本論文利用新型鏡面可調之全像干涉微影系統達到高靈活性的光柵週期結構與大面積曝光，藉由製程參數的最佳化，成功地製作出週期400 nm~1500 nm晶圓級一維週期性光柵結構。我們還改良原有雙光束系統架設，以實現週期200 nm~400 nm的大面積、均勻性光柵結構。在半導體元件的應用上，除了製作RGB反射式濾波器、可見光極化器外，也搭配了軟性基板與液晶配向等應用，藉由RCWA模擬元件結構與特性，搭配電子束蒸鍍、ICP蝕刻等半導體製程；光學模厚計與SEM、AFM的量測與觀察，做出高良率的反射式RGB濾波器，此濾波器利用高折射率的矽作為光柵材料，調整週期以達到不同波段RGB的反射，除了有寬頻譜(>80 nm)與高反射(>75%)的效果外，還具備了極化選擇性，再疊成液晶盒做配向，並分別將RGB元件整合在一起，藉由電壓控制達到可見光色彩的實現。可見光極化器是在玻璃上利用全像術干涉微影做出光柵結構，再鍍上金屬來達到穿透度上極高的消光比；軟性元件則具備輕薄、可撓曲與耐衝擊的特性，以全像術微影製作次波長光柵結構於軟板上，很適合應用於易攜帶、低成本的顯示元件。除此之外，運用全像術做在導電玻璃上的光阻光柵結構，可以直接用於液晶的配向，有著相較於傳統的摩擦配向的穿透度與導電特性。我們以實驗數據驗證光柵結構的填充比(<1.3%)、高低深度(<3%)以及週期誤差(<0.15%)；且在光阻配向上有著高達95%的穿透率；極化器的製作上也達到可見光60%的穿透率與1：40的消光比；而RGB反射器結合液晶的混色效果上，在不同波段上也有著40~60%的反射，並證明電壓的控制可以達到RGB液晶盒於可見光波段上的驅動。

This thesis focuses on the modification of our mirror-tunable laser interference system for short-period (200~400 nm) grating formation over a large sample area with superior uniformity. Experimental results indicate that the resist gratings have a fill factor variation of < 1.3%, a thickness variation of < 3%, and a grating period variation of < 0.15%. Such a superior grating structure then serves as the building block to realize RGB reflective filters and wire-grid optical polarizers. The gratings are also applied for liquid crystal alignment on a flexible substrate. The RGB reflective filter is based on a guided-mode resonance mechanism and the grating is made of high-refractive-index silicon material. According to the rigorous coupled-wave analysis, the reflecting wavelength of a Si grating can be adjusted by changing the grating period. A reflection bandwidth of > 80 nm and a reflectivity of > 75% are predicted and experimentally demonstrated. Wire-grid optical polarizer is realized by oblique depositing Aluminum atop the resist gratings. The resultant optical polarizer enables an optical transmission of 60% and an extinction ratio of about 40:1. The alignment of liquid crystal by grating allows an optical transmission of up to 95%. After assembling RGB reflective filter with standard liquid crystal cell, we show that color mixing can be achieved by adjusting the voltage applied to the cell. We believe that the proposed all-grating-based reflective display concept could be a high-efficiency and low-cost choice.

內容目錄
中文審定書 i
英文審定書 ii
誌謝 iii
摘要 iv
Abstract v
內容目錄 vi
圖目錄 viii
表目錄 xii
第一章 緒論 1
1-1 前言 1
1-2 研究動機 2
1-3 文獻回顧 6
1-3.1 微影製程技術 6
1-3.2 次波長光柵濾波器 9
1-3.3 液晶配向之光柵 12
1-3.4 次波長金屬光柵極化器 14
第二章 次波長光柵及系統架構 16
2-1 全像術與次波長光柵理論 16
2-2 高對比折射率光柵 19
2-3 新型雙光束全像系統 22
2-3.1 長週期大面積架設 22
2-3.2 短週期大面積架設 24
2-4 震動量測 31
2-5 繞射原理及架構 35
第三章 模擬與製程技術 38
3-1 RCWA模擬 38
3-1.1 RGB次波長反射器 38
3-1.2 次波長金屬光柵極化器 41
3-2 黃光微影製程 45
3-2.1 全像干涉微影流程 45
3-2.2 RGB反射器製程 47
3-2.3 極化器製作 50
3-2.4 軟性基板上製作光柵結構 52
3-3 液晶配向 55
3-3.1 光阻配向 55
3-3.2 無機光柵配向 57
第四章 實驗結果與量測分析 60
4-1 短週期大面積均勻光柵圖案 60
4-2 繞射效率及週期量測 63
4-3 矽光柵RGB反射器結果與良率分析 67
4-4 液晶配向結果與討論 71
4-4.1 光阻光柵結構 71
4-4.2 透明導電介質光柵 76
4-5 RGB反射器結合液晶之應用 79
4-6 鋁光柵極化器量測結果分析 94
4-7 軟板製程結果 101
第五章 結論 107
參考文獻 109

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