印刷電路板有機廢液多以物化及生物處理法去除COD，但當污染物成份過於複雜或較難分解時，其去除效果則不顯著。電路板化學銅廢液以化學混凝沉澱法處理為主，其缺點為產生大量的重金屬污泥。
本研究目的為藉由Fenton-Ferrite Process及UV/H2O2-Ferrite Process二種組合程序去除PCB廢水中之有機物及重金屬，使上澄液能符合法規標準，且產生之重金屬污泥可視為一般事業廢棄物。
Fenton及UV/H2O2程序主要探討因子為：亞鐵及H2O2加藥量、pH值、反應時間與加藥方式等，並尋求較好的操作條件以結合後續Ferrite Process。結果顯示Fenton適合在酸性條件(pH=2)，UV/H2O2系統適合在中性條件(pH=8)操作，H2O2加藥量過多或太少皆會使去除效率下降。
Fenton及UV/H2O2程序完成測試後，接續Ferrite Process測試重金屬廢水，其中Ferrite Process主要以三段式進行反應，操作條件為控制溫度、pH值及Fe/M莫耳比。Ferrite Process在處理銅金屬廢水，Fe/M莫耳比率為10倍，結合Fenton、UV/H2O2及Ferrite Process成為Fenton-Ferrite Process及UV/H2O2-Ferrite Process二種來處理PCB實場廢水，其上澄液所含有機物和重金屬皆可符合法規標準，汙泥初步證明為一般事業廢棄物，此污泥粒晶格粒徑皆小於100 nm並擁有磁性，可朝後續回收再利用發展。

Biological and physical chemistry treatment methods always are used to remove COD of organic wastewater contains PCB. The effect is not obvious when the compositions of pollutant are too refractory or complicated. The primary treatment method of wastewater containing copper is chemical coagulation/sedimentation and its disadvantage is producing a large of sludge.
The objective of this study, using two combinative method of UV/H2O2-Ferrite Process and Fenton-Ferrite Process, is to remove organic compounds and heavy metal in real wastewater. Not only supernatant liquid could meet the standard of discharge wastewater but also produce general(non-hazardous) industrial wastes of heavy metal.
The primary operation condition of Fenton and UV/H2O2 process, was ferrous ion and hydrogen peroxide concentration, pH, reaction time, and chemical dosing, searching best operation condition to combine with Ferrite Process. Operation of Fenton and UV/H2O2 process under acid condition (pH=2) and neutral condition (pH=8) showed the best operation condition of Fenton and UV/H2O2. The removal decreased when the dose of hydrogen peroxide was added too more or too less.
As Fenton and UV/H2O2 process test finished, Ferrite Process is next used for treatment of heavy metal wastewater; Ferrite Process conducted as three stages and the operation conditions were controlled with temperature, pH and the ratio of Fe/M mole. The results showed that the best removal of treatment of copper containing wastewater by Ferrite Process achieved when the ratio of Fe/M mole was at 10. Treatment of PCB industrial real wastewater by Fenton-Ferrite Process and UV/H2O2-Ferrite Process which combined with Fenton, UV/H2O2 and Ferrite Process. The supernatant liquid containing organic compounds and heavy metal both could meet the standards of discharge wastewater and the sludge was judged with general(non-hazardous) wastes. The characteristic of the sludge were the diameter lattice less 100 nm and with magnetism and to develop recovery and utilization in a further work.

