Responsive image
博碩士論文 etd-0712105-162613 詳細資訊
Title page for etd-0712105-162613
論文名稱
Title
複晶矽薄膜電晶體可靠度之研究
Inverstigation on Reliability of Poly-Silicon Thin-Film Transistor
系所名稱
Department
畢業學年期
Year, semester
語文別
Language
學位類別
Degree
頁數
Number of pages
67
研究生
Author
指導教授
Advisor
召集委員
Convenor
口試委員
Advisory Committee
口試日期
Date of Exam
2005-07-07
繳交日期
Date of Submission
2005-07-12
關鍵字
Keywords
電晶體、可靠度、複晶矽電晶體
reliability, poly, TFT, poly TFT
統計
Statistics
本論文已被瀏覽 5704 次,被下載 0
The thesis/dissertation has been browsed 5704 times, has been downloaded 0 times.
中文摘要
在這個實驗中,主要是研究晶界對於複晶矽薄膜電晶體可靠度的影響。所使用的樣本是由工研院以及友達光電所提供的。我們利用直流操作和交流操作這兩個模式去模擬複晶矽薄膜電晶體被使用後劣化的情況,利用電性方面的量測去研究晶界對於複晶矽薄膜電晶體劣化的影響。在連續橫向固體結晶複晶矽薄膜電晶體的實驗中,通道內有晶界的電晶體比較能夠抵抗直流的操作,但是卻較不能抵抗交流的操作。我們利用半導體元件模擬軟體的模擬結果來解釋這個現象
Abstract
The influence of grain boundary (GB) on stability of poly-silicon thin film transistor (TFT) have been investigated in this work. The work was supported by the National Science Council of the Republic of China and AUO. We used ac stress and dc stress conditions to stress different TFTs, and investigate the influence of grain boundary by use of electrical analysis. The SLS poly-Si TFT which does contain GB perpendicular to the channel direction owns the higher ability against dc stress and poorer ability against ac stress than the poly-Si TFT which does not contain GB. The physical mechanism for these results has been reasonably deduced by use of TFT device simulation tool (ise-tcad).
目次 Table of Contents
Contents Chinese Abstract………………………………………………i English Abstract……………………………………………...ii Figure Caption………………………………………………..v Chapter 1 – Introduction 1.1 History ……………………………………………………..............1 1.2 Technology of Polysilicon Thin-Film Transistor………………...4 1.3 Leakage current of poly Si-TFTs and defects in poly-Si Film….5 References……………………………………………………………..7 Chapter 2 - Technology of Crystallization 2.1 Metal-induced Crystallization(MIC)…………………………….11 2.2 Excimer Laser Crystallization(ELC)…………………………….13 2.3 Sequential Lateral Solidification Crystallization……………….14 Reference………………………………………………………………19 Chapter 3 - Method of Trap Extraction 3.1 Defects in poly-Si film…………………………………………….22 3.2 Seto’s model……………………………………………………….23 3.3 deep-level transient spectroscopy………………………………..25 Reference……………………………………………………………...30 Chapter 4 - Results and Discusions
4.1 The Influence of DC Stress in SLS-Poly-TFT………………….33 4.2 The Influence of AC Stress in SLS-Poly-TFT………………….36 4.3 The Influence of AC Stress in ELA-Poly-TFT………………….37 4.4 Low Temperature Measurement………………………………...41 Reference……………………………………………………………...42 Chapter 5 - Conclusion 5.1 SLS Poly-TFT…………………………………………………….43 5.2 ELA Poly-TFT……………………………………………………43
參考文獻 References
References 1. J.E. Lilienfeld, “Device for Controlling Electric Current,” US Pat. 1,900,018(1933) 2. T.P.Brody, “The Thin Film Transistor-A Late Flowering Bloom, ” IEEE Trans.Elect. Dev. ED-31, 1614(1984). 3. O. Heil, “Improvements in or Relating to Electrical Amplifiers and Other Control Arrangements and Device,” Brit. Pat. BP439,457(1935) 4. W. Shockley,”The Path to the Conception of the Junction Transistor,” IEE Trans. Elect. Dev. ED-31, 1523(1984). 5. C. A. Mead, “Shockley Barrier Gate Field-Effect Transistor,” Proc. IEEE 54, 307(1966) 6. J. Bardeen and W. H. Brattain, “The Transistor – A Semiconductor Triode,” Phys. Rev. 74, 230 (1948). 7. W. Shockley, “The Theory of p-n Junction in Semiconductors and p-n Junction Transistors,” Bell Syst. Tech. J. 28, 435 (1949) 8. W. Shockley, “A Unipolar ‘Field-Effect’ Transistor,” Proc. IEEE 40, 1365 (1952). 9. K. Ono, T. Anoyama, N. Konishi, and K. Miyata, “Analysis of currnt-voltage characteristics of low-temperature-processed polysilicon thin-film transistors,” IEEE Trans. Electron. Devices, Vol. 39, no.5, p.792, 1992. 10. M Hack, I. W. Wu, T. J. King, and A. G. Lewis, “Analysis of leakage currents in poly-silicon thin-film transistors,” in IEEE IEDM Tech. Dig., 1993, p.385. 11. A. Rodriguez, E. G.. Moreno, H. Pattynn, J. F. Nijis, and R. P. Mertens, “Model for the anomalous off current of polysilicon thin film transistors and diodes” IEEE Trans. Electron Devices, Vol.40, no.5, p.938, 1993. 12. I. W. Wu, A. G. Lewis, T. Y. Huang, W. B. Jackson, and A. Chiang, ”Mechanism and device-to –device variation of leakage current in polysil18 Refericon thin film 7
電子全文 Fulltext
本電子全文僅授權使用者為學術研究之目的,進行個人非營利性質之檢索、閱讀、列印。請遵守中華民國著作權法之相關規定,切勿任意重製、散佈、改作、轉貼、播送,以免觸法。
論文使用權限 Thesis access permission:校內校外均不公開 not available
開放時間 Available:
校內 Campus:永不公開 not available
校外 Off-campus:永不公開 not available

您的 IP(校外) 位址是 18.119.110.134
論文開放下載的時間是 校外不公開

Your IP address is 18.119.110.134
This thesis will be available to you on Indicate off-campus access is not available.

紙本論文 Printed copies
紙本論文的公開資訊在102學年度以後相對較為完整。如果需要查詢101學年度以前的紙本論文公開資訊,請聯繫圖資處紙本論文服務櫃台。如有不便之處敬請見諒。
開放時間 available 已公開 available

QR Code