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博碩士論文 etd-0725105-161619 詳細資訊
Title page for etd-0725105-161619
論文名稱
Title
複合電沉積層中分散粒子濃度增量法及其而磨耗性之探討
Investigations on the Content Increment Method of Dispersive Particles and Wear Characteristics for Composite Electrodepostion Layers
系所名稱
Department
畢業學年期
Year, semester
語文別
Language
學位類別
Degree
頁數
Number of pages
123
研究生
Author
指導教授
Advisor
召集委員
Convenor
口試委員
Advisory Committee
口試日期
Date of Exam
2005-07-16
繳交日期
Date of Submission
2005-07-25
關鍵字
Keywords
電泳沉積、複合電鍍
ELD EPD ELEPIS
統計
Statistics
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中文摘要
一般來說,無論運用在何種目的複合電沉積層均以追求微粒含量高且分散性良好為目標。以電泳沉積法製作的電沉積層微粒含量高但結構鬆散,而以複合電鍍法製作的電沉積層結構緻密但微粒含量低。因此本研究結合電泳沉積法和複合電鍍法,以依序複合電鍍-電泳-複合電鍍的方式來製作複合電沉積層,希望能結合兩者之優點。本研究首先探討電泳沉積的最佳操作條件,然後進行提昇複合電沉積層中氧化鋁含量的依序電鍍-電泳-電鍍(ELEPIS)三階段沉積法,最後利用刮痕試驗來驗證鍍層的強度。
實驗結果發現在電壓10V、氧化鋁粉末添加量100g/L、攪拌轉速50RPM時為電泳之最佳操作條件。於依序複合電鍍-電泳-複合電鍍之ELEPIS過程中,發現了在進行第三階段複合電鍍時,鎳離子有向內層滲透的情況。利用此法可製作出鍍層中粉末含量為傳統複合電鍍法之4倍。另外,也提出多層ELEPIS的可行性。
最後,在刮痕試驗中發現,利用ELEPIS製作的鍍層在刮痕內部的裂縫最少。且刮痕深度最淺而刮痕寬度最窄。顯示出依此法製作出之試片在強度上和與底材的鍵結皆有優異的表現。
Abstract
Generally speaking , high volumetric content of particles and well-dispersed condition in the metallic matrix are the purposes in composite electrodeposition for different applications. The composite electrodeposition layer by EPD has high volumetric content of particles but low structure strength. The composite electrodeposition layer by ELD has tight structure but low volumetric content of particles . In this study combines EPD and ELD to produce the composite electrodeposition layer in ELD-EPD-ELD three steps. We hope to combine their advantages .In this study ,we first look for the best operating condition of EPD, then increase the volumetric content of particles with ELD-EPD-ELD(ELEPIS). Finally, it was examined by scratch test to prove the structure strength.
By the result of experiment, it can be known that at the voltage 10V,the concentration 100g/L,stirring speed 50rpm is the best operating condition. In the process of ELEPIS, we find that Ni ions permeate into the second layer. In this method, we can produce the electrodeposition layer which of the volumetric content of particles is 4 times the traditional electrodeposition layer. We also propose the possibility of multi-storey ELEPIS composite electrodeposition layer.
Finally, by the result of scratch test , it can be known that there are the least cracks in the scratch which of the electrodeposition layer by ELEPIS. Its depth is shallowest and its width is narrowest. It shows that the sample by ELEPIS has excellent performance in structure strength and binding with substrate.
目次 Table of Contents
總目錄
總目錄 i
圖目錄 iiii
表目錄 ix
中文摘要 x

