本實驗主要利用X-ray 繞射分析儀 (X-ray diffraction, XRD)、掃描式電子顯微鏡 (scanning electron microscopy, SEM)、掃描式電子顯微鏡掛載陰極螢光 (scanning electron microscopy cathodoluminescence, SEM-CL)，針對二氧化鈦經不同摻雜及不同氣氛下燒結造成能隙的改變之研究。實驗結果顯示，摻雜氧化鈮之二氧化鈦會在導帶下方形成Nb_Ti^∙的缺陷，其缺陷能階為2.77 eV。

The study foucus on analysis of in-gap level on TiO2 bulk in different dopping-doped and different P_(O_2 )by XRD, SEM-CL.
The experiment results showed that the Nb2O5-doped TiO2 form the defect Nb_Ti^∙ under the conduction band, and the energy gap is 2.77 eV.

第一章 緒論..............................................................................................1
1.1 前言..............................................................................................1
1.2 研究動機與目的……………………………………………......2
第二章 文獻回顧……………………………………………………......3
2.1 半導體 (semiconductor) 介紹……...……………...……......…3
2.2 二氧化鈦簡介………………………………………………..…5
2.2.1 金紅石晶體結構 (Crystal Structure of Rutile, TiO2)…....7
2.2.2銳鈦礦晶體結構 (Crystal Structure of Anatase, TiO2)…..8
2.3二氧化鈦的平衡相圖…………………………………………..12
2.4 二氧化鈦的缺陷化學…………………………………………16
2.4.1 本質缺陷 (Intrinsic defects) …………………………...17
2.4.2 異質缺陷 (Extrinsic defects) …………………………..19
2.5 二氧化鈦的導電度……………………………………………22
2.6 陰極螢光 (Cathodoluminescence CL) ……………………….25
第三章 實驗步驟………………………………………………………29
3.1 粉體資料………………………………………………………29
3.2 二氧化鈦試片製備……………………………………………30
3.2.1 大氣下燒結未摻雜之二氧化鈦試片…………………..30
3.2.2 低氧分壓下燒結未摻雜之二氧化鈦試片……………..31
3.2.3 大氣下燒結摻雜氧化鈮之二氧化鈦試片……………..32
3.2.4大氣下燒結摻雜氧化鑭之二氧化鈦試片………………33
3.3 實驗設備………………………………………………………36
3.3.1 X-ray 繞射分析儀 (XRD) ……………………………..36
3.3.2掃描式電子顯微鏡 (SEM) ……………………………..36
3.3.3 陰極螢光 (Cathodoluminescence CL) ………………...36
第四章 實驗結果……………………………………………………....38
4.1 X-ray繞射分析………………………………………………..38
4.2 顯微組織分析………………………………………………....40
4.2.1 未摻雜之二氧化鈦顯微組織分析……………………..40
4.2.2低氧分壓下燒結之二氧化鈦顯微組織分析…………...40
4.2.3摻雜氧化鈮之二氧化鈦顯微組織分析…………………40
4.2.4摻雜氧化鑭之二氧化鈦顯微組織分析…………………41
4.3 陰極螢光分析…………………………………………………50
4.3.1未摻雜之二氧化鈦CL分析……………….…………...50
4.3.2低氧分壓下燒結之二氧化鈦CL分析…………………50
4.3.3摻雜氧化鈮之二氧化鈦CL分析………………………51
4.3.4摻雜氧化鑭之二氧化鈦CL分析………………………52
第五章 結果討論………………………………………………………57
5.1 X-ray分析……………………………………………………..57
5.2 顯微組織分析…………………………………………………57
5.3 陰極螢光分析…………………………………………………57
第六章 結論……………………………………………………………60
第七章 未來工作………………………………………………………61
參考資料……………………………………………………………….62

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