本論文首次做出符合準抗共振反射條件的低損耗抗共振反射波導( Polyimide/Ta2O5/SiO2 waveguide )，波導元件的製作上包含了有機與介電薄膜的技術，是在矽基板上製作包含了有高分子材料的成長、五氧化二鉭的濺鍍與二氧化矽的沉積，此波導針對1.3μm波長量測得到在TE極化傳輸損耗為0.4dB/cm、TM極化傳輸損耗為1.5dB/cm。同時我們也製作了由Polyimide/Ta2O5/Polyimide所組成的抗共振反射波導來做比較。
此外也以EDP溶液對矽基板做非等向性蝕刻形成V型凹槽，藉以了解用室溫下濺鍍的Ta2O5當保護層時，其側蝕的現象以及粗糙度的變化情形。在當蝕刻溫度為120℃時，有最小的側蝕1.6μm。

A low-loss polyimide/Ta2O5/SiO2 antiresonant reflecting optical waveguide (ARROW) at quasi-antiresonant condition is presented for the first time. The ARROW device was fabricated using both the organic and dielectric thin film technologies. It consisted of the fluorinated polyimide, tantalum pentoxide (Ta2O5) and silicon dioxide (SiO2) hybrid layers deposited on a Si substrate. For TE polarized light, the propagation loss of the waveguide as low as 0.4 dB/cm was obtained at 1.3 mm. The propagation loss for TM polarized light was 1.5 dB/cm. An ARROW waveguide fabricated using the polyimide/Ta2O5/polyimide material system is also presented for comparison.
In addition, anisotropic etching of Si-V grooves were formed using the EDP solution, and room temperature sputtered Ta2O5 was used as the etching mask. At a etching temperature of 1200C, the under cut of the V-groove is 1.6mm

第一章 導論
第二章 抗共振反射波導的理論模型
2-1. Hybrid ARROW Waveguide的結構與工作原理
2-2. Hybrid ARROW Waveguide的理論模擬
2-3. Hybrid ARROW Waveguide的應用
2-3.1 Hybrid ARROW Waveguide與雷射間的耦合效率
2-3.2 Hybrid ARROW Waveguide與光纖間的耦合效率
2-4. 結果與討論
第三章 元件製程
3-1. Hybrid ARROW Waveguide的製作流程
3-2. V-groove的製作流程
3-3. 結果與討論
第四章 波導的量測結果與分析
4-1.波導的量測
4-2.討論
第五章 結論

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