電致變色以外加電場，使離子注入物質之中讓物質產生顏色變化，進而影響物質對於光的穿透能力，此種變色方式稱之為『電致變色』。由於具有光電方面之應用，目前許多工業界與學術界投入研究之中。
本篇論文的目的主要是探討利用液相沉積法成長氧化鎳膜，探討電致變色的能力。利用液相沉積法在透明導電玻璃基板上成長氧化鎳膜，其過程簡單、成本低廉、而且成長溫度低 (40 ℃)，因此值得廣泛研究與討論。利用掃描式電子顯微鏡 (SEM)、紫外光可見光譜，探討薄膜的特性，並由實驗結果顯示最大穿透率變化量為48%。

The electrochromic materials are capable of changing their optical properties (transmittance and/or reflectance) under applied electric potentials; when that potential is stopped or it goes on reverse, these materials keep or return to its original optical state in a reversible way. The variation of the optical properties is caused by of insertion/extraction of cations in the electrochromic film.
The as-deposited LPD-NiO film is also uniform and transparent. The LPD-NiO film is light gray after coloring; the transparency ratio (ΔT%) can reach about 48% at the wavelength of 550 nm. After annealing in 300oC, the bleached state almost approaches that of original state before colored. We expect that the electrochromic device combined LPD-TiO2 and LPD-NiO films can enhance the coloration efficiency.

CONTENTS
CHAPTER 1 1
INTRODUCTION 1
1-1 BACKGROUND OF ELECTROCHROMIC 1
1-2 APPLICATIONS OF ELECTROCHROMIC DEVICE 1
1-3 NICKEL OXIDE 4
1-4 MOTIVATION OF LPD-NIO 4
1-5 BACKGROUND OF LPD 5
1-6 MECHANISMS OF LDP-NIO 5
1-7 ADVANTAGE OF LPD 6
REFERENCES 9
CHAPTER 2 11
EXPERIMENTS 11
CURRENT COMPONENTS USED IN ELECTROCHROMIC CELLS 11
Transparent conductors 11
2-1-2 Electrolytes 11
2-2 LIQUID PHASE DEPOSITION SYSTEM 13
2-3 DEPOSITION PROCEDURES 14
2-3-1 ITO-coated glass Cleaning Procedures 14
2-3-2PHOTORESIST COATED 14
2-3-3 Preparation of Deposition Solution 15
2-3-4 Film Growth 16
2-4ANNEALING TREATMENT 16
2-5CHARACTERISTICS 16
2-5-1 Physical Property 16
2-5-2 Optical Property 17
REFERENCES 20
CHAPTER 3 21
RESULTS AND DISCUSSION 21
3-1 ELECTROCHROMIC REACTION 21
3-2 PHYSICAL PROPERTIES OF LPD-NIO FILM 22
3-2-1 SEM view of LPD-NiO Film 22
3-3 OPTICAL PROPERTIES 23
3-4 SPECIFICATION OF ELECTROCHROMIC 23
3-4-1 Operation Voltage（1~5V） 24
3-4-2 Coloration and Bleaching Time(10~15 seconds) 24
3-4-3 Memory Time (about 600 seconds) 25
3-5 SUMMARY 25
REFERENCES 42
CHAPTER 4 43
CONCLUSIONS 43


LIST PICTURE
.
FIGURE 1-1 BASIC DESIGN OF AN ELECTROCHROMIC DEVICE, INDICATING TRANSPORT OF POSITIVE IONS UNDER THE ACTION OF AN ELECTRIC FIELD 8
FIGURE 1-2 THE PRINCIPLES OF FOUR DIFFERENT APPLICATION OF ELECTROCHROMIC DEVICES. ARROWS INDICATE INCOMING AND OUTGOING ELECTROMAGNETIC RADIATION; THE THICKNESS OF THE ARROW SIGNIFIES RADIATION INTENSITY 9
FIGURE 2-1 SCHEMATIC DIAGRAM OF LIQUID PHASE DEPOSITION (LPD) SYSTEM 20
FIGURE 2-2 LPD-NIO DEPOSITION FLOWCHART 21
FIGURE 3-1 SCHEMATIC OF ION INJECTION INTO NICKEL OXIDE FILM. 29
FIGURE 3-2 THICKNESS OF LPD-NIO FILMS DEPOSITIED AT 40℃ AS A FUCTION OF DEPOSITION TIME. 30
FIGURE 3-3 CROSS-SECTIONAL (A) ITO FILM (B) LPD-NIO/ITO FILMS 31
FIGURE 3-4 SURFACE MORPHOLOGY OF 100 NM LDP-NIO FILMS 32
FIGURE 3-5 LPD-NIO/ITO FILMS TRANSMITTANCE SPECTRA OF DIFFERENT LPD- NIO THICKNESS (A) 27 NM (B) 50 NM. 33
FIGURE 3-6 LPD- NIO /ITO FILMS TRANSMITTANCE SPECTRA OF DIFFERENT LPD- NIO THICKNESS (A) 72 NM (B) 100 NM. 34
FIGURE 3-7 LPD-NIO /ITO FILMS TRANSMITTANCE SPECTRA LPD- NIO THICKNESS 128 NM 35
FIGURE 3-8 (A)27 NM(B)50 NM THICKNESS LPD-NIO TRANSMITTANCE SPECTRA ANNEALED 300 ℃ FOR 30 MINS 36
FIGURE 3-9 (A)72 NM(B)100 NM THICKNESS LPD-NIO TRANSMITTANCE SPECTRA ANNEALED 300 ℃ FOR 30 MINS 37
FIGURE 3-10 128 NM THICKNESS LPD-NIO TRANSMITTANCE SPECTRA ANNEALED AT 300 ℃ FOR 30 MINS 38
FIGURE 3-11 PICTURES OF COLORED AND BLEACHED LPD-NIO FILMS 39
FIGURE 3-12 PICTURES OF COLORED AND BLEACHED LPD-NIO FILMS 40
FIGURE 3-13 PICTURE OF COLORED AND BLEACHED LPD-NIO FILMS 41
FIGURE 3-14 OPERATION VOLTAGE 42
FIGURE 3-15 REACTION TIME 43
FIGURE 3-16 MEMORY TIME 44

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