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論文名稱 Title |
以電漿輔助式分子束磊晶成長氮化鎵薄膜與氮化鋁鎵量子井結構及其應用 Growth of GaN thin film and AlGaN-based quantum well structure by plasma-assisted molecular beam epitaxy for optoelectronics application |
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系所名稱 Department |
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畢業學年期 Year, semester |
語文別 Language |
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學位類別 Degree |
頁數 Number of pages |
144 |
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研究生 Author |
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指導教授 Advisor |
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召集委員 Convenor |
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口試委員 Advisory Committee |
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口試日期 Date of Exam |
2017-07-14 |
繳交日期 Date of Submission |
2017-07-24 |
關鍵字 Keywords |
氮化鋁鎵、量子井、發光二極體、分子束磊晶、氮化鎵、非極性面、氧化鋅、鋰酸鎵 AlGaN, LiGaO2, molecular beam epitaxy, quantum well, ZnO, non-polar plane, GaN, light emitting diode |
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統計 Statistics |
本論文已被瀏覽 5750 次,被下載 34 次 The thesis/dissertation has been browsed 5750 times, has been downloaded 34 times. |
中文摘要 |
本篇論文主要探討以電漿輔助分子束磊晶術成長氮化鎵薄膜與氮化鋁鎵量子井結構及其應用。首先於成長氮化鎵磊晶薄膜方面,我們嘗試成長非極性面氮化鎵薄膜於合適基板上。我們成長氮化鎵薄膜於氧化鋅微米柱上調變成長條件從N-rich到 Ga-rich,其中確認於Ga-rich的成長環境下可成功成長M面氮化鎵磊晶層於M面氧化鋅微米柱,其結果可由TEM與PL量測獲得確認。由TEM與PL的分析,發現在氮化鎵與氧化鋅微米柱的交接面有一異質相ZnGa2O4產生,其會造成M面氮化鎵產生錯位堆疊缺陷。由此項研究我們確認M面氧化鋅微米柱可被當成基板,成長M面氮化鎵磊晶層。我們將M面氮化鎵磊晶層成長於鋰酸鎵基板(0001)面上,並推導M面纖維鋅礦結構的虎克定律。利用TEM與虎克定律,成功推算M面氮化鎵磊晶層異向應力與缺陷。 在成長氮化鋁鎵量子井結構部分,首先我們成長氮化鋁鎵作為barrier 層與氮化鎵主動層形成量子井結構於氮化鎵templat基板上,由表面形貌分析確認成長多層量子井結構可做為緩衝層改善氮化鎵的磊晶品質。我們亦成長AlxGa1-xN/AlyGa1-yN 多層量子井結構於氮化鎵template基板上,且發現先行成長低溫氮化鋁層於於氮化鎵template基板再成長AlxGa1-xN/AlyGa1-yN 多層量子井結構,可有效減少量子井的缺陷與提高發光效率 |
Abstract |
In this dissertation, we discuss growth of GaN thin film and AlGaN-based quantum well structure by plasma-assisted molecular beam epitaxy for optoelectronics application. At the first, we grow non-polar plane GaN thin film on the low lattice mismatch substrate. We grow M-plane GaN on ZnO micro-rods (1010) under Ga-rich growth condition which was confirmed by TEM and polarization-dependent photoluminescence. We found that the ZnGa2O4 compound was formed at the M-plane hetero-interface which induce stacking fault defect in the epilayer. We demonstrated that the M-plane ZnO micro-rod surface can be used as an alternative substrate to grow high quality M-plane GaN epi-layers. We also grow M-plane GaN on the -LiGaO2 (100) and derive M-plane GaN Hooke’s law. By the TEM and Hooke’s law, we estimate anisotropic stress in the M-plane GaN epilayer. In the growth of AlGaN-based