻層流流場之建立並無法完全滿足個別製程之特殊環境需求，因此，採用微環境之設計方式以滿足個別製程之環境控制需求並且藉以節省能源消耗，此方式漸漸地成為高科技產業製程之主流。

本研究之主要目標為以現有射出機之機械架構，建立為達潔淨度等級Class 1,000~10,000 之潔淨室設計研究。同時，為配合現有潔淨室技術，則對於射出機之設計所可能需有之修改方向，進行分析以具體落實。其主要目標包括四大項：

1.以現有潔淨室射出機之架構，進行鎖模單元部分之流場與潔淨度之動態模擬。

2.針對射出機之可能污染源進行其發塵量、對潔淨度影響之分析。

3.以現有射出機架構之Class 1,000潔淨成形潔淨室（機器周圍環境）進行初步分析。

4.潔淨射出機（部份或整機置於潔淨室）為符合潔淨要求所需之必要設計修改方向之擬定。

研究結果顯示，作為周圍區與清淨製程區的緩衝範圍，可以有效的避免微環境開啟時與外在環境之交叉污染；而製程區開口之高度也顯著的影響流場紊流強度與微粒子濃度的擴散範圍；操作人員所造成的污染也可有效的隔絕，其均可作為日後設計之參考依據。而數值模擬可瞭解微環境內之氣流動態，也可做為改善流場的預測模式。

High technology industries have stringent on clean room environment. Traditional ballroom type clean room can’t meet the requirement in many cases. The uni-directional laminar ballroom type cleanroom is can’t fulfill such requirement. The adoption of Mini-Environment technology is becoming the mainstream of the environment control technology for high technology industries process.

It is the goal of this project to simulate and design the air flow pattern, in using the current injection machine as a model, to achieve the cleanliness of class 1,000 – 10,000. There are four major steps in achieving this goal, Namely:

1、The dynamic 3D CFD simulation of the flow pattern of the clean bench.
2、The evaluation of the pollution source and its impact on the overall cleanliness
3、The basic design of the class 1,000 cleanroom for this machine
4、The modification necessary to achieve this goal through design iterations.

The results of this research are useful in the understanding of the flow characteristics in a mini-environment. The buffer zone of laminar flow was found to be effective to avoid cross contamination with the outside environment during door opening. The height of the processing opening of the mini-environment is found to be an important factor on the flow turbulent intensity and particle concentration. Concentration due to an operator can also be reduced by this buffer zone. The numerical techniques developed can also be used as numerical models in future studied.

摘要………………………………………………………………………… Ⅰ
摘要（英文）……………………………………………………………… Ⅱ
目錄………………………………………………………………………… Ⅲ
圖目錄……………………………………………………………………… Ⅴ
表目錄……………………………………………………………………… Ⅸ
符號說明…………………………………………………………………… Ⅹ

第一章、緒論
1-1 研究動機與目的……………………………………………… … 1
1-2 文獻回顧……………………………………………………… … 3
1-3 研究內容與架構………………………………………………… 4

第二章、油壓塑膠射出成型機之工作程序與潔淨艙污染控制之分析
2-1 油壓塑膠射出成型機之工作流程…………………………… … 6
2-2 油壓塑膠射出成型機之發塵來源及其粒子特色…………… … 10
2-3 油壓塑膠射出成型機污染來源濃度…………………….……… 13
2-4 潔淨艙內之污染源控制理論分析…………………………… … 21
2-5 潔淨艙之氣流分析方法與量測……………………………… … 30

第三章、五種油壓塑膠射出成型機之艙間潔淨度電腦模擬結果分析結果
3-1 五種潔淨艙之尺寸與電腦模擬物理模型之建立……….……… 36
3-2 型式一：機台及輸送空間各自設置潔淨室之氣流組織分析… 38
3-3 型式二：微環境潔淨室（mini-environment）之氣流組織分析
………………………………………………….………………. 45
3-4 型式三：潔淨櫃系統（clean bench or clean tunnel）之氣流
組織分析……………………………………………… 52
3-5 型式四：局部潔淨艙設計（兩具FFU）之氣流組織分析.…. 59
3-6 型式五：局部潔淨艙設計(單具FFU) 之氣流組織分析….…. 66








第四章、微環境之數值模擬分析結果
4-1 微環境之物理模型………………………………………….. … 73
4-2 實驗模型之模擬研究………………………………………….. 74
4-3 Case1：Vamb= 0.15(m/s)，Vprocess= 0.4(m/s)，無緩衝區，無操作員，開口=0.18（m）…………………………………………. 75
4-4 Case2：Vamb= 0.15(m/s)，Vprocess= 0.4(m/s)，無緩衝區，無操作員，開口=0.48（m）…………………………………………. 80
4-5 Case3：Vamb= 0.15(m/s)，Vprocess= 0.4(m/s)，緩衝區的風速=0.54m/s，無操作員，開口=0.18（m）…………………… 84
4-6 Case4：Vamb= 0.15(m/s)，Vprocess= 0.4(m/s)，緩衝區的風速=0.54m/s，無操作員，開口=0.48（m）…………………… 87
4-7 Case5：Vamb= 0.15(m/s)，Vprocess= 0.4(m/s)，緩衝區的風速=0.54m/s，操作員（0.3*0.3*1.8m）*1，開口=0.18（m）… 91
4-8 Case6：Vamb= 0.15(m/s)，Vprocess= 0.4(m/s)，緩衝區的風速=0.54m/s，操作員（0.3*0.3*1.8m）*1，開口=0.48（m）… 95
4-9 小結....................................................................................... 98

第五章、結論與建議………………………………………………………. 99

參考文獻.............................................................................................. 103

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