本實驗以鈦為靶材，使用離子束濺鍍法，並通入氮氣，在(001)氯化鈉單晶基板上製備(001)氮化鈦磊晶薄膜。再將試片進行不同溫度及時間之大氣熱處理，接著使用穿透式電子顯微鏡分析薄膜之相轉變。
於450 °C 4-280 h熱氧化過程當中，形成與氮氧化鈦有平行晶向關係之Z=[001] 銳鈦礦。此外，還有Z=[010] A之銳鈦礦生成，與氮氧化鈦亦有晶向關係。
而於400 °C及500 °C時，在(100)界面會形成序化相，此相並可形成雙晶，並以氮氧化鈦(100)為序化面及雙晶平面。另外，加長熱氧化時間觀察到形成未知相X，與(001)氮氧化鈦有晶向關係；同時也存在Z=[010] A之銳鈦礦。目前認為序化之雙晶相會先轉為未知相X，當時間拉長，再轉為銳鈦礦。

This experiment used ion beam sputtering method to prepare epitaxy TiN (001) thin film on NaCl (001) surface by using Ti as target in a nitrogen atmosphere. The thin films were thermally oxidized in air at different temperatures to induce phase transition. Transmission electron microscopy will be used for analysis.
After thermal oxidation at 450 °C for 4-280 h, anatase of [001] zone was formed and has a parallel orientation relationship with the substrate titanium oxynitride film. In addition, anatase of [010] zone also formed which also has an orientation relationship with titanium oxynitride.
Thermal oxidation at 400 °C and 500 °C, titanium oxynitride formed ordered structure with the (100) Ti(O,N) as interface, which could also form twin by using the (100) plane as twin plane. Further oxidation caused the appearance of an unknown phase X, which has an orientation relationship with titanium oxynitride, is formed. Anatase of [010] zone was also observed.It is suggested that the ordered twin phase may turn into the unknown phase X. With further oxidation, both phases then turn into anatase.

論文審定書………………………………………………………………………….……i
誌謝………………………………………………………………………………….......ii
摘要………………………………………………………………………………….…..iv
Abstract……………………………………………………………………………….…v
目錄………………………………………………………………………………….…..vi
表目錄…………………………………………………………………………….….…viii
圖目錄……………………………………………………………………………….…..ix
第一章 簡介………….………………………………………………………….………1
1.1 二氧化鈦簡介………………………………………………………………..……1
1.2 文獻回顧……………………………………………………………………..……2
1.2.1 非金屬離子摻雜至TiO2……………………………………………….………2
1.2.2 TiN相轉變至N-doped TiO2…………………………………………………...3
1.2.3 TiO至anatase相轉變之機制………………………………………………….4
1.2.4 磊晶(001)A之活性………………………………………………………….….5
1.2.5 TiN之雙晶面及方向…………………………………………………………...5
1.2.6 研究目的…………………………………………………………………….....6
第二章 實驗步驟與分析方法…………….…………. ………………………………..7
2.1 薄膜試片製備……………………………………………………………………..7
2.2 穿透式電子顯微鏡分析…………………………………………………………..7
第三章 實驗結果與討論….…………….……………………………………………...9
3.1 初鍍膜………………………………………………………………………….…9
3.2 400 °C 熱氧化處理………………………………………………………………9
3.3 450 °C 熱氧化處理……………………………………………………………..12
3.4 500 °C 熱氧化處理……………………………………………………………..15
第四章 結論…………………………………………………………………………...18
第五章 未來工作……………………………………………………………………...19
第六章 參考文獻……………………………………………………………………...20

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