內頁目錄
謝誌 Ⅰ
中文摘要 Ⅱ
英文摘要 Ⅳ
目錄 Ⅵ
表目錄 Ⅹ
圖目錄 XI
第一章 緒論 1-1
1-1 研究源起 1-1
1-2 研究目的 1-3
第二章 文獻回顧 2-1
2-1 印刷電路板製造業簡介 2-1
2-1-1 印刷電路板簡介 2-1
2-1-2 印刷電路板製造方法及流程 2-2
2-1-3 印刷電路板廢水特性 2-5
2-1-4 重金屬廢水處理方法 2-5
2-1-5 有機廢水處理方法 2-7
2-2 Fenton程序原理與影響因素 2-8
2-2-1 Fenton之氧化原理 2-8
2-2-2 Fenton程序去除有機物之影響因素 2-10
2-2-3 Fenton程序之相關研究 2-13
2-3 UV/H2O2反應原理與影響因素 2-16
2-3-1 光化學反應原理 2-16
2-3-2 UV/H2O2反應原理 2-17
2-3-3 UV/H2O2反應之影響因素 2-19
2-3-4 UV/H2O2之相關研究 2-21
2-4 鐵氧磁體化法原理與相關研究 2-23
2-4-1 鐵氧磁體化法之原理 2-23
2-4-2 鐵氧磁體化法之影響因子 2-28
2-4-3 鐵氧磁體化法之相關研究 2-31
第三章 研究方法與實驗設備 3-1
3-1 研究架構與實驗流程 3-1
3-2 實驗設備與材料 3-4
3-2-1 Fenton-Ferrite Process設備 3-4
3-2-2 UV/H2O2設備 3-6
3-2-3 實驗藥品與試劑 3-8
3-3 實驗分析項目及方法 3-9
3-4 實驗步驟及操作條件 3-11
3-4-1 原水水質 3-11
3-4-2 Fenton操作條件 3-12
3-4-3 UV/H2O2操作條件 3-12
3-4-4 Ferrite Process操作條件 3-14
3-4-5 Fenton-Ferrite Process與UV/H2O2-Ferrite Process
效果評估 3-14
第四章 結果與討論 4-1
4-1 Fenton法處理PCB有機廢水之操作條件探求 4-1
4-1-1 pH值之影響 4-1
4-1-2 亞鐵離子加藥量之影響 4-3
4-1-3 過氧化氫(H2O2)加藥量之影響 4-5
4-1-4 反應時間及加藥方式之影響 4-6
4-1-5 Fenton法之操作條件 4-11
4-2 UV/H2O2處理PCB有機廢水之操作條件探求 4-12
4-2-1過氧化氫(H2O2)加藥量之影響 4-12
4-2-2 pH值之影響 4-13
4-2-3反應時間及加藥方式之影響 4-15
4-2-4 UV/H2O2系統之操作條件 4-18
4-3 Ferrite Process處理PCB重金屬廢水之操作條件探求 4-19
4-3-1 建立Ferrite Process操作模式 4-19
4-3-2 Fe/M莫耳比之影響 4-20
4-3-3 Ferrite Process之操作條件 4-22
4-4 Fenton-Ferrite Process及UV/H2O2-Ferrite Process處理
PCB廢水 4-23
4-4-1 處理PCB廢水結果 4-24
4-4-2 SEM及EDS分析結果 4-24
4-5 成本效益 4-28
第五章 結論與建議 5-1
5-1 結論 5-1
5-2 建議 5-3
參考文獻 參-1
附錄一 口試委員意見及回覆 附-1

表目錄
表2-1 不同重金屬分離技術之比較表 2-6
表2-2 有機污染廢水處理方法之比較表 2-7
表2-3

英文文獻
Aldershof B. K., Dennis R. M. and Kunitsky C. J., “Study of Decomposition of Four Commercially Available Hydrogen Peroxide Solutions by Fenton's Reagent”, Wat. Environ. Res., 69(5), pp.1052-1059, 1997
Benite F. J., Acero J. L., Real F. J. and Leal A. I., “ The role of hydroxyl radicals for the decomposition of p-Hydroxy Phenylacetic acid in aqueous solutions ”, Wat. Res.,, Vol.35, No. 5, pp.1338-1343,2001
Bishop, D. F, G. Stem, M. Fleischman, “Chemical Degradation of Chlorophenols with Fenton’s Reagent”, I ＆ Ec Process Design and Development, Vol.7, pp.110,1968
Feitknetch, W. and Elektrochem, Z., Vol.63, pp.34-43,1959
Fenton, H. J. H. , “Oxidation of tartaric acid in presence of iron.” Journal of Chemical Society,65,pp.889-910,1894
Gallard H. and Latt J., “Kinetic modeling of Fe(Ⅲ)/H2O oxidation reactions in dilute aqueous solution using atrazine as a model organic compound”, Wat Res., Vol. 34, NO. 12, pp.3107-3116,2000
Hamada S and Kuma Kenshi.,“Preparation of γ-FeOOH by Aerial Oxidation of Iron(Ⅱ)Chloride Solution”,Bulletin of the chemical society of Japan., Vol. 49, No. 12, pp.3695-3696,1976
