本論文中，我們提出利用雷射二極體、透鏡組、光柵、反射介質鏡等元件架設外腔波長可調雷射用以量測膜厚，該法不但有別於過去傳統的量測方法，在縱向解析度上有良好的準確性，同時開發出高橫向解析度。其原理是透過外腔半導體雷射之腔長與輸出波長的關係，並透過透鏡組縮小光斑大小，使用高解析度F.P.干涉儀偵測頻率的變化。藉由藍光做為光源，我們成功得到一橫向解析度20μm的膜厚分佈量測系統，並預期經由半導體雷射橫模之改善(M^2~1)，解析度可達μm級。其系統光路架設容易，運算簡便，高敏感度，體積大小重量亦可作為可攜式以方便工業化量測。

In this thesis, with external cavity semiconductor laser, a high lateral resolution thickness measurement is proposed and demonstrated. The approach is typical an intra-cavity measurement of focused cell thickness by wavelength tuning of an external cavity laser diode. In addition, using blue light of 406nm as laser diode, higher lateral resolution is also observed. Using the proposed thickness method, the lateral resolution and longitudinal resolution have been demonstrated with 20μm and 0.15μm, respectively. We also discuss the feasibility of μm scaled lateral resolution through improvement of laser diode, such as M^2~1.

中文審定書-----------------------------------------------------------I
英文審定書----------------------------------------------------------II
中文摘要------------------------------------------------------------III
英文摘要------------------------------------------------------------IV
誌謝-------------------------------------------------------------------V
目錄------------------------------------------------------------------VI
圖次-----------------------------------------------------------------VIII
表次------------------------------------------------------------------XI
第一章序論----------------------------------------------------------1
1-1前言--------------------------------------------------------------1
1-2動機及目的-----------------------------------------------------3
1-3論文架構--------------------------------------------------------4
第二章 外腔半導體雷射量測系統---------------------------5
2-1 外腔半導體雷射的介紹-------------------------------------5
2-1.1 半導體雷射--------------------------------------------------6
2-1.2 波長可調外腔半導體雷射--------------------------------7
2-2 外腔系統之特性與原理-----------------------------------12
2-2.1 波長連續可調外腔半導體雷射原理------------------12
2-2.2 外腔半導體雷射模態躍遷現象------------------------16
2-3 各種量測光學元件其成像品質之方法-----------------19
2-3.1 Mach-Zehnder interferometer------------------------20
2-3.2 Twyman-Green interferometer----------------------21
2-3.3 White light interferometer----------------------------22
2-4 F.P. Interferometer的介紹-------------------------------23
2-5 高斯光束通過透鏡收光原理-----------------------------25
第三章 系統架設與測試-------------------------------------28
3-1 外腔系統架設與特性--------------------------------------28
3-2 系統之穩定性測試與操作條件--------------------------34
3-3 橫向解析度之系統架設-----------------------------------37
3-4 移動旋轉平台對穩定性的影響--------------------------40
第四章 玻片與液晶盒特性量測----------------------------44
4-1 玻片均勻性測試實驗---------------------------------------44
4-2 旋轉坡片定量量測------------------------------------------48
4-3 液晶均勻性量測---------------------------------------------52
4-4 加偏壓下液晶導軸之變化---------------------------------58
第五章 未來與展望-------------------------------------------63
參考文獻-----------------------------------------------------------64
Publication list --------------------------------------------------68

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