本論文研究在不同單壁奈米碳管濃度和製成薄膜厚度下，將奈米碳管之飽和吸收體置於被動鎖模環型雷射架構中，透過光學量測來探討不同奈米碳管濃度和薄膜厚度的試片之材料特性，用以了解濃度效應對鎖模脈衝之影響。首先我們經由非線性穿透量測發現，當薄膜厚度由18μm增加到265μm時，它的調制深度將由1%增加至4.5%，代表著當薄膜厚度越厚時其脈衝塑形的能力較佳。再者我們將不同摻雜濃度與厚度的薄膜置於鎖模雷射環腔中進行輸出脈衝和光譜之量測，結果顯示，當摻雜單壁奈米碳管之飽和吸收體薄膜厚度固定為8μm，濃度由0.125wt%增加到0.5wt%時，其脈衝寬度由3.43ps縮短至2.02ps；然而當摻雜濃度固定為0.125wt%，薄膜厚度由8μm增加到100μm時，其脈衝寬度由3.43ps縮減至1.85ps。
最後經由改變腔長來調變系統的群速色散值，以達到脈衝壓縮的效果，實驗中我們得到的最短脈衝為713fs，其時間-頻寬乘積為0. 345。我們利用單壁奈米碳管為材料來製作飽和吸收體，其具有低成本和製程簡單之特色，且應用範圍廣泛，使鎖模雷射在光頻量測的領域具有發展性，在超快雷射的應用上也更普及。

We comprehensively investigated the concentration effect of dispersed single-walled carbon nanotubes (SWCNTs) in polymer films for being a saturable absorber (SA) to stabilize the mode locking performance of the Erbium-doped fiber laser (EDFL) pulse through the diagnosis of its nonlinear properties of SA. The measured modulation depth was 1 to 4.5% as the thickness increased from 18 to 265 μm. We obtained the stable pulse of the mode-locked EDFL (MLEDFL) when the full-width half-maximum (FWHM) decreased from 3.43 to 2.02 ps as the concentrations of SWCNTs SA increased from 0.125 to 0.5 wt%. At constant concentration of 0.125 wt%, the similar pulse shortening effect of the MLEDFL was also observed when the FWHM decreased from 3.43 to 1.85 ps was the thickness of SWCNTs SA increased from 8 to 100 μm.
In EDFL system, we vary group-velocity dispersion (GVD) with different cavity length to achieve optical pulse compression. We got the shortest pulsewidth was 713 fs, and the time-bandwidth product (TBP) was 0.345. An in-depth study on the stable mode-locked pulse formation employing SWCNTs SA, it is possible to fabricate the SWCNT films for use in high performance MLEDFL and utilization of many other low-cost nanodevices.

內容目錄
中文摘要 I
英文摘要 II
致 謝 III
內容目錄 V
圖表目錄 VIII
第一章 導論……………………………....…..…………...............1
1.1 研究目的…………………...............................................…....1
1.2 論文架構…………………………………...………………....3
第二章 被動鎖模雷射的實驗機制及原理 ………….......……… 4
2.1 鎖模原理 ……………………………………….…………....4
2.2 被動鎖模原理…………………………………………….....10
2.2.1 飽和吸收體非線性特性…………….………....………….10
2.2.2 被動鎖模之光脈衝產生機制……………...……….....…..13
2.2.3 群速色散對腔內脈衝波形之影響………..………....……15
2.3 各式飽和吸收體簡介……………………………...……......18
2.3.1 半導體飽和吸收鏡……………………....………………..18
2.3.2 克爾透鏡………………………………....……………......20
2.3.3 單壁奈米碳管飽和吸收體…………….............……….....21
第三章 單壁奈米碳管飽和吸收體製程………….....…..…..…..23
3.1 奈米碳管介紹………………..…………….……………......23
3.1.1 單壁奈米碳管結構與半導體特性……...……..........….....24
3.2 飽和吸收體中單壁奈米碳管分散之探討………....…….....29
3.2.1 奈米碳管叢聚現象………………..………......………......29
3.2.2 界面活性劑分散機制………………..………......……......30
3.3 摻雜單壁奈米碳管之飽和吸收體製備……….…..……......32
3.3.1 飽和吸收體薄膜試片製程……………………......………33
3.3.2 飽和吸收體薄膜試片厚度量測………………......………35
3.4 單壁奈米碳管飽和吸收體材料光學特性…………..….…..39
3.4.1 飽和吸收體線性吸收特性量測………………......……....39
3.4.2 飽和吸收體非線性穿透特性量測……………..................41
第四章 被動鎖模雷射實驗架構與量測…………..….....……....44
4.1 環形摻鉺光纖雷射架構……………………………...…......44
4.2 自相關儀量測原理………………………………….………48
4.3 實驗及量測結果……………………………………...…......50
4.3.1 不同試片之光譜及脈衝寬量測…………...………...........50
4.3.2脈衝壓縮之結果探討………….......………………………55
第五章 結論………….…………………………….……….........57
5.1 結論………………………………..………...........................57
5.2 未來方向……………………………….………....................58
參考文獻………………………………………............................59

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