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博碩士論文 etd-0709108-203130 詳細資訊
Title page for etd-0709108-203130
論文名稱
Title
熔融石英奈米壓痕之有限元素模擬
Finite Element Simulation of Nanoindentation on Fused Silica
系所名稱
Department
畢業學年期
Year, semester
語文別
Language
學位類別
Degree
頁數
Number of pages
93
研究生
Author
指導教授
Advisor
召集委員
Convenor
口試委員
Advisory Committee
口試日期
Date of Exam
2008-06-18
繳交日期
Date of Submission
2008-07-09
關鍵字
Keywords
熔融石英、奈米壓痕、有限元素法
Nanoindentation, Fused silica, Finite element method
統計
Statistics
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中文摘要
  本文旨在探討熔融石英在奈米壓痕下所展現出的相關特性。先用實驗求得熔融石英的機械性質,再用有限元素更進一步了解熔融石英內部變化的情形。本文首重在於模擬,包含不同摩擦係數、不同頂部圓弧半徑、不同壓痕深度下材料所展現出的特性,甚至於基板效應我們都有加入討論。
  首先,我們利用奈米量測系統找出熔融石英之負載-位移曲線,接著,我們對照實驗數據與模擬結果,成功建構出如同實驗負載-位移曲線般的三維有限元素模型,並且也找出了熔融石英本身的降伏強度與應變硬化趨勢。
  在變化摩擦係數與頂部圓弧半徑的情形下,經由負載-位移曲線與等效應力圖,我們並沒有發現任何顯著的變化。在不同壓痕深度的情形下,我們成功找出負載-位移曲線與等效應力變化的趨勢,並且加以驗證了模擬的可靠性。在基板效應方面,經由無因次化硬度的判讀,我們並沒有找到顯著的基板效應範圍,唯有薄膜與塊材彈性模數一致的情形下,壓痕深度低於總深度五分之ㄧ時,才能找到薄膜本身的機械性質。
Abstract
  The purpose of thesis is to study the responses of nanoindentation in fused silica. By experiments the mechanical properties of intrinsic fused silica were obtained. From the finite element simulation the response of material was estimated. Our main work is on simulation. This part includes the effects of different coefficient of friction, different indentation depth, tip rounding, and substrates of thin films.
  First, the experimental load–displacement curves were obtained through the nanoindentation sensing system. Then, a three-dimensional finite element was successfully modeled through the comparison of the load–displacement curves of the experiment and the simulation. The yield stress and the strain-hardness trend of intrinsic fused silica were obtained.
  For different coefficient of friction and different tip radii, no significant differences were found through the load–displacement curves and von Mises stress distributions. For different indentation depths, varied trends were found through the load–displacement curves and von Mises stress distributions. For substrate effect, no significant differences could be found through the normalized hardness. The intrinsic film hardness could be obtained for indentation depth less 20% of the total indentation depth.
目次 Table of Contents
摘要 ………………………………………………………Ⅰ
英文摘要 …………………………………………………Ⅱ
目錄 ………………………………………………………Ⅲ
表目錄 ……………………………………………………Ⅵ
圗目錄 ……………………………………………………Ⅶ
第一章 緒論 ………………………………………………1
1-1 前言 ……………………………………………………1
1-2 文獻回顧 ………………………………………………1
1-3 組織與章節 ……………………………………………6
第二章 研究理論 …………………………………………8
2-1 奈米壓痕量測之原理 …………………………………8
2-2 硬度與彈性模數之計算 ………………………………8
2-2-1 大量點卸載方法 …………………………………11
2-2-2 單一點卸載方法 …………………………………12
2-3連續勁度量測 ………………………………………13
第三章 實驗工作 …………………………………………19
3-1 實驗材料 ……………………………………………19
3-2 儀器設備 ……………………………………………19
3-3 Nano indenterXP 操作流程 ………………………19
3-3-1 試片的置放 ………………………………………19
3-3-2 軟體的操作 ………………………………………20
3-3-3 模式設定 …………………………………………21
3-4 VHX-100 操作流程 ………………………………… 23
3-4-1 準備流程 …………………………………………23
3-4-2 量測流程 …………………………………………24
第四章 數值模擬 …………………………………………29
4-1 ANSYS Multiphysics ………………………………29
4-1-1 基本構想 …………………………………………29
4-1-2 工作原理 …………………………………………31
4-2 演算法 ………………………………………………32
4-3 基本元素 ……………………………………………34
4-4 工作環境 ……………………………………………35
4-5 模擬流程 ……………………………………………35
4-5-1開始的準備 …………………………………………36
4-5-2前置處理 ……………………………………………36
4-5-3 求解(Solution) ……………………………………39
4-5-4後置處理 ……………………………………………41
第五章 分析與結果 ………………………………………47
5-1 實驗結果 ……………………………………………47
5-2 模擬結果 ……………………………………………47
5-2-1 參數變化 …………………………………………48
5-2-1-1 摩擦係數 ………………………………………48
5-2-1-2 圓弧 ……………………………………………50
5-2-1-3 壓痕深度 ………………………………………51
5-2-1-4 基板效應 ………………………………………52
5-2-1-4-1 薄膜低於塊材其彈性模數 …………………54
5-2-1-4-2 薄膜與塊材彈性模數一致 …………………55
5-2-1-4-3 薄膜高於塊材其彈性模數 …………………56
第六章 結論 ………………………………………………77
參考文獻 …………………………………………………80
參考文獻 References
1.Liou H.C. and Pretzer J., 1999, “Effect of Film Thickness and Cure Temperature on the Mechanical Properties of Fox Flowable Oxide Thin Films”, Materials Research Society Symposium Proceedings, Vol.565, pp.239-246.
