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博碩士論文 etd-0630115-162142 詳細資訊
Title page for etd-0630115-162142
論文名稱
Title
以氧化亞銅為基礎的光伏元件開發
Study of Cu2O-based photovoltaic devices
系所名稱
Department
畢業學年期
Year, semester
語文別
Language
學位類別
Degree
頁數
Number of pages
55
研究生
Author
指導教授
Advisor
召集委員
Convenor
口試委員
Advisory Committee
口試日期
Date of Exam
2015-07-14
繳交日期
Date of Submission
2015-08-02
關鍵字
Keywords
環氮法、太陽能電池元件、氧化亞銅、反應式射頻濺鍍、氧化鋅
Nitrogen, Solar cell, RF magnetron sputtering, ZnO, Cu2O
統計
Statistics
本論文已被瀏覽 5705 次,被下載 49
The thesis/dissertation has been browsed 5705 times, has been downloaded 49 times.
中文摘要
近年來原油供應難以維繫穩定,尋找替代能源逐漸成為全世界的一項趨勢,比起其他形式的替代能源,太陽能電池因理論效率較高且技術發展成熟而獲得青睞。薄膜型太陽能電池,在同一受光面積下可大幅減少材料的使用量,若與濺鍍(sputtering)技術搭配,可以有效的降低生產成本。
  氧化亞銅(Cu2O)具有較低的直接能隙(2eV),吸收的頻段恰好落在可見光波長的範圍,很適合作為太陽能電池的吸收層,理論上應用於光伏元件會有很高的效率,一直以來持續有人研究。
  本文以磁控式射頻濺鍍法製作氧化亞銅薄膜,混合氣體總通量30 sccm(氧氣1.5sccm、氬氣18.5sccm、氮氣10sccm)、濺鍍功率55W、基板溫度200℃的濺鍍製程可獲得單一晶相的氧化亞銅薄膜,分析其特性與表面結構,再與氧化鋅(ZnO)搭配組成P-N異質結構,最後以此異質接面結構作為太陽能電池元件的基礎製作太陽能電池元件,並在模擬太陽光照的條件下量測轉換效率,獲得I-V曲線通過第四象限的表現。
Abstract
In recent years, it is becoming difficult to maintain the stability of the crude oil supply. Therefore, the research for renewable energy has become a global trend. Solar cells have gained lots of attentions because of their theoretically high efficiency and the mature fabrication technology. In the field of thin-film solar cell, the required amount of materials can be greatly cut down and the fabrication cost can be effectively reduced with the help of sputtering technique. Cu2O possesses a relatively low direct band gap (2eV), so the absorption spectrum appropriately falls in the range of visible light. It is very suitable as the absorption layer of solar cells.
In this thesis, RF magnetron sputtering method is used to manufacture Cu2O thin film. The dependence of fabricating condition and the surface structure of Cu2O are studied. With the gas flux of 30 sccm (oxygen 1.5 sccm, argon 18.5 sccm, nitrogen 10 sccm), sputtering power of 55W, and the substrate temperature of 200℃, a single phase Cu2O thin film can be obtained. The characteristics of the solar cell with the configuration of Ni/Cu2O/ZnO/ITO are also discussed in this thesis.
目次 Table of Contents
致謝 2
摘要 3
Abstract 4
目錄 5
圖目錄 6
表目錄 7
第一章 緒論 8
1-1 前言 8
1-2 研究動機與目的 10
1-3 各章提要 13
第二章 理論基礎 14
2-1  太陽能電池介紹 14
2-2 濺鍍 19
2-3 反應式濺鍍 23
2-4 薄膜形成機制 25
第三章 實驗裝置與元件製作 27
3-1 實驗流程 27
從最初的濺鍍薄膜到最後製作元件的步驟,本文的實驗流程如下所示: 27
3-2 薄膜成長 28
3-3 薄膜量測與儀器介紹 30
3-3-1 表面輪廓儀(Surface Profiler) 30
3-3-2 雙晶薄膜x光繞射儀(X-ray diffractometer,XRD) 31
3-3-3 場發射行掃描式電子顯微鏡(field emitter-scanning electron microscope) 35
3-3-4 太陽光模擬器(Solar simulator) 37
第四章 結果與討論 39
4-1 氧氣分壓對濺鍍氧化亞銅(Cu2O)薄膜的影響 39
4-2 濺鍍功率與氧化亞銅成膜的關係 42
4-3 太陽能電池元件製作 44
4-4 利用退火(annealing)促進薄膜的平整 46
4-5 利用環氮法改善元件的短路電流 48
第五章 總結 51
參考文獻 52
參考文獻 References
[1] S. N. Agbo, S. Dobrovolskiy, G. Wegh, R. A. C. M. M. van Swaaij, F. D. Tichelaar, P. Sutta, and M. Zeman, "Structural analyses of seeded thin film microcrystalline silicon solar cell," Progress in Photovoltaics, vol. 22, pp. 346-355, Mar 2014.
