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論文名稱 Title |
M面氮化鎵發光二極體元件製程改良與分析 Fabrication Improvements and Analyses of m-GaN Light Emitting Diodes |
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系所名稱 Department |
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畢業學年期 Year, semester |
語文別 Language |
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學位類別 Degree |
頁數 Number of pages |
101 |
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研究生 Author |
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指導教授 Advisor |
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召集委員 Convenor |
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口試委員 Advisory Committee |
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口試日期 Date of Exam |
2013-06-24 |
繳交日期 Date of Submission |
2013-08-14 |
關鍵字 Keywords |
發光二極體、氮化銦鎵、非極化、m面藍寶石基板 m-plane sapphire, nonpolar, InGaN, light emitting diodes |
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統計 Statistics |
本論文已被瀏覽 5697 次,被下載 555 次 The thesis/dissertation has been browsed 5697 times, has been downloaded 555 times. |
中文摘要 |
在這篇論文中,我們利用電漿輔助分子束磊晶在m面藍寶石基板上,成長m面氮化鎵薄膜,在成長的過程中,Ⅴ/Ⅲ比與成長溫度為調控的變因,藉由調變這兩種參數,成長出品質較好的薄膜,以利探討其各向異性特性。 在進行藍光發光二極體製程之前,我們利用硫化的方法對氮化鎵做表面處理,並用電子槍蒸鍍金屬電極於氮化鎵上,以傳輸線模型(TLM)量測不同表面處理下氮化鎵之特徵接觸電阻(Specific contact resistance)值ρc,藉此找出形成良好歐姆接觸之條件,接著以霍爾棒量測(Hall bar measurement)不同方向載子遷移率,以探討載子傳輸時較不會遇到阻力的方向,使之展現出良好的元件特性。 M面氮化銦鎵藍光發光二極體(p-GaN/InGaN/n-GaN),雙異質接面pin結構,薄膜之結構特性是使用X光繞射儀觀測,並以硫化銨去除表面原生氧化層,以增加電流特性,經由黃光微影製程後氮化鎵發光二極體,量測其不同電流下,電流電壓特性之關係。 |
Abstract |
M-plane GaN on the m-sapphire grown by plasma assisted molecular beam epitaxy (PAMBE) have been achieved. Ⅴ/Ⅲ ratio and growth temperature are the most important factors in the growth sequence. The surface of m-plane GaN was treated by (NH4)2S and annealing for ohmic contact condition. The specific contact resistance of m-plane p-GaN was calculated by TLM model. Furthermore, the anisotropic characteristic of p-GaN mobility was obtained by hall bar measurement. M-plane GaN based light-emitting diode was also fabricated through the photolithography process. The surface treatment effects was also discussed. |
目次 Table of Contents |
目錄 中文摘要 Abstract 圖目錄 第一章 序論 1 1.1 文獻回顧 1 1.2非極性面氮化鎵發光二極 4 1.3 目前成長m面GaN之進展 9 第二章 儀器介紹 10 2.1 分子束磊晶Plasma assisted molecular beam epitaxy (PAMBE) 10 2.2掃描式電子顯微鏡Scanning Electron Microscopy (SEM) 14 2.3 X光繞射儀(X-ray Diffraction, XRD) 16 2.4 感應耦合式電漿(Inductively-Coupled-Plasma, ICP) 19 2.5電子槍蒸鍍機 Electron beam (E-beam) 20 2.6 Van der Pauw 法量電阻率 23 第三章 m-GaN薄膜成長 27 3.1成長前之基板處理 27 3.2 M面GaN薄膜之成長 28 3.2.1 掃描式電子顯微鏡 28 3.2.2 X光繞射儀 30 3.3 M面GaN:Mg薄膜之成長 35 第四章M面GaN:Mg薄膜之分析 39 4.1 p-GaN歐姆接觸 39 4.2 TLM元件製程與量測方法 40 4.2.1樣品選取 40 4.2.2硫化處理步驟 40 4.2.3蒸鍍鎳(Ni)/金(Au)金屬電極 40 4.2.4傳輸線模型(transmission line model, TLM) 41 4.3數據分析與探討 42 4.4 載子遷移率之各向異性探討 46 4.4.1 載子的遷移率(carrier mobility) 46 4.4.2 霍爾棒量測 46 4.4.3 霍爾棒量測數據探討 50 第五章 M面p-GaN/InGaN/n-GaN 發光二極體之元件製程 52 5.1氮化銦鎵樣品結構 52 5.2 發光二極體元件製程 53 5.2.1 高台製作(Mesa) 54 5.2.2蝕刻高台(Etching Mesa) 58 5.2.3 n型電極製作 60 5.2.4 Ni(鎳)/Au(金)雙金屬薄層 62 5.2.5 p型電極製作 63 5.3 I-V curve量測 71 第六章 結論 76 參考文獻 77 附錄一 81 附錄二 88 |
參考文獻 References |
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