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論文名稱 Title |
利用分子束磊晶以不同成長溫度成長氮化鎵在有傾角的鋁酸鋰基板上與其特性分析 Characterization of GaN grown on tilt-cut γ-LiAlO 2 by molecular beam epitaxy for different growth temperatures |
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系所名稱 Department |
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畢業學年期 Year, semester |
語文別 Language |
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學位類別 Degree |
頁數 Number of pages |
50 |
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研究生 Author |
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指導教授 Advisor |
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召集委員 Convenor |
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口試委員 Advisory Committee |
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口試日期 Date of Exam |
2011-07-01 |
繳交日期 Date of Submission |
2011-07-19 |
關鍵字 Keywords |
氮化鎵、分子束磊晶、晶格常數、成長溫度、鋁酸鋰 Lattice Constant, Molecular Beam Epitaxy, LiAlO, GaN, Growth Temperature |
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統計 Statistics |
本論文已被瀏覽 5685 次,被下載 20 次 The thesis/dissertation has been browsed 5685 times, has been downloaded 20 times. |
中文摘要 |
本文主要是探討以電漿輔助分子束磊晶(Plasma-assisted molecular-beam epitaxy)在鋁酸鋰(LiAlO 2 )基板成長氮化鎵(GaN)薄膜特性之研究。γ- LiAlO 2 基 板與氮化鎵晶格晶格常數接近,使得不匹配率(Lattice mismatch)較其他基板來得 低可減少缺陷(defect)的產生,提升結晶品質。當然,一定程度的晶格不匹配仍 然存在著,以至於或多或少還是會有缺陷在晶體內被觀察到,高成長溫度能有效 降低缺陷的產生,在此研究以一系列樣品主要以成長溫度做為改變參數,再由掃 描式電子顯微鏡(SEM)和原子力顯微鏡(AFM)展示樣品表面之特徵,以及 X 光繞 射分析(XRD)和光致螢光(PL)用以分析樣品結晶結構、結晶品質等特性。 |
Abstract |
We study the properties of m-plane GaN structure on LiAlO 2 substrate grown by plasma-assisted molecular-beam epitaxy (PAMBE). Lattice parameters of LiAlO 2 are close to GaN, the interface between LiAlO 2 and GaN showed a good lattice matching. Low lattice mismatch can reduce the defect generation, improve crystal quality. However, lattice mismatch still exist, more or less density of defect still can be observed. The density of defect was reduced in the sample at high temperature. In this study, we investigate GaN on LiAlO 2 by scanning electron microscope (SEM), atomic force microscope (AFM), photoluminescence (PL) and X-ray diffraction (XRD) for different growth temperatures. |
目次 Table of Contents |
論文審定書 誌謝 中文摘要…………………………………………………………………ii 英文摘要..…………………………………………………………...…..iii 第一章 簡介..…………………………………………..…….……….1 第二章 儀器原理……………………………………………………4 2.1 掃描式電子顯微鏡(SEM) ………………………………4 2.2光致螢光(PL)……………………………………………..5 2.3 X光繞射儀(XRD)………………………………………..7 2.4原子力顯微鏡(AFM)……………………………………..8 第三章 儀器操作步驟………………………………………….….10 3.1掃描式電子顯微鏡…………………………….…….…10 3.2光致螢光………………………………………………..12 第四章 實驗分析結果……………………………………………..13 4.1 SEM分析結果…………………………………………..14 4.2 AFM分析結果…………………………………………..23 4.3 PL分析結果……………………...………………….….30 4.4 XRD分析結果……………………………….………….34 4.5與無傾角基板樣品比較………………………………...37 第五章 結論…………………………………………….…….……39 參考文獻…………………………………………………………….….41 |
參考文獻 References |
[1] Mitch M.C.Chou, Da-Ran Hang, Liuwen Chang, Chenlong Chen, Wen-Fu Yang, Chu-An Li, Jih-Jen Wu, JOURNAL OF APPLIED PHYSICS, 107, 013502(2010). Improved quality of nonpolar m-plane GaN [10-10] on LiAlO 2 substarte using a modified chemical vapor depositon. [2] D.R. Hang, Mitch M.C. Chou, Liuwen Chang, Y. Dikme, M.Heuken, Journal of Crystal Growth 311, 452–455(2009). Growth and characterization of m-plane GaN-based layers on LiAlO 2 (100) grown by MOVPE. [3]張政憲. Investigation of AlGaN / GaN heterostructure using photoluminesecence. 碩士論文,中山大學 (2007) [4] Mitch M.c. Chou, D.R. Hang, H. Kalisch R.H. Jansen, Y. Dikme, Michael, Heuken, G.P. Yablonskii, JOURNAL OF APPLIED PHYSICS, 101, 103106(2007). Crystal growth and properties of LiAlO2 and nonpolar GaN on LiAlO2 substrate. [5] Y.J. Sun, O. Brandt, U.Jahn, T.Y. Liu, A. Trampert, S. Cronenberg, S. Dhar, K.H. Ploog. J. Appl. Phys. 92, 5714. (2002) [6]胡嘉軒. Surface characterizations of GaN nanostructure grown on γ-LiAlO 2 substrate by plasma-assisted MBE. 碩士論文,中山大學 (2009) [7] Mitch M.C. Chou, Liuwen Chang, Chenlong Chen, Wen-Fu Yang, Chu-An Li, Jih-Jen Wu, Journal of Crystal Growth 311, 448–451(2009). Growth behavior of nonpolar GaN on the nearly lattice-matched (100) γ-LiAlO 2 substrate by chemical 44 vapor deposition. [8] D.R. Hang, Mitch M.C. Chou, C. Mauder, M. Henken, Journal of Crystal Growth 312, 1329–1333(2010). MOVPE growth and properties of non-polar InGaN/GaN multiple quantum wells on γ-LiAlO 2 substrates. [9] D.Heiman. Photoluminescence spectroscopy (2004) [10]林麗娟. X 光繞射原理及其應用, 工業材料 86 期. (1994) [11]陳哲雄, 林俊勳, 林紋瑞, 吳靖宙. 原子力顯微鏡成像原理與中文簡易操作 手冊 [12] B. Rau, P.Waltereit, O. Brandt, M. Ramsteiner, K. H. Ploog, J. Puls, F. Henneberger, APPLIED PHYSICS LETTERS, 77 3343-3345(2000) In-plane polarization anisotropy of the spontaneous emission of M-plane GaN/(Al,Ga)N quantum wells. (2000) [13]高鳴宏. Growth and chrarcterization of Al x Ga X-1 N/GaN heterostructure. 碩士論 文,中山大學 (2004) [14] K.R. Wang, M. Ramsteiner, C. Mauder, Q. Wan, T. Hentschel, H.T. Grahn, H. Kalisch, M.Heuken, R.H. Jansen, A. Trampert, APPLIED PHYSICS LETTERS 96, 231914 (2010) Striated surface morphology and crystal orientation of m-plane GaN films grown on γ-LiAlO 2 (100). [15] Liverios Lymperakis, Jorg Neugebauer, PHYSICAL REVIEW B, 79, 45 241308(2009) Large anisotropic adatom kinetics on nonpolar GaN surface: Consequence for surface morphologies and nanowire growth. |
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