[2] M. A. Green, Solar cells : operating principles, technology, and system applications. Englewood Cliffs, NJ: Prentice-Hall, 1982.
[3] T. D. Golden, M. G. Shumsky, Y. C. Zhou, R. A. VanderWerf, R. A. VanLeeuwen, and J. A. Switzer, "Electrochemical deposition of copper(I) oxide films," Chemistry of Materials, vol. 8, pp. 2499-2504, Oct 1996.
[4] B. P. Rai, "Cu2o Solar-Cells - a Review," Solar Cells, vol. 25, pp. 265-272, Dec 1988.
[5] S. Licht, P. A. Ramakrishnan, D. Faiman, E. A. Katz, A. Shames, and S. Goren, "Photoaction, temperature and O-2 depletion effects in fullerene photoelectrochemical solar cells," Solar Energy Materials and Solar Cells, vol. 56, pp. 45-56, Dec 1998.
[6] G. Sun, "Intersubband approach to silicon based lasers-circumventing the indirect bandgap limitation," Advances in Optics and Photonics, vol. 3, pp. 53-87, Mar 2011.
[7] M. D. Archer and M. A. Green, Clean electricity from photovoltaics, 2nd edition. ed.
[8] H. J. Möller, Semiconductors for solar cells. Boston: Artech House, 1993.
[9] S. Schiller, K. Goedicke, J. Reschke, V. Kirchhoff, S. Schneider, and F. Milde, "Pulsed Magnetron Sputter Technology," Surface & Coatings Technology, vol. 61, pp. 331-337, Dec 3 1993.
[10] D. M. Mattox, "Particle Bombardment Effects on Thin-Film Deposition - a Review," Journal of Vacuum Science & Technology a-Vacuum Surfaces and Films, vol. 7, pp. 1105-1114, May-Jun 1989.
[11] B. N. Chapman, T. A. Hansen, and V. J. Minkiewicz, "The Implication of Flow-Rate Dependencies in Plasma-Etching," Journal of Applied Physics, vol. 51, pp. 3608-3613, 1980.
[12] K. Yamashita, T. Arashi, K. Kitagaki, S. Yamada, T. Umegaki, and K. Ogawa, "Preparation of Apatite Thin-Films through Rf-Sputtering from Calcium-Phosphate Glasses," Journal of the American Ceramic Society, vol. 77, pp. 2401-2407, Sep 1994.
[13] 吳致慶, "鋁靶材材料檢測與薄膜濺鍍," 國立中山大學光電工程學系硏究所碩士論文, 2012.
[14] 溫金瑞, "直流式磁控濺鍍鈷膜於矽基板之結構變化與應用於OME製程之研究," 國立成功大學材料科學及工程學系碩士班論文, 2002.
[15] http://basin.earth.ncu.edu.tw/XRD/xrd-introduction.htm.
[16] J. Drenth and J. Mesters, Principles of protein x-ray crystallography, 3rd ed. New York: Springer, 2007.
[17] H. P. Klug and L. E. Alexander, X-ray diffraction procedures for polycrystalline and amorphous materials, 2d ed. New York,: Wiley, 1974.
[18] P. Gnanamoorthy, V. Karthikeyan, and V. A. Prabu, "Field Emission Scanning Electron Microscopy (FESEM) characterisation of the porous silica nanoparticulate structure of marine diatoms," Journal of Porous Materials, vol. 21, pp. 225-233, Apr 2014.
[19] S. H. Lee, S. J. Yun, and J. W. Lim, "The Characteristics of Cu2O Thin Films Deposited Using RF-Magnetron Sputtering Method with Nitrogen-Ambient," Etri Journal, vol. 35, pp. 1156-1159, Dec 2013.
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