本論文中,提出可應用於矽光子學(Si photonics)之五氧化二鉭(Ta2O5)波導濾波器。此元件材料係由射頻磁控濺鍍法在矽基板上製備，再經由多道電子束微影技術及電漿蝕刻所研製而成。我們利用三維光柵微擾理論模擬濾波器的中心波長，同時也將探討Ta2O5波導濾波器的穿透及反射光譜。在元件檢測上，我們會自行架設實驗量測系統，再將寬頻光源(1480-1610nm)輸入波導，最後再由光譜分析儀來分析濾波器之穿透反射光譜圖。
在實驗結果部分，我們成功做出反射率大於75%及-3db頻寬為5nm的光波導濾波器。在傳輸損耗方面，我們量出於單獨650μm直線波導以及含有光柵的波導濾波器之耦合量測分別得到的插入損耗(insertion losses)為7.6 dB 和8.9 db。
另一方面，我們量測使用製冷板來測量光波導濾波器的熱穩定度，過程中我們控制溫度的範圍為10度至100度，結果顯示溫度對光波導濾波器的中心波長偏移量為22pm(從1528.046nm到1528.068nm)，結果證實了我們製備的光波導濾波器有著高的熱穩定度。

In this thesis, Tantalum pentoxide (Ta2O5) waveguide filter is proposed for Si photonic. Ta2O5 was prepared using the RF-magnetron sputtering system on silicon substrates with 3μm thick thermal oxide.The waveguide filter was obtained by e-beam lithography for patterns definition and reactive ion etching for ridge formation. In addition, we used 3D Lumerical simulation to calculate the Bragg wavelength of the grating structare. On the other hand, we will also discuss reflective coefficient of Ta2O5 waveguide filters.
The transmission spectrum of the Ta2O5 waveguide filter was measured using a home-made optical system with a broadband ligth sourse.The spectrum range of light sourse is from 1480nm to 1600nm. As a result, the fabricated waveguide filter exhibited a Bragg wavelegth of 1528nm and a spectral linewidth of 5.13nm. For a 200μm long waveguide filter, the reflectivity of the device is larger than 75%.
Finally, we used thermoelectric cooler to detect the thermal stability of optical waveguide filters. The temperature change from 10oC to 100oC. The results showed that the temperature change from 10oC to 100 oC, the Bragg wavelength shifted only 22 pm(from 1528.046nm to 1528.068nm). Ta2O5 optical waveguide filters with a high thermal stability were obtained.

中文審定書 i
英文審定書 ii
誌 謝……. iii
摘 要……. iv
Abstract…. v
目 錄…… vi
表目錄…… viii
圖目錄….. ix
第一章 緒論 1
1.1 前言 1
1.2 光纖與光波導 2
1.3 研究動機 3
1.5 論文架構 5
第二章 光纖光柵原理及儀器介紹 6
2.1 光纖光柵的歷史簡介 6
2.2 光柵(grating)原理 6
2.3 五氧化二鉭 (Tantalum Pentoxide – Ta2O5) 8
2.4 射頻磁控濺鍍 9
2.5電子顯微鏡 13
2.6 電子束 14
2.6.1 鄰近效應(proximity effect) 15
2.6.2 電荷累積效應(charging effect) 16
2.7 反應式離子蝕刻機 16
2.8 紫外光臭氧清洗機 18
2.9 晶圓切割機 19
2.10 研磨機 20
2.11 量測系統 21
2.11.2 X光繞射儀(X-ray Diffraction) 21
2.11.3 電性測量系統 22
2.11.4 光纖耦合測量系統 23
第三章 製程材料與儀器步驟 25
3.1 製程步驟 25
3.1.1 Ta2O5薄膜濺鍍 25
3.1.2 電子束微影 28
3.1.3 Ta2O5乾蝕刻 33
3.1.3 Spin On Glass(SOG)薄膜塗佈 34
3.1.4 UV 膠黏著石英層 35
3.1.5 切割 35
3.1.6 研磨 36
3.2.1 波導濾波器插入損耗量測 38
3.3 實驗流程 39
第四章 結果與討論 42
4.1 Ta2O5薄膜檢測 42
4.2 長直波導傳輸損耗 44
4.3 光柵波導濾波器 45
第五章 結論與未來展望 49
參考文獻… 51

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