Hsueh C.L., Huamg Y.H., Wang C.C., Chen C.Y., “Degration of azo dyes using low iron concentration of Fenton and Fenton-like system”,Chemosphere, 58, 1409,2005
Huang, C.P. and Dong, C.D., “Advanced Chemical Oxidation: Its Present Role and Potential Feture in Hazardous Waste Treatment”, Waste Management., Vol. 13, pp.361-377,1933
Jaime Rodr, David Contreras, Carolina Parra, Juanita Freer, Jaime Baeza and Nelson Dur., “Pulp mill effluent treatment by Fentontype reactions catalyzed by iron complexes.” Water Sci. Technol. 40, No 11-12 pp 351–355,1999
Kaneko K, Takei K., Tamaura Y., Kanzaki T., and Katsura T., “The Formation of the Cd-bearing Ferrite by the Air Oxidation of an Aqueous Suspension” , Bulletin of the chemical society of Japan., Vol. 52, No. 4, pp.1080-1085,1979
Kang S. F. and Chang H. M.,“Coagulation of Textile Secondary Effluents with Fenton’s Reagent”, Wat. Sci. Tech., 36(12),pp.215-222,1997
Kang N., Lee S.D., Yoon J.Y., “Kinetic modeling of Fenton oxidation of phenol and monochlorophenols” ,Chemophere, 47 ,915,2002
Kim Y. K. and Huh I.. R., “Enhancing Biological Treatability of Landfill Leachate by Chemical Oxidation”, Environ. Engr. Sci., 14(1),pp.73-79,1997
Kitis M., Adams C. D. and Daigger G. T., “The Effeces of Fenton’s Reagent Pretreatment on the Biodegradability of Nonionic Surfactants”,Wat. Res. 33(11), pp.2561-2568,1999
Kiyama M, “Condition for the Formation of Fe3O4 by the Air Oxidation of Fe(OH)2 Suspensions”, Bulletin of the chemical society of Japan., Vol. 47, No. 7, pp.1646-1654,1974
Kuo et al., “Identification of End Products Resulting from Ozonation of Compounds Compounds Commonly Found in water”, in Ozone/Chlorine Dioxide Oxidation Products of Organic Materials, Rice, R. G. and Cotruvo, J. A. Ed.,Inst., Cleveland, Ohio, pp.153-166,1978
Liao C. H., Kang S.F. and Wu F. A., “Hydroxyl radical scavenging role of chloride and Bicarbonate ions in the H2O2/UV process”,Chmosphere., Vol. 14, pp.1193-1200,2001
Lindsey M. E. and Tarr M. A., “Quantiation of hydroxyl radical during Fenton oxidation following a single addition of iron and peroxide”, Chemosphere., Vol. 41, pp.409-417,2000
Lin S. H. and Lo C. C., “Fenton Process for Treatment of Desizing Wastewater.”, Wat. Res., 31(8),pp. 2045-256,1997
Lunar L., Sicilia D., Rubio S., Perez-Bendito D. and Nickel U, “Degradation of photographic developers by Fenton reagent: comdition optimization and kinetics for metol oxidation”, Wat. Res., Vol. 34, No. 6, pp.1791-1802,2000
Mandaokar S. S., Dharmadhikari D. M., “Retrieval of heavy metal ions from solution via Ferritisation”, Environmental Pollution., Vo19l. 83, pp.277-282,1994
Moon, D.K., T. Mauyama, K. Osakada, and T. Yamamoto, “Chemical Oxidation of Polyamilime by Radical Generating Reagents, O2, H2O2 FeCl3 Catalyst, and Dobenzoyl Peroxide”, Chemistry Letters, pp.1633-1636,1991
