本研究使用方體導電高分子ESD 410C作為工具電極及多軸運動式電解複合拋光機，分別對方孔邊長12及8 mm之SKD61熱作模具鋼之內表面進行電解複合磨粒拋光。探討氧化鋁磨粒粒徑(3, 1, 0.3 μm)、加工負荷(0.3 ~ 0.5 N)、加工電流(0 ~ 200 mA)以及加工時間(0 ~ 8 min)等實驗參數，對工件內表面粗糙度Rmax 、Ra之影響。
純磨粒實驗(不通電)可得知，使用含磨粒粒徑1 μm的電解液中，在加工負荷0.4 N下，加工時間8分鐘時之工件表面粗糙度由Rmax ≒ 0.5 μm、Ra ≒ 0.12 μm降至Rmax ≒ 0.26 μm、Ra ≒ 0.059 μm。無磨粒的純電解之實驗可得知，在加工負荷0.4 N、加工電流60 mA下，加工時間8分鐘後之工件表面粗糙度Rmax ≒ 0.29 μm、Ra ≒ 0.065 μm。
兩階段的電解複合磨粒拋光實驗，第一階段係使用添加磨粒粒徑1 μm的電解液，在加工電流60 mA、加工負荷0.4 N下，加工時間4分鐘之工件表面粗糙度為Rmax ≒ 0.23 μm、Ra ≒0.052 μm。第兩階段更換磨粒粒徑為0.3 μm，其餘參數不變。經第兩階段加工後之工件之表面粗糙度Rmax ≒ 0.16 μm、Ra ≒0.029 μm，工件內表面達到光亮鏡面。
最後，在工具電極進給情況下，電解複合磨粒拋光對工件全表面進行實驗，在含磨粒粒徑1 μm的電解液中以及加工電流60 mA與負荷0.4 N下，電解複合磨粒拋光兩種邊長12與8 mm之方孔，於加工時 間24分鐘後之工件表面粗糙度達到Rmax ≒ 0.017 ~ 0.019 μm、Ra ≒ 0.037 ~ 0.041 μm，工件內表面均達成光亮鏡面。

In this study, a square shape of conductive polymer (ESD 410C) was employed as a tool electrode to electrolytic abrasive polishing the inner surface of SKD61 steel with the square hole 12 and 8 mm in length using a polishing machine with multi-axis motions. Experiments were carried out to understand effects of the alumina abrasive particle size (3, 1, and 0.3 μm), load (0.3 ~ 0.5 N), current (0 ~ 200 mA) and polishing time (0 ~ 8 min) on the surface roughness of the polished surface.
In the abrasive polishing under a load of 0.4 N and the abrasive size of 1 μm, the Rmax value decreased from 0.5 μm to 0.26 μm, and the Ra value from 0.11 μm 0.059 μm after 8 minutes. In the electrolytic polishing (no abrasive) under a load of 0.4 N and a current of 60 mA, the Rmax value decreased to 0.29 μm and the Ra value to 0.065 μm after 8 minutes.
The two-stage electrolytic abrasive polishing was conducted. In the first stage, the Rmax value decreased to 0.23 μm and the Ra value to 0.052 μm under a load of 0.4 N, the abrasive size of 1 μm, a current of 60 mA and the polishing time of 4 minutes. In the second stage, the Rmax value decreased to 0.16 μm and the Ra value to 0.029 μm using the abrasive size of 0.3 μm after 4 minutes. The polished surface achieved a bright and a smooth surface.
The electrolytic abrasive polishing with feeding was conducted. The Rmax value decreased to 0.17 ~ 0.19 μm and the Ra value to 0.037 ~ 0.041 μm under a load of 0.4 N, the abrasive size of 1 μm, a current of 60 mA and the polishing time of 24 minutes. The inner surface of the workpiece achieved a bright mirror.

論文審定書 i
致謝 ii
摘要 iii
Abstract iv
目錄 v
圖次 viii
表次 xii
第一章 緒論 1
1.1 研究背景 1
1.2 文獻回顧 4
1.2.1 電化學加工演變 4
1.2.2 電解複合磨粒拋光法 9
1.2.3 電解液 14
1.2.4 導電高分子材料作為工具電極 14
1.2.5 磨粒 15
1.3 研究目的 17
第二章 實驗設備與實驗方法 18
2.1 電解複合磨粒方孔內表面拋光加工實驗設備及實驗方法 18
2.1.1 多軸運動式電解複合磨粒拋光機系統 18
2.1.2 工具電極之進給模組 20
2.1.3 工具電極旋轉與往復運動模組 20
2.1.4 工件之迴轉與施力模組 20
2.1.5 電壓電流供應系統 21
2.1.6 電解液循環系統 21
2.2 實驗資料量測設備 22
2.3 實驗材料之特性與幾何形狀 23
2.3.1 工件材料與幾何形狀 23
2.3.2 工件之量測治具 24
2.3.3 工具電極 26
2.3.4 工具電極幾何形狀 27
2.3.5 電解液的選擇 28
2.4 實驗材料之前處理方式 30
2.4.1 SKD61工件實驗前處理 30
2.4.2 工具電極前處理 31
2.5實驗流程 33
第三章 實驗結果與討論 36
3.1 純磨粒作用 37
3.1.1 加工時間的效應 38
3.1.2 往復速率 38
3.1.3 磨粒與負荷的效應 39
3.1.4 純磨粒加工機制 48
3.2 無磨粒純電解作用 49
3.2.1 電壓電流曲線 49
3.2.2 加工電流的效應 51
3.2.3 無磨粒純電解加工機制 56
3.2.4 加工電流對工件表面粗糙度的影響 57
3.3 電解複合磨粒作用 58
3.3.1 電解複合磨粒加工 58
3.3.2 電解複合磨粒拋光的表面粗糙度變化 62
3.3.3 兩階段不同粒徑之電解複合磨粒拋光 63
3.4 全表面拋光 68
3.4.1 電解複合磨粒進給拋光 68
3.4.2 工件全表面拋光成果圖 74
第四章 結果與未來研究方向 75
4.1 結論 75
4.2 未來研究方向 76
參考文獻 77
附錄-盲孔之底部加工 81
1.1實驗材料之特性與幾何形狀 81
1.1.1 工件材料與幾何形狀 81
1.1.2 工具電極幾何形狀 82
1.2 工件材料之前處理方式 83
1.3實驗流程 84
2.1純磨粒作用 86
2.1.1 轉速 87
2.1.2 加工時間效應 87
2.1.3 磨粒與負荷 88
2.1.4 純磨粒加工機制 91
2.2 無磨粒純電解作用 92
2.2.1 加工電流的效應 92
2.2.2 無磨粒純電解加工機制 96
2.3 全表面拋光 97
2.3.1 電解複合磨粒拋光 97
2.3.2 工件全表面拋光成果圖 99

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