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論文名稱 Title |
鋯鈦與鋯銅非晶質薄膜之濺鍍製備與性質分析 Preparation and Characterization of Sputtered Zr-Ti and Zr-Cu Thin Film Metallic Glasses |
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系所名稱 Department |
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畢業學年期 Year, semester |
語文別 Language |
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學位類別 Degree |
頁數 Number of pages |
112 |
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研究生 Author |
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指導教授 Advisor |
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召集委員 Convenor |
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口試委員 Advisory Committee |
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口試日期 Date of Exam |
2007-06-28 |
繳交日期 Date of Submission |
2007-07-11 |
關鍵字 Keywords |
濺鍍、非晶質、薄膜 Thin Film, Sputtered, amorphous |
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統計 Statistics |
本論文已被瀏覽 5646 次,被下載 1212 次 The thesis/dissertation has been browsed 5646 times, has been downloaded 1212 times. |
中文摘要 |
本實驗中使用直流濺鍍法,利用濺鍍多層膜以及共濺鍍製程的不同,以不同之純金屬靶材濺鍍合成出不同成份之薄膜。由於鋯基非晶質合金具有耐腐蝕特性與良好之機械性質,且有較佳的熱穩定性與玻璃形成能力。加上已有人成功利用累積滾壓接合法 (ARB)合成出 Zr-Ti 和 Zr-Cu 二元非晶質合金。所以本實驗選擇以 Zr-Ti 和 Zr-Cu 作為研究材料,因此我們在這要利用濺鍍系統濺鍍出 Zr-Ti 和 Zr-Cu 非晶質薄膜,並藉由各種不同之分析探討薄膜厚度與薄膜退火時間之間的關係,以及薄膜成份與玻璃形成能力之間的關係。由於多層膜製程必須經由真空熱處理來造成擴散以達成非晶質化,因此會牽涉到混合熱大小的問題,混合熱約為零之 Zr-Ti 多層膜,由於擴散現象較不明顯,較不易形成非晶質薄膜。而混合熱為負值之 Zr-Cu 多層膜,熱處理後較易形成非晶質薄膜。共濺鍍製程則是要控制基板之溫度,基板之溫度控制於靶材電壓高低以及濺鍍速率,溫度過高會使得薄膜結晶化。而 Zr-Ti 共濺鍍薄膜其混合熱約為零,易形成固溶態,因此不易形成非晶質薄膜。但是 Zr-Cu 共濺鍍薄膜其混合熱為負值並且半徑差比例大於12%,因此易形成非晶質薄膜。而 Zr-Ti 多層膜薄膜經過退火發現 XRD 繞射分析無明顯之變化,是由於混合熱趨近於零,擴散較不明顯現象。而 Zr-Cu 具負混合熱,經過退火進行擴散,經由 XRD 繞射分析可得到寬化之曲線。然而 Zr-Ti 和 Zr-Cu 之共濺鍍薄膜在一定的條件下,皆可得到XRD 繞射之寬化曲線。其後再以 DSC、SEM 和 TEM 觀察薄膜的結構變化,以及成份之關係。 |
Abstract |
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目次 Table of Contents |
目錄..................................................................................................................................................I 表目錄...........................................................................................................................................IV 圖目錄.............................................................................................................................................V 摘要............................................................................................................................................ VIII 第一章 前言....................................................................................................................................1 1-1 簡介............................................................................................................................1 1-2 鋯基非晶質合金........................................................................................................2 1-3 研究目的....................................................................................................................2 第二章 理論背景............................................................................................................................4 2-1 非晶質合金的發展....................................................................................................4 2-2 非晶質合金的種類....................................................................................................5 2-3 非晶質合金的製程....................................................................................................5 2-4 非晶質合金的特性....................................................................................................8 2-4-1 機械性質.........................................................................................................8 2-4-2 化學性質.........................................................................................................8 2-4-3 物理性質.........................................................................................................9 2-5 真空濺射鍍膜層積原理............................................................................................9 2-5-1 薄膜沉積..........................................................................................10 2-5-2 電漿的產生...................................................................................................10 