quantum well, at the first, we grow AlxGa1-xN/GaN multi-quantum wells on the GaN template substrate. We find that growth of AlxGa1-xN/GaN multi-quantum wells as buffer layer can improve GaN epilayer quality. We also grow AlxGa1-xN/AlyGa1-yN multi-quantum wells on the GaN template. We find that the interlayer LT-AlN layer can avoid AlxGa1-xN/AlyGa1-yN multi-quantum well structure cracking and improve AlxGa1-xN/AlyGa1-yN multi-quantum wells structure. |
目次 Table of Contents |
目錄 Chapter 1 1 Introduction 1 1.1 III-Nitride semiconductor 1 1.2 optoelectronic of GaN-based semiconductor 4 Chapter 2 8 Epitaxial growth of M-plane GaN on ZnO micro-rods by plasma-assisted molecular beam epitaxy 8 2.1 Background 8 2.2 Growth procedure 11 2.3 Results and discussion 14 2.4 Summary 28 Chapter 3 29 Strain of M-plane GaN epitaxial layer grown on -LiGaO2 (100) By plasma-assisted molecular beam epitaxy 29 3.1 Background 29 3.2 Growth procedure 32 3.2.2 Substrate Processing method 33 3.3 Results 35 3.3.1 Results of sample growth 35 3.3.2 Result of anisotropic stress in M-plane GaN on LiGaO2 (100) 41 3.4 Summary 55 Chapter 4 56 AlxGa1-xN/GaN multi-quantum wells grown on GaN template by plasma-assisted molecular beam epitaxy 56 4.1 Introduction 56 4.2 Growth procedure 58 4.3 Result 60 4.4 Summary 76 Chapter 5 77 AlxGa1-xN/ AlyGa1-yN multi quantum well grow on the GaN template by PA-MBE system 77 5.1 Background 77 5.2 Growth procedure 79 5.3 Results 85 5.4 Summary 117 Chapter 6 118 Conclusion 118 Reference 121 Publications List: 129 Conference paper: 130 |
參考文獻 References |
[1] S. Nakamura, M. Senoh, N. Iwasa, S.-I. Nagahama, Jap. J. of Appl. Phys. 35, 797 (1995) [2] S. Nakamura, M. Senoh, S.-I Nagahama, N. Iwasa, T. Yamada, T. Matsushita, Jap. J. of Appl. Phys. 35, 74 (1996) [3] S. Nakamura, T. Mukai, M. Senoh, Appl. Phys. Lett. 64, 1687 (1994) [4] S. Guha, N. A. Bojarczuk, Appl. Phys. Lett. 72, 415 (1998) [5] B.H. Le, S. Zhao, N. H. Tran, Z. Mi, Appl. Phys. Lett. 105, 231124 (2014) [6] U. K. Mishra, L. Shen, T. E. Kazior, Proceedings of the IEEE. 96, 287 (2008) [7] Y. F. Wu, D. Kapolnek, J. P. Ibbetson, P. Parikh, B. P. Keller, U. K. Mishra, IEEE Transactions On Electronic Devices. 48, 586 (2001) [8] H. Amano, N. Sawaki, I. Akasaki, Appl. Phys. Lett. 48, 353 (1986) [9] K. Hiramatsu, S. Itoh, H. Amano, I. Akasaki, N. Kuwano, T. Shiraishi, K. Oki, J. Cryst. Growth 115, 628 (1991) [10] H. Amano, I. Akasaki, K. Hiramatsu, N. Koide, N. Sawak, Thin Solid Films 163, 415 (1988) [11] H. Amano, T. Asahi, I. Akasaki, Jpn. J. Appl. Phys. 29, 205 (1990) [12] David J. Smith, D. Chandrasekhar, Appl. Phys. Lett. 67, 1830 (1995) [13] W. C. Hughes, W. H. Rowland, Jr., M. A. L. Johnson, Shizuo