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論文名稱 Title |
使用導電高分子工具電解複合磨粒拋光合金鋼內表面之研究 Studies of Electrochemical Abrasive Polishing on Inner Surface of Alloy Steel using a Conductive Polymer Tool |
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系所名稱 Department |
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畢業學年期 Year, semester |
語文別 Language |
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學位類別 Degree |
頁數 Number of pages |
75 |
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研究生 Author |
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指導教授 Advisor |
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召集委員 Convenor |
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口試委員 Advisory Committee |
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口試日期 Date of Exam |
2015-07-29 |
繳交日期 Date of Submission |
2015-09-01 |
關鍵字 Keywords |
合金鋼、導電高分子、電解複合磨粒拋光 Alloy steel, Conductive polymer, Electrochemical abrasive polishing |
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統計 Statistics |
本論文已被瀏覽 5688 次,被下載 43 次 The thesis/dissertation has been browsed 5688 times, has been downloaded 43 times. |
中文摘要 |
本研究使用臥式電解複合磨粒拋光加工機,以氧化鋁(Al2O3)磨粒含硫酸鈉溶液作為加工液,以導電高分子ESD 410C工具電極對鉻鉬鋼工件內孔進行電解複合磨粒拋光。本實驗探討氧化鋁磨粒粒徑(1、3、5 µm)、加工負荷(0.05、0.15、0.25 N)與加工電流(0~300 mA)等加工參數對工件表面粗糙度之影響。 在工具無進給情況下,從純磨粒加工實驗得知,在含氧化鋁磨粒粒徑1 µm之於加工液中,以加工負荷0.25 N加工6分鐘後之工件內孔表面粗糙度為R_a=0.036 μm,R_max=0.135 μm。從純電解加工實驗得知,以加工負荷0.25 N、電流200 mA電解加工10分鐘後之工件之內孔表面粗糙度為R_a=0.068 μm,R_max=0.193 μm。從電解複合磨粒加工實驗得知,使用硫酸鈉電解液,並粒徑添加1 µm氧化鋁磨粒於加工液中,以加工電流200 mA加工時間5分鐘後之工件內孔表面粗糙度為R_a=0.036 μm,R_max=0.119 μm。 採用兩階段加工實驗,亦即第一階段使用添加粒徑1 µm氧化鋁磨粒之加工液,以加工負荷0.25N、200 mA之電流進行加工4分鐘,於第二階段加工時,僅更換含有粒徑0.3 µm之氧化鋁磨粒加工液,加工3分鐘,完成加工後之表面粗糙度為R_a=0.046 μm,R_max=0.144 μm。 在工具進給電解複合磨粒加工實驗可得知,加工負荷0.25 N、電流200 mA,使用粒徑1 µm粒徑的氧化鋁磨粒之加工液。加工三個衝程(stroke)加工時間60分鐘後之工件內孔表面粗糙度為R_a=0.037 μm,R_max=0.129 μm。 |
Abstract |
In this study, a horizontal machining was employed to compositely electrolytic-abrasive polish the inner surface of Cr-Mo alloy steel, where a carbon-fiber-type non-directional conductive polymer (ESD 410C) as a tool electrode and alumina (Al2O3) as abrasives with sodium sulfate as the electrolyte. Effects of grit size (1, 3, 5 µm), load (0.05, 0.15, 0.25 N), and current (0 ~ 300 mA) on the surface roughness of workpiece were investigated. Experimental results of abrasive polishing with non-feeding condition showed that the surface roughness Rmax and Ra were 0.135 μm and 0.036 μm under the load of 0.25 N and the grit size of 1 µm for 6 minutes. In electrolysis condition, the inner surface roughness Rmax and Ra were 0.193 μm and 0.068 μm under the current of 200 mA and the load of 0.25 N for 10 minutes. In Electrochemical abrasive polishing process, the inner surface roughness Rmax and Ra were 0.119 μm and 0.036 μm under a current of 200 mA and the grit size of 1 μm for 5 minutes. A two-stage electrochemical abrasive polishing process was conducted. In the first stage, the workpiece was polished under the load of 0.25 N, the grit size of 1 µm, and a current of 200 mA for 4 minutes. In the second stage, the grit size 1µm was changed to 0.3 µm for 3 minutes, and the surface roughness Rmax and Ra were achieved to 0.144 μm and 0.046 μm. Finally, an electrochemical abrasive polishing process with a tool feed was conducted. The inner surface roughness Rmax and Ra could achieve 0.129 µm and 0.037 µm after three strokes (60 minutes) under the load of 0.25 N, the grit size of 1 µm, and a current of 200 mA. |
目次 Table of Contents |
論文審定書 i 誌謝 ii 摘要 iii ABSTRACT iv 目錄 v 圖目錄 viii 表目錄 xi 第一章 緒論 1 1.1研究背景 1 1.2文獻回顧 2 1.2.1電解加工技術演變 2 1.2.3 電解拋光 3 1.2.4 電解複合研磨加工技術 5 1.2.5高分子材料 6 1.3 研究目的 7 第二章 實驗裝置與方法 9 2.1 預備實驗 9 2.1.1 電解實驗系統 9 2.1.2 工件材料與幾何形狀 11 2.1.3 工具電極材料與幾何形狀 12 2.1.4 電解液之選擇 13 2.1.5 實驗工件之前處理方式 14 2.1.6 實驗條件設定 14 2.2 電解複合磨粒內孔拋光加工實驗設備及實驗方法 17 2.2.1 臥式電解複合磨粒拋光加工機 17 2.2 實驗材料幾何形狀 20 2.2.1 工件材料幾何形狀 20 2.6.3 圓柱形工件內孔表面量測 21 2.2.2 工具電極設計 22 2.2.3 電解液之選擇 23 2.3 實驗工件的前處理方式 23 2.3.1 鉻鉬合金鋼工件 23 2.4.2 導電高分子工具電極 23 2.5 實驗條件設定 24 2.6 實驗步驟 25 2.6.1 電解液調配 25 2.6.2 實驗流程 26 第三章 實驗結果與討論 28 3.1 鉻鉬鋼工件之純電解實驗 28 3.1.1 電解液濃度對電流-電壓曲線之影響 28 3.1.2 鈍態膜生成觀察 29 3.2定位置純磨粒作用 30 3.3.1 磨粒粒徑與負荷 31 3.3.2轉速 31 3.3.4 磨粒粒徑之效應 38 3.3.3 純磨粒加工機制 39 3.4 定位置純電解作用 40 3.4.1 加工電流之效應 40 3.4.4 純電解加工機制 42 3.5 定位置電解複合磨粒加工 43 3.5.1 電解複合磨粒拋光加工 43 3.5.2 電解複合磨粒拋光之加工機制 47 3.5 定位置兩階段加工 49 3.5 工具電極軸向進給加工(工件內孔全表面拋光) 54 第四章 結論與未來展望 59 4.1 結論 59 4.2 未來研究方向 60 參考文獻 61 |
參考文獻 References |
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