2.Pethica J.B., Hutchings R., and Oliver W.C., 1983, “Hardness measurements at penetration depths as small as 20 nm,” Philos. Mag. A 48, pp.593.
3.Oliver W.C., Hutchings R., and Pethica J.B., 1986, in ASTM STP 889, edited by P. J. Blau and B.R. Lawn, American Society for Testing and Materials, Philadelphia, PA, pp.90-108.
4.Doerner M.F. and Nix W.D., 1986, “A method for interpreting the data depth-sensing indentation instruments,” J. of Materials Res. Vol. 1, pp.601.
5.Pethica J.B., 1982, “in Ion Implantation into Metals”, edited by V. Ashworth, W. Grant, and R. Procter, Pergamon Press, Oxford, pp.147-156.
6.Loubet J.L., Georges J.M., Marchesini O., and Meille G., 1984, J. Tribology Vol. 106, pp.43.
7.Newey D., Wilkens M.A., and Pollock H.M. , 1982, J. Phys. E: Sci. Instrum. Vol. 15, pp.119.
8.Stone D., LaFontaine W.R., Alexopoulous P., Wu T-W., and Che-Yu Li, 1988, J. Mater. Res. 3, pp.141.
9.Boussinesq J., 1855, “Applications des Potentiels a l,etude de equilibre et du movement de solides elastiques”, Gauthier-Villars, Paris.
10.Hertz H., 1822, J. Reine und Angewandte Mathematik Vol. 92, pp.156.
11.Johnson K.L., 1985, Contact Mechanics, Cambridge University Press, Cambridge.
12.Love, A.E.H., 1929, Philos. Trans. A 228, pp.377.
13.Love, A.E.H., 1939, Quart. J. Math. Vol. 10, pp.161.
14.Sneddon I.N., 1965, “The Relation between Load and Penetration in the Axisymmetric Boussinesq Problem for a Punch of Arbitrary ProfileInt,” J. Engng. Sci. Vol. 3, pp.47.
15.Harding J.W. and Sneddon I.N., 1945, Proc. Cambridge Philos. Soc. Vol. 41, pp.12.
16.Tabor D., 1948, Proc. R. Soc. A 192, pp.247.
17.Stillwell N.A. and Tabor D., 1961, “Elastic Recovery of Conical Indentations”, Proceedings Physical. Society, London, Vol. 78, pp.169.
18.Ternovskii A.P., Alekhin V.P., Shorshorov M.Kh., Khrushchov M.M., and Skvortsov V.N., 1978, Zavod. Lab. Vol. 39, pp.1242.
19.Bulychev S. I., Alekhin V. P., Shorshorow M. Kh., Ternovskii A. P., and Shnyrev G. D., 1975, Zavod. Lab., Vol. 41, pp.1137.
20.Bulychev S.I., Alekhin V.P., Shorshorov M.Kh., and Ternovskii A.P., 1976, Prob. Prochn. Vol. 9, pp.79.
21.Shorshorov M.Kh., Bulychev S.I., and Alekhin V.P., 1982, Sov. Phys. Dokl. Vol. 26, pp.769.
22.Bulychev S.I. and Alekhin V.P., Zavod. Lab. Vol. 53, pp. 76, 1987.
23.Pharr G. M., Oliver W.C., and Brotzen F.R., 1992, “On the Generality of the Relationship Among Contact Stiffness, Contact Area, and Elastic Modulus During Indentation”, Journal of Materials Res. Vol. 7, pp.613-617.
24.King R.B., 1987, “Elastic analysis of some punch problems for a layered medium, “Int. J. Solids Structures, Vol. 23, No. 12, pp.1657-1664.
25.Sneddon I.N., 1948, “Boussinesq,s problem for a rigid cone,” Proc. Cambridge Philos. Soc. Vol. 44, pp.492-507.
26.Oliver W.C. and Pharr G.M., 1992, “An improved technique for determining hardness and elastic modulus using load and displacement sensing indentation experiments,” J. Mater. Res. Vol. 7, No. 4, pp.1564-1583.
27.Woirgard J. and Dargenton J-C., 1997, “An alternative method for penetration depth determination in nanoindentation measurements,“ J. Mater. Res. Vol. 12, No.9, pp.2455-2458.
28.Sawa T. and Tanaka K., 2001, “Simplified method for analyzing nanoindentation data and evaluating performance of nanoindentation instruments,” J. Master. Res. Vol. 16, No. 11, pp.3084-3096.
29.Bolshakov A. and Pharr G.M., 2002, “Understanding nanoindentation unloading curves,” J. Mater. Res. Vol. 17, No.10, pp.2660-2671.
30.Wang T.H., Fang T.H. and Lin Y.C., 2007, “A numerical study of factors affecting the characterization of nanoindentation on silicon”, Materials Science and Engineering A 447, pp.244–253.
31.Howell J.A., Hellmann J.R. and Muhlstein C.L. , 2008, “Correlations between free volume and pile-up behavior in nanoindentation reference glasses”, Materials Letters, Volume 62, Issue 14, pp.2140-2142.
32.Wang T.H., Fang T.H. and Lin Y.C., 2007, “Analysis of the substrate effects of strain-hardening thin films on silicon under nanoindentation”, Appl. Phys. A 86, pp. 35–341.
33.Fischer-Cripps and Anthony C., 2004, “Nanoindentation”, Springer, pp.47-51.
34.李輝煌, 2005, “ANSYS工程分析”, 高立圖書, pp.31-37, pp.428-442.
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