Fujita, J. W. Cook, Jr., J. F. Schetzina, J. Vac. Sci. Technol. B 13, 1571 (1995) [14] I. Lo, C. H. Hsieh, Y. C. Hsu, W. Y. Pang, M.C. Chou, Appl. Phys. Lett. 94, 062105 (2009) [15] T. Ishii, Y. Tazoh, S. Miyazawa, J. Cryst. Growth 189, 208 (1998) [16] X. Gu, M. A. Reshchikov, A. Teke, D. Johnstone, H. Morkoc, B. Nemeth, J. Nause, Appl. Phys. Lett. 84, 2268 (2004) [17] HadisMorkoç, Handbook of Nitride Semiconductors and Devices, (WILEY-VCH, Germany, 2008), Chap. 1, pages 2-10. [18] F. Bernardini, V. Fiorentini, Phys. Rev. B. 56, 10025 (1997) [19] R. Zhang, H. Lin, Y. Yu, D. Chen, J. Xu, Y. Wang, Laser Photonics Rev. 8, 158 (2014) [20] S. Nakamura, M. Senoh, N. Iwasa, S. I. Nagahama, Jap. J. of Appl. Phys 34, L797-799 (1995) [21] F.A. Ponce, D.P. Bour, Nature 386, 351 (1997) [22] HadisMorkoç, Handbook of Nitride Semiconductors and Devices, (WILEY-VCH, Germany, 2008), Chap. 1, pages 90-97 [23] M.Asif Khan, A. Bhattarai, J.H. Kuznia, D.T Olson, Appl. Phys. Lett. 63, 1214 (1993) [24] Y. C. Hsu, I. Lo, C. H. Shih, W. Y. Pang, C. H. Hu, Y. C. Wang, Mitch M. C. Chou, Appl. Phys. Lett. 100, 242101 (2012) [25] T. l. Tansley, C. P. Foleya, J. Phys. Lett. 59, 3241 (1986) [26] Y. Nanishi, Y. Saito, T. Yamaguchi, Jap. J. of Appl. Phys 42, 2549 (2003) [27] J.Wu, J. Phys. Lett. 106, 011101 (2009) [28] P. Waltereit, O. Brandt, A. Trampert, H. T. Grahn, J. Menniger, M. Ramsteiner, M. Reiche, K. H. Ploog, Nature. 406,865 (2000) [29] S. F. Chichibu, A. Uedono1, T. Onuma,, H. Amano, I. Akasaki, J.Han,T.Sota, nature materials 5 801(2006) [30] C. H. Hsieh, I. Lo, M. H.Gau, Y. L. Chen, M. C. Chou, W. Y.Pang, Y. I. Chang, Y. C. Hsu, M. W. Sham, J. C.Chiang, J. K.Tsai, Jap. J. of Appl. Phys. 47, 891(2008) [31] C. H. Shih, I. Lo, W. Y. Pang, Y. C. Wang, M.C. Chou, Thin Solid Films. 519, 3569 (2011). [32] Qian Sun, Soon-Yong Kwon, Zaiyuan Ren, Jung Han, Takeyoshi Onuma, Shigefusa F. Chichibu, Shaoping Wang, Appl. Phys. Lett. 92, 051112 (2008) [33] HadisMorkoç, Handbook of Nitride Semiconductors and Devices, (WILEY-VCH, Germany, 2008), Chap. 3, pages 323-380. [34] R. Schuber, M.M.C. Chou, D.M. Schaadt, Thin Solid Films. 518, 6773 (2010) [35] M. D. Craven, F. Wu, A. Chakraborty, B. Imer, U. K. Mishra, S. P. DenBaars, J. S. Specka, Appl. Phys. Lett. 84, 1281 (2002) [36] T. Kawashima, T. Nagai, D. Iida, A. Miura, Y. Okadome, Y. Tsuchiya, M. Iwaya, S. Kamiyama, H. Amano, I. Akasaki, Cryst. Growth. 298, 261 (2007) [37] S. K. Hong, H. J. Ko, Y. Chen, T. Hanada, T. Yao, J. Vac. Sci. Technol. B. 18, 2313(2000) [38] J.N. Dai, X.Y. Han, Z.H. Wu, C.H. Yu, R.F. Xiang, Q.H. He, Y.H. Gao, C.Q. Chen , X.H. Xiao, T.C. Peng, Journal of Alloys and Compounds. 