本論文致力於改善平坦化全像干涉系統，並再加入適當的平行透鏡後，成功將發散光校正為平行光，大幅降低光場發散角，曝光週期差異自5.71 nm降低至1 nm以下。同時利用實驗室所開發之圖案轉移技術成功將兩吋光柵結構轉移至塑膠軟板以及製作出1.5 mm*1.5 mm2光柵玻璃結構，同時結合光柵玻璃結構於矽光子波導上作為局部性光柵應用，可作為布拉格光柵反射器或波導光柵耦合器。除此之外，使用石墨烯取代金屬導體，並結合氧化石墨烯光柵成功製作出可導電之光柵結構，結合前後氧化石墨烯與石墨烯特性不變，並成功將此複合式導電光柵薄膜應用在矽光子晶片上作為微加熱器，在元件應用上為了減少石墨烯對波導內部光場的吸收，使用模擬軟體Fimmwave 模擬不同距離下石墨烯所造成的損耗，並選用高度較高之材料(70 nm、160 nm)製作光柵結構增加石墨烯與波導間的距離來降低石墨烯吸收所造成的損耗(0.241dB/μm、0.084dB/μm)。並藉由施加電壓來對矽波導進行加熱，並使布拉格反射波長成功偏移，此導電光柵薄膜同時也能應用於液晶配向，相較於傳統配向膜能有更薄的元件厚度以及更高的光穿透度。元件應用上，除了上述部份，本論文成功將4種不同週期(332 nm、334 nm、336 nm、338 nm)的光柵結構利用疊加方式結合於單一波導上，並成功反射出四個布拉格反射波長(1520.78 nm、1523.7 nm、1526.4 nm、1528.76 nm)，當疊加更多不同週期之光柵結構，在多波分工應用上能夠增加載波數量，可望減少元件面積。

In this thesis, we firstly equip a 6-inch plano-convex lens in laser interference lithography system for light collimation. This leads to greatly reduced grating period variation of resultant grating structure from 5.71 nm to less than 1 nm over the entire 2-inch wafer. With this capability, we further transfer 2-inch gratings onto a flexible PET substrate as well as a 1.5x1.5 mm2 glass coupon. The resulting grating structures on a tiny glass coupon allows us to provide Bragg reflection function locally on silicon photonic waveguides. This can serve as a waveguide Bragg reflector or a surface grating coupler. In addition, we further combine pristine graphene sheet with grating structure made of transparent graphene oxide to achieve a conductive graphene oxide grating thin film. In this device the pristine graphene sheet serves as an on-chip micro-heater to tune the reflecting wavelength of hybrid waveguide Bragg reflector. In order to eliminate the propagation loss arise from the absorption of graphene, we utilize a thicker gratings (70 or 160 nm) to increase the distance between the silicon waveguide and graphene micro-heater. This leads to a reduced propagation loss of 0.241 dB/μm and 0.084 dB/μm, respectively. Lastly, we demonstrate the stacking of four grating layers with different periodicities atop a silicon strip waveguide, thus reflecting four Bragg wavelengths (1520.78 nm, 1523.7 nm, 1526.4 nm, 1528.76 nm) individually.

中文審定書 i
英文審定書 ii
致謝 iii
中文摘要 iv
Abstract v
目錄 vi
圖目錄 viii
表目錄 xii
第一章 緒論 1
1-1 前言 1
1-2 研究動機 2
第二章 微影製程與現有技術 13
2-1 全像術 13
2-2 現有圖形化技術與圖案轉移技術 17
2-2-1 現有圖形化技術 17
2-2-2 圖案轉移技術 19
2-3 石墨烯 22
2-4 氧化石墨烯合成技術 26
2-5 布拉格光柵理論 34
第三章 系統改良與實驗製程流程 37
3-1光柵週期均勻度改善 37
3-2複合式導電光柵薄膜 41
3-3大面積(2 inch)與小面積(1.5*1.5 mm2)氧化石墨烯轉移 49
第四章 應用於矽波導量測結果 53
4-1複合式導電光柵薄膜應用 53
4-2局部性光柵應用於矽波導上 61
4-3四層光柵於矽波導之應用 62
第五章 結論與未來工作 64
5-1結論 64
5-2未來工作 65
5-2-1降低半高寬 65
5-2-2 加熱效率提升 66
5-2-3 多層光柵層間支撐層 67
參考文獻 68

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