本研究採用磁性流體力學(Magnetohydrodynamics；MHD)模式模擬在兩電極板間，瞬間給定一偏壓電位或者電場條件下，低壓、高氣體密度和低電離率氬氣電漿粒子的非穩態一維空間的輸送變數。電漿科技近年來已被廣泛，有效地運用在材料加工製造、薄膜製造、核融合發電、光源等，研究電漿的輸送現象，因此極其重要。本研究忽略磁場效應以及粒子間的碰撞。計算結果顯示極板在瞬間給定負直流偏壓電位及瞬間給定電場，不同條件下電漿之密度、速度、電場、電位、能量及溫度的傳遞現象。預測並比較瞬間之電位與電場之差異。理論與模擬之比較將可深入了解電漿在工件表面之行為。

關鍵詞: 磁性流體力學、鞘層之輸送變數、空間電荷

This study uses an magnetohydrodynamics (MHD) model to simulate unsteady one-dimensional transport variables in argon plasma, under low pressure and weak ionization between two planar electrodes suddenly biased by a negative voltage or electric field. Plasma has been widely used in etching, ion implantation, light source, and nuclear fusion, etc. Studying transport processes of plasmas therefore is important. Ignoring magnetic field, collisions between ions and electrons, the computed results in this work shows density, velocity, voltage, electric field, energy and temperature transport phenomenon in different cases. The results give insight by theory and simulation the surfaces behavior in plasma.

Keywords: magnetohydrodynamics (MHD), transport variables in sheath,space charge

頁次
謝誌 Ⅰ
目錄 Ⅱ
圖目錄 III

符號說明 IV

中文摘要 VI

英文摘要 VII

第一章　緒論 1
　　　1.1　研究背景與目的 1
　　　1.2　電漿模擬方法 2
　　　1.3　本論文研究內容簡介 3
1.4 本文架構 3
第二章　理論分析 4
2.1　物理模型與基本假設 4
　　　2.2　磁流體力學模擬 5
　　　2.3　模型初始條件與邊界條件 9
第三章　研究結果與討論 11
3.1　電場、密度與速度 11
　　　3.2　電位、能量與溫度 17
第四章　結論 22
參考文獻 23

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