Muruganandham M., Swaminathan M., “Decolourisation of Reactive Orange 4 by Fenton and photo-Fenton oxidation technology”, Dyes and Pigments, 63,315, 2004
O. Legrini, E. Oliveros, and A. M. Braun, “Photochemical Processes for Water Treatment”, Chem. Rev., 93, 671-698,1993
Park T. J., Lee K. H., Jung E. J. and Kim C. W., “Removal of Refractory Organic and Color in Pigment Wastewater with Fenton Oxidation”, Wat. Sci. Tech., 39(10-11),pp. 189-192,1999
Parsons S., “Advance Oxidation Process for Water and Wastewater Treatment”, IWA Publishing,UK,pp4,2004
Perez O P.,Yoshiaki.,“ORP-monitored magnetite formation from aqueous solutions at low temperayures”, Hydrometallurgy, Vol. 55, pp.35-56,2000
R.Venkatadri, and R. W. Peters, “Chemical Oxidation Technologies: Ultraviolet Light/Hydrogen Peroxide, Fenton’s Reagent, and Titanium Dioxide-Assisted Photocatalysis,” Hazardous Waste & Hazardous Materials, 10, 107-149,1993
Sellers R. M. “Spectrophotometric determination of hydrogen peroxide using potassium (Ⅳ) oxalate” ,Analyst. Oct. 105, pp.950-954,1980
Sheng HL, Chi ML, HORNG G L., “Operating characteristics and kinetic studies of surfactant wastewater treatment by Fenton oxidation”. Water Research, 33(7) ,pp.1735-1741,1999
Talinli I. and Anderson G. K., “Interference of Hydrogon Peroxide on the Standard COD Test”, Wat. Res., 26(1), pp.107-110,1992
Tamaura. Y., Katsura T., and Rojarayanont S., Yoshida T and Abe H, “Ferrite process；Heavy metal ions treatment system”, Water.Sci.Tech , Vol. 23,pp.1893-1900,1991
V. Kavitha, K. Palanivelu., “The role of ferrous ion in Fenton and photo-Fenton processes for the degradation of phenol”, Chmosphere Vol. 55, pp.1235-1243,2004
Walling C. and Kato S., “The Oxidation of Alcohols by Fenton’s Reagent: the Effect of Copper Ion”, J. Am. Chem. Soc., 93, pp.4275-4281,1971
Walling, C., and Goosen, A.,“Mechanism of the. ferric ion catalyzed decompositionof hydrogenperoxide.Ef-.fect of organic substrates.” J. Am. Chem. Soc. 95, pp.2987–2991,1973
Yeh, C.K. and J.T. Novak. “The effect of hydrogen peroxide on the degradation of methyl. and ethyl tert-butyl ether in soils”. Water Environment Research, Vol. 67, No.5, pp. 828-834,1995

中文文獻
王偉信，「以光氧化技術處理半導體製成有機廢水」，國立清華大學原子科學研究所，2000。
李尚章，「Fenton法氧化TCE DNAPL之探討」，屏東科技大學環境工程與科學系，1999。
呂仁明、顧洋、李崑池，「以紫外線/二氧化鈦程序處理2-氯酚溶液反應行為之研究」，第十八屆廢水處理技術研討會論文集，1993。
林憶芳，「利用UV/H2O2 光化學氧化法處理含酸性染料廢水之研究」，國立中興大學環境工程學研究所，1995。
周志豪，「利用超音波與電化學法處理螯合性含銅廢水」，朝陽科技大學環境工程與管理系碩士論文，2005。
喻家駿，「利用UV/H2O2、O3及UV/O3光化學氧化法處理反應性染料廢水之研究」，逢甲大學環境工程與科學研究所，2001。
曾迪華、莊連春、郭家倫、楊志堅，「 UV/H2O2氧化程序於水處理之應用」，工業污染防治第14 卷第4 期， 205－247， 1995
張健桂，「以鐵氧磁體程序處理含重金屬實驗室廢液之研究」，