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博碩士論文 etd-0701103-181959 詳細資訊
Title page for etd-0701103-181959
論文名稱
Title
高分子光波導之製作與特行量測
Fabrication and Characterization of Polyimide Optical Waveguides
系所名稱
Department
畢業學年期
Year, semester
語文別
Language
學位類別
Degree
頁數
Number of pages
34
研究生
Author
指導教授
Advisor
召集委員
Convenor
口試委員
Advisory Committee
口試日期
Date of Exam
2003-06-06
繳交日期
Date of Submission
2003-07-01
關鍵字
Keywords
高分子、光波導
optical waveguides, polyimide
統計
Statistics
本論文已被瀏覽 5680 次,被下載 5204
The thesis/dissertation has been browsed 5680 times, has been downloaded 5204 times.
中文摘要
本論文是研究如何利用高分子材料在矽基板上製作光波導,並量測光波導的特性。
首先,我們利用BPM-CAD光場模擬軟體設計光波導之結構,再依照計算結果製作光波導。接著,我們將不同的高分子材料塗鋪在矽基板上,作為光波導之底披覆層(Bottom cladding)及導光層(Core),以適當溫度烘烤(Cure)使高分子固化,並以稜鏡耦合儀(Prism coupler)量測材料之折射率。光波導之折射率對比(Index contrast)為0.67 %,我們使用脊樑式(Ridge)的結構在光波導的水平方向產生導光效應。再鋪上頂披覆層(Top cladding)完成高分子光波導。
最後,將完成之光波導,以回切法(Cut-back method)量測光波導之傳輸損耗為2.4 dB/cm。
Abstract
Polymer based optical waveguides on silicon substrate were fabricated and the characteristics of the polyimide used were investigated.
The optical waveguides were designed according to the simulation results calculated by beam propagation method. The fabrication began with spinning and curing two polyimide materials as the cladding and the core layers on silicon substrate. The refractive index of polyimide was obtained by prism coupling system. The index contrast was 0.67 % and the waveguide was the ridge type structure obtained by reactive ion etching process. Then a top cladding was spun on the sample and cured to complete the waveguide fabrication.
Finally, the propagation loss of the TE mode of the waveguides was measured by using cut-back method. The loss was 2.4 dB/cm.
目次 Table of Contents
第一章 導論
第二章 高分子材料之特性
2-1 高分子材料特性之量測及分析
2-2 烘烤條件與材料折射率之關係
2-2-1 最終烘烤溫度和折射率之關係
2-2-2 升溫速率和折射率之關係
2-3 成長蝕刻保護層
2-3-1 保護材料Al
2-3-2 保護材料Au
2-4 導光層與披覆層
2-5 結論
第三章 光波導之製作
3-1 光波導之結構與模擬
3-2 光波導之製作流程
3-3 製程成果與分析
第四章 光波導之量測與分析
4-1 量測系統
4-2 量測結果與分析
第五章 結論
參考文獻 References
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8. Jae-Wook Kang, Joon-Sung Kim, and Jang-Joo Kim, “Optimized oxygen plasma etching of polycarbonate for low-loss optical waveguide fabrication,” Jpn. J. Appl. Phys., vol. 40, pp. 3215-3219, 2001.
9. Y. T. Kim, S. M. Cho, Y. G. Seo, H. D. Yoon, and Y. M. Im, “Influence of hydrogen on SiO2 thick film deposited by PECVD and FHD for silica optical waveguide,” Cryst. Res. Technol., vol. 37, pp. 1257-1263, 2002.
10. Masao Kawachi, “Silica waveguides on silicon and their application to integrated-optic components,” Opt. Quantum Electron., vol. 22, pp. 391-416, 1990.
11. Martin Hoffmann, Peter Kopka, and Edgar Voges, “Low-loss fiber-matched low-temperature PECVD waveguides with small-core dimensions for optical communication systems,” IEEE Photon. Technol. Lett., vol. 9, pp. 1238-1240, 1997.
12. P. W. Leech, M. F. Faith, C. M. Johnson, M. C. Ridgway, and M. Bazylenko, “Channel waveguides formed by ion implantation of PECVD grown silica,” IEE Proc.-Optoelectron., vol. 144, pp. 97-100, 1997.
13. 殷壽志, “製作與量測以BCB/Ta2O5/SiO2為結構之抗共振反射波導,” 國立中山大學光電工程研究所碩士論文, 2002。
14. 李沛宸, “1×2 Y-branch之大角度偏折波導分光器,”國立中山大學光電工程研究所碩士論文, 2002。
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