在薄膜電晶體液晶平面顯示器(TFT-LCD)製程中化學氣相沈積法是常用的薄膜製程之一，其基板上之熱傳係數為製程中的重要影響參數，所以本論文應用液晶量測技術，建立暫態液晶量測實驗系統並將其應用在模擬化學氣相沈積過程矩型腔體內低速空氣噴流衝擊至基板之熱傳實驗中。實驗結果經回歸分析，可推導出紐賽數與雷諾數(Re)、分離距(H/D)、腔體大小(B/D)之間的熱傳係數實驗公式。

Chemical vapor deposition is an important thin film process for the fabrication of TFT-LCD(Thin-Film-Transistor Liquid Crystal Display), the heat transfer coefficient on the substrate is the important influence parameter in the manufacturing process. For this reason, the main object of this thesis is to set up a temperature measurement system of transient thermochromatic liquid crystals. Furthermore, an experimental is carried out in the present study to investigate the characteristics of heat transfer resulting from a low speed air jet impinging onto a rectangular substrate confined in a vertical rectangular chamber. Finally, empirical equations are proposed to correlate the effect of Reynolds number、Separation distances and Ratio of outlet.

目錄 (I)

表目錄 (II)

圖目錄 (III)

學術用語 (V)

摘要 (VII)

第一章 前言 (1)

1-1 研究背景和動機 (1)

1-2 文獻回顧 (4)

1-3 研究重點 (8)

第二章 實驗相關理論和方法 (9)

2-1 液晶量測技術基本理論 (9)

2-2 實驗規劃 (13)

第三章 實驗裝置及實驗步驟 (14)

3-1 實驗設備 (14)

3-2 實驗前置作業準備 (18)

3-3 實驗步驟 (20)

第四章 結果與討論 (22)

4-1 雷諾數(Re)對熱傳的影響 (22)

4-2 分離距對熱傳的影響 (23)

4-3 腔體區域大小對熱傳的影響 (24)

4-4 熱傳實驗公式 (25)

第五章 結論 (26)

參考文獻 (57)

附錄A (59)

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