489,519(2010) [39] Atsushi Kobayashi, Satoshi Kawano, Yuji Kawaguchi, Appl. Phys. Lett. 90, 041908 (2007) [40] SuviSärkijärvi, Sakari Sintonen, Filip Tuomisto, Markus Bosund, Sami Suihkonen , Harri Lipsanen, Cryst. Growth. 398, 18 (2014) [41] C. Y. Chang, H. M. Huang, Y. P.Lan, T. C. Lu, L. W. Tu, W. F. Hsieh, Cryst. Growth Design. 13, 3098 (2013). [42] K. Nakahara, H. Takasu, P. Fons, A. Yamada, K. Iwata, K. Matsubara, R. Hunger, S. Niki, Appl. Phys. Lett. 79 , 4139 (2001) [43] Y. Xia, J. Brault, P. Vennéguès, M. Nemoz, M. Teisseire, M. Leroux, J.-M.Chauveau, Cryst. Growth. 388, 35(2014) [44] T. Yao, S. K. Hong, Oxide and Nitride Semiconductors, (Springer, Germany, 2008), Chap. 7, pages 313-315 [45] B. Liu, R. Zhang, Z. L. Xie, J. Y. Kong, J. Yao, Q. J. Liu, Z. Zhang, D. Y. Fu, X. Q. Xiu, P. Chen, P. Han, Y. Shi, Y. D. Zheng, S. M. Zhou, G. Edwards, Appl. Phys. Lett. 92, 261906 (2008) [46] S. Ghosh, P. Waltereit, O. Brandt, H.T. Grahn, K.H. Ploog, Phys. Rev. B 65, 075202 (2002) [47] M. A. Reshchikova, H.Morkoc, J. Appl. Phys. 97, 061301(2005) [48] P. A. Rodnyi, I. V. Khodyuk, Optics and Spectroscopy. 111, 776 (2011) [49] M.Kumar,T. H. Kim, S. S. Kim, B. T. Lee, Appl. Phys. Lett. 89, 112103(2006) [50] R. Armitage, H. Hirayama, Appl. Phys. Lett. 92, 092121 (2008) [51] R. Armitage, M. Horita, J. Suda, T. Kimoto, J. Appl. Phys. 101, 033534 (2007) [52] X. Ni, M. Wu, J. Lee, X. Li, A. A. Baski, Ü. Özgür, H. Morkoçb, Appl. Phys. Lett. 92, 111102(2009) [53] N. F. Gardner, J. C. Kim, J. J. Wierer, Y. C. Shen, M. R. Krames, Appl. Phys. Lett. 86, 111101 (2005) [54] M. Marezio, Acta Crystallogr 18, 481(1965). [55] R. Schuber, M.M.C. Chou, D.M. Schaadt, Cryst. Growth. 388, 6773 (2010) [56] R. Schuber, Y.L. Chen, C.H. Shih, T.H. Huang, P. Vincze, I. Lo, L.W. Chang,Th. Schimmel, M.M.C. Chou, D.M. Schaadt, Thin Solid Film. 323, 76 (2011) [57] C.H. Shih, I. Lo, W.Y.Pang, Y.C. Wang, Mitch M.C. Chou, Cryst. Growth. 340, 61 (2012) [58] Mitch M.C. Chou, C.L. Chen, D.R. Hang, W.T. Yang, Thin Solid Film. 519, 5066 (2011) [59] T. Ishii, Y. Tazoh, S.Miyazawa, Cryst. Growth. 189, 208 (1998) [60] C.L. Chen, C.A. Li, S.H. Yu, Mitch M.C. Chou, Cryst. Growth. 402, 325 (2014) [61] P. Waltereit, O. Brandt, M. Ramsteiner, R. Uecker, P. Reiche, K.H. Ploog, Cryst. Growth. 218, 143 (2000) [62] A. Kelly, K. M. Knowles, Crystallography and Crystal Defects, (WILEY-VCH, Germany, 2012), Chapter 6, page 181-191 [63] T. Yao, S. K. Hong, (Springer, Germany, 2008), Chapter 1, page 6-10 [64] A. E. Romanov, T. J. Baker, S. Nakamura, J. S. Speck, J. Appl. Phys. 100, 023522(2006) [65] C. Kisielowski, J. KruÈger, S. Ruvimov, T. Suski, J. W. Ager III, E. Jones, Z. Liliental-Weber, M. Rubin, E. R. Weber, Phys. Rev. B 54, 17745 (1996) [66] P. R. Evans, Acta Cryst. D57, 