2-5-3 輝光放電.......................................................................................................11 2-5-4 濺射方法.......................................................................................................12 2-5-5 影響附著力的因素.......................................................................................13 2-5-6 影響濺射率的因素.......................................................................................14 2-5-7 影響成分的因素...........................................................................................15 2-6 論文回顧..................................................................................................................16 第三章 實驗步驟..........................................................................................................................21 3-1 實驗設備..................................................................................................................21 3-1-1 濺鍍系統.......................................................................................................21 3-1-2 真空熱處理系統...........................................................................................22 3-2 實驗分析儀器..........................................................................................................22 3-2-1 雷射掃描共軛焦顯微鏡...............................................................................22 3-2-2 XRD 繞射分析.............................................................................................23 3-2-3 DSC 熱分析..................................................................................................23 3-2-4 SEM 掃描式電子顯微鏡與 EDS 能譜元素分析.....................................24 3-2-5 F I B 雙束型聚焦離子束顯微鏡...............................................................24 3-2-6 TEM 穿透式電子顯微鏡與 SAD 擇域繞射分析.....................................24 第四章 實驗結果..........................................................................................................................26 4-1 利用多層膜與共濺鍍製程形成 Zr-Ti 薄膜..........................................................27 4-1-1 DSC 熱分析..................................................................................................27 4-1-2 XRD 繞射分析.............................................................................................27 4-1-3 SEM 掃描式電子顯微鏡與 EDS 能譜元素分析......................................30 4-1-4 TEM 穿透式電子顯微鏡............................................................................ 31 4-2 利用多層膜與共濺鍍製程形成 Zr-Cu 薄膜........................................................32 4-2-1 DSC 熱分析..................................................................................................32 4-2-2 XRD 繞射分析.............................................................................................33 4-2-3 SEM 掃描式電子顯微鏡與 EDS 能譜元素分析......................................34 4-2-4 TEM 穿透式電子顯微鏡.............................................................................35 第五章 分析與討論......................................................................................................................37 5-1 Zr-Ti 多層膜薄膜的分析與討論.............................................................................37 5-2 Zr-Ti 共濺鍍薄膜的分析與討論.............................................................................38 5-3 Zr-Cu 多層膜薄膜的分析與討論...........................................................................39 5-4 Zr-Cu 共濺鍍薄膜的分析與討論...........................................................................40 5-5 Zr-Ti 與 Zr-Cu 之比較與討論............................................................................41 第六章 結論..................................................................................................................................43 參考文獻........................................................................................................................................45 表....................................................................................................................................................48圖....................................................................................................................................................61 |
參考文獻 References |