第一章 緒論 1
1-1 前言 1
1-2 研究動機 3
1-3 文獻回顧 4
1-3-1複合電鍍 4
1-3-2鎳-氧化鋁複合電鍍 4
1-3-3改善複合鍍層中添加粉末含量 5
1-3-4 ELEPIS複合電沉積法 8
1-4 本論文重點 9
1-5 本論文架構 9
第二章 實驗基本原理 10
2-1 電泳沉積 10
2-2 等電位點 11
2-3 複合電鍍 13
2-4 鎳金屬電鍍 17
2-5 氨基磺酸鎳鍍浴 20
第三章 實驗設備與方法 22
3-1 實驗設備 22
3-2 實驗程序 24
3-3 鍍浴的配置 26
3-4 基材前處理 27
3-5 電沉積最佳參數實驗 28
3-5-1電沉積操作步驟 28
3-5-2試片後處理 29
3-5-3試片鑲埋 29
3-6 鍍層刮痕實驗 31
3-6-1儀器設備 32
3-6-2操作步驟 32
第四章 實驗結果與討論 34
4-1電泳沉積最佳參數實驗 34
4-1-1電壓 34
4-1-2粉末添加量 41
4-1-2轉速 49
4-2 ELEPIS沉積實驗 52
4-2-1鍍層橫截面SEM圖討論 53
4-2-2 ELEPIS三階段複合沉積模式 70
4-2-3多層ELEPIS複合沉積 72
4-2-4鍍層中氧化鋁含量 74
4-3鍍層刮痕實驗 78
4-3-1鍍層破壞現象觀察 78
4-3-2刮痕深度與寬度 91
4-3-3鍍層破壞現象與摩擦係數 99
第五章 結論 106
參考文獻 107
參考文獻 References
[1] A.E. Grazen, U.S. Patent 3, 061, 525(1962)
[2] C.E. Vest and D.F Bazzarre, Metal Finish., Nov.1967, p.52
[3]洪國翔,黃清安,許鴻生,涂肇嘉,徐富勇,“鎳基納米碳化矽複合電鍍之顯微結構及電化學分析”, 中國機械工程學會第十六屆全國學術研討會論文集.
[4] J. Zahavi and J. Hazan , “ElectrodepositedNickel Composites Containing Diamond Particles”, Plating and Surface Finishing, 2, 57(1983).
[5] 姚昶劦, “連續複合電鍍磨盤式超精密拋光機之研發及矽晶圓拋光特性”, 中山大學機械與機電工程研究所碩士論文,2001.
[6] 黃韋翰, “新式超精密拋光機之矽晶圓拋光特性研究”, 中山大學機械與機電工程研究所碩士論文, 2002.
[7] 楊勝旭,“連續複合電鍍拋光機加工條件對矽晶圓拋光機制之影響”,中山大學機械與機電工程研究所碩士論文, 2003.
[8]F.K.Sautter “Electrodeposited of Dispersion-Hardened Nickel-Al2O3 Allys” Journal of the Electro-chemical Society ,110,(1963)557.
[9]謝培煥, “鎳-氧化鋁複合電鍍行為對鍍層性質之影響”,成功大學化學工程研究所碩士論文,2002.

[10]NabeenK.Shrestha.,KazuakiSakurada ,Masabumi Masuko ,Tetsuo Saji, “Composite coating of nickeland ceramic particlesprepared in two steps ”,Surface and Coating Technology 140(2001)175-181.
[11]E.J.Podlaha,“ Selective Electro- deposition of Nanoparticulates into Metal Matrices”,Nano Letters ,Vol.1,No.8,(2001)413-416
[12]陳彥政,葛明德,胡文華,郭貹隆,侯光煦, “界面活性劑對奈米級鎳-碳化矽複合電鍍的影響” ,J.Chin Colloid and Interface Soc,
(2002)89-99
[13]Nabeen K.Shrestha, Masabumi Masuko,Tetsuo Saji, “Composite plating of Ni/SiC using azo-Cationic surfactants and wear resistanceof coatings” Wear ,254,(2003)555-564
[14]Liping Wang,Yan Gao,Huiwen Liu,Qunji Xue,Tao Xu, “Effect of bivalent Co ion on the co-deposition of nickel and nano-diamond particles”Surface and Coating Technology(2004)
[15] 張有義、郭蘭生譯,“膠體及界面化學入門”,高立圖書有限公
司.
[16] N. Guglielmi, “Kinetics of the Deposition of Inert Particles from
Electrolytic Baths”, Journal of ElectrochemicalSociety, Vol.119,
1972, pp.1009-1012.

[17]J. P. Celis, J. R. Roos and C. Buelens, “A Mathemetical Model for
theElectrolytic Codeposition of Particleswith a Metallic Matrix”,
Journal of Electrochemical Society, Vol.134, 1987, pp.1402-1408.
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