1355 (2001) [67] Darakchieva, T. Paskova, M. Schubert, H. Arwin, P. P. Paskov, B. Monemar, D. Hommel, M. Heuken, J. Off, F. Scholz, B. A. Haskell, P. T. Fini, J. S. Speck, S. Nakamura, Phys. Rev. B 75, 195217(2007) [68] C.H. Shih, T.H. Huang, R. Schuber, Y.L. Chen, L.W. Chang, I. Lo, Mitch M.C. Chou, D. M Schaadt, Nanoscale Research Letters 6, 425 (2011) [69] A.F. Wright, J. Appl. Phys. 82, 2833 (1997) [70] A. Polian, M. Grimsditch, I. Grzegory, J. Appl. Phys. 79, 3343 (1996) [71] S. Einfeldt, H. Heinke, V. Kirchner, D. Hommel, J. Appl. Phys. 89, 2160 (2001) [72] J. Han, M. H. Crawford, R. J. Shul, J. J. Figiel, M. Banas, and L. Zhang, Y. K. Song, H. Zhou, A. V. Nurmikko, Appl. Phys. Lett. 73, 1688 (1998) [73] Y. Y. Zhang, Y. A. Yin, Appl. Phys. Lett. 99, 221103 (2011) [74] C. S. Xia, Z. M. Simon Li, W. Lu, Z. H. Zhang, Y. Sheng, W. D. Hu, L. W. Cheng, J. Appl. Phys. 111, 094503 (2012) [75] W. Braun, Applied RHEED, Springer Germany 1999, chapter 5, page 76-85 [76] M.A. Herman, H.Sitter, molecular Beam Epitaxy Fundamentals and Current status,,chapter 4, page137-145 [77] M.A. Reshchikov, H. Morkoç, J. Appl. Phys. 97, 061301 (2005) [78] J.P. Zhang, S. Wu, S. Rai, V.i Mandavilli, V.Adivarahan, A. Chitnis, M. Shatalov, M. A. Khan, Appl. Phys. Lett. 83, 3456(2003) [79] T. Y. Chang, M. A. Moram, C. McAleese, M. J. Kappers, C. J. Humphreys, J. Appl. Phys.105, 123522 (2010) [80] J. Mickevicˇius, J. Jurkevicˇius, K. Kazlauskas, A. Zˇukauskas, G. Tamulaitis, M. S. Shur, M. Shatalov, J. Yang, R. Gaska, Appl. Phys. Lett. 100, 081902 (2012) [81] Z. Bryan, I. Bryan, S. Mita, J. Tweedie, Z. Sitar, R. Collazo, Appl. Phys. Lett. 106, 232101 (2015) [82] HadisMorkoç, Handbook of Nitride Semiconductors and Devices, (WILEY-VCH, Germany, 2008), Chap. 1, pages 11 [83] Y.S. Liu, S.Wang, H. Xie, T.T. Kao, K.Mehta, X. Jia Jia, S.C. Shen, P. D. Yoder, F. A. Ponce, T. Detchprohm, R. D. Dupuis, Appl. Phys. Lett. 109, 081103 (2016) [84] X. Li, H. Xie, F. A. Ponce, J.H. Ryou, T. Detchprohm, R.D. Dupuis, Appl. Phys. Lett. 107, 241109 (2015) [85] H. Angerer, D. Brunner, F. Freudenberg, O. Ambacher, M. Stutzmann, R. HoÈpler, T. Metzger, E. Born, G. Dollinger, A. Bergmaier, S. Karsch, and H.-J. KoÈrner, Appl. Phys. Lett. 71, 1504 (1997) [86] G. Chen, X. Q. Wang, K. Fu, X. Rong, H. Hashimoto, B. S. Zhang, F. J. Xu, N. Tang, A. Yoshikawa, W. K. Ge, B. Shen, Appl. Phys. Lett. 104, 172108 (2014) [87] C. Q. Chen, J. P. Zhang, M. E. Gaevski, H. M. Wang, W. H. Sun, R. S. Q. Fareed, J. W. Yang, M. Asif Khan, Appl. Phys. Lett. 81, 4961 (2002) [88] S. Bals, B. Kabius, M. Haider, V. Radmilovic, C. Kisielowski, Solid State Communications 130, 675–680 (2004) |
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