1. A. Inoue, Mater. Sci. Eng. A, 304-306 (2001), pp. 1-10. 2.尹邦耀, 奈米時代, 五南圖書,(2002), pp. 3-4. 3. J. Kramer, Z. Phys, 106 (1937), pp. 675-701. 4. J. Kramer, Ann. Phys, 137 (1934), pp. 37-64. 5. A. Bremer, D. E. Couch and E. K. Williams, J. Res. Natl. Bur. Stand., 44 (1950), pp. 109-122. 6. W. Klement, R. H. Wilens and P. Duwez, Nature, 187 (1960), pp. 869-874. 7. J. Bloch. J, Nucl. Mater., 6, (1962), pp. 203-205. 8. S. Mader, J. Vacuum Sci. Tech., 2 (1965), pp. 35-41. 9. R. B. Schwarz and W. L. Johnson, Phys. Rev. Lett., 51, (1983), pp. 415-418. 10. E. Brandstetter, C. Mitterer and R. Ebner, Thin Solid Films, 201 (1991), pp. 123-135. 11. P. J. Hsieh, Y. P. Hung and J. C. Huang, Scripta Mater., 49, (2003), pp. 173-178 . 12. K. U. Tu and R. Rosenberge, Thin Solid Films, 13 (1976), pp.163-165. 13. R. W. Cahn, P. Hassen and E. J. Kramer (ed), Materials Science and Technology, Vol.9, New York, USA, 1991 , pp. 508-509. 14. A. Inoue, T. Zhang and T. Masumoto, J. Non-Cryst. Solids, 156-158 (1993), pp. 473-480. 15. A. Inoue, Mater. Trans. JIM, 36 (1995), pp. 866-875. 16. A. Inoue, Mater. Sci. Forum, 179-181 (1995), pp. 691-700. 17. A. Inoue, A. Takeuchi and T. Zhang, Metall. Mater. Trans., A29 (1998), pp. 1779-1793. 18. H. S. Chen, H. J. Leamy and C. E. Miller, Annu. Rev. Mater. Sci., 10 (1980), pp. 363-391. 19. W. Paul and R. J. Temkin, Adv. Phys., 22 (1973), pp. 581-641. 20. K. L. Chapra, Thin Film Phenomena, McGraw-Hill, (1985), pp. 1969-1972. 21. Z. P. Xing, S. B. Kang and H. W. Kim, Metall. Mater. Trans., A33 (2002), pp. 717-722. 22. Y. Saito, H. Utsunomiya, N. Tsuji and T. Sakai, Acta Mater., 47 (1999), pp. 579-583. 23. R. Liu, J. Li, K. Dong, C. Zheng and H. Liu, Mater. Sci. Eng., B94 (2002), pp. 141-148. 24. P. S. Grant, Prog. Mater. Sci., 39 (1995), pp. 497-545. 25. C. R. M. Afonso, C. Bolfarini, C. S. Kiminami, N. D. Bassim, M. J. Kaufman, M. F. Amateau, T. J. Eden and J. M. Galbraith, J. Non-Cryst. Solids, 44 (2001), pp. 1625-1628. 26. 吳學陞,工業材料, 149 (1999), pp. 154-155. 27. A. Inoue, Bulk Amorphous Alloys Practical Characteristics and Applications Institute for Material Research, Tohoku University, Sendai, Japan, 1999. 28. H. -J. Guntherodt and H. Beck (ed), Glassy MetalsⅠ, Springer-Verlag, Berlin Heidelberg, Germany, 1981. 29. A. Inoue, K. Nakazato, Y. Kawamura, A. P. Tsai and T. Masumoto, Mater. Trans., JIM, 35 (1994), pp. 95-102. 30. 朱瑾,工業材料, 209 (2004), pp. 92-98. 31. 金曾孫,薄膜製備技術及其應用, (1989), pp. 2-3. 32. 行政院國家科學委員會, 真空技術與應用, (2001), pp. 371-375. 33. R. Ondo-Ndong and F. Pascal-Delannoy, Mater. Sci. Eng., B97 (2003), pp. 68-73. 34. K. Sasaki, H. Nagai and T. Hata, Vacuum, 59 (2000), pp. 397-402. 35. 唐偉忠,薄膜材料製備原理、技術及應用, (2005), pp. 59-63. 36. T. G. Nieh, T. W. Barbee and J. Wadsworth, Scripta Mater., 41 (1999), pp. 929-935. 37. J. D. Busch, A. D. Johnson, C. H. Lee and D. A. Stevenson, J. Appl. Phys., 68 (1990), pp. 6224-6228. 38. V. Srinivasarao, R. Jayaganthanl, V. N. Sekharl, K. Mohankumar and A. A. O. Tay, Electronics Packaging Technology Conference, (2004), pp. 343-347. 39. J. Dudonis, R. Brucas and A. Miniotas, Thin Solid Films, 275 (1996), pp. 164-167. 40. W. S. Lai and B. X. Liu, Phys. Rev. B, 58 (1998), pp. 6063-6073 41. W. J. Meng, B. Fultz, E. Ma and W. L. Johnson, Appl. Phys. Lett., 51 (1987), pp. 661-663. 42. H. F. Winters, D. L. Raimondi and D. E. Horne, J. Appl. Phys., 40 (1969), pp. 2996-3006. 43. J. Z. Chen and S. K. Wu, Thin Solid Films, 339 (1999), pp. 194-199. 44. J. Z. Chen and S. K. Wu, J. Non-Cryst. Solids, 288, (2001), pp.159-165. 45. H. S Chen and B.K. Park, Acta Metall, 21, (1973), pp. 395-400. 46. H. S Chen, Acta Metall, 22 (1974), pp. 897-900. 47. A. R. Miedema, Philips Tech. Rev. 36 (1976), pp. 217-231. 48. B. S. Murty, S. Ranganathan and M. Mohan Rao, Mater. Sci. Eng. A 149 (1992), pp. 231-240. 49. J. A. Thorton, J. Vacuum Sci. Tech., 11 (1974), pp. 666-670. 50. J. A. Thorton, J. Vacuum Sci. Tech., 12 (1975), pp. 830-835. 51. H. R. Wang, Y. F. Ye, Z. Q. Shi, X. Y. Teng and G. H. Min, J. Non-Cryst. Solids, 311, (2002), pp 36–41. 52. 張喜燕,鈦合金及應用, (2005), pp. 21-22. 53. R. H Zee, J. F. Watters and R. D. Davidson, Phys. Rev. B, 34, (1986), pp. 6895-6901. 54. 謝佩汝, 鋯基合金於累積滾壓製程中之奈米細晶化與非晶質化研究,國立中山大學 材料科學研究所博士論文, 2005. 55. 洪子翔, 添加硼與矽對鋯鋁銅鎳非晶質合金結晶之熱性質研究, 國立中山大學材料 科學研究所碩士論文, 2004. |
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