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博碩士論文 etd-0726111-154046 詳細資訊
Title page for etd-0726111-154046
論文名稱
Title
電沉積參數對類鑽碳薄膜成長之研究
Study on the electrodeposition parameters of the growth DLC thin film
系所名稱
Department
畢業學年期
Year, semester
語文別
Language
學位類別
Degree
頁數
Number of pages
139
研究生
Author
指導教授
Advisor
召集委員
Convenor
口試委員
Advisory Committee
口試日期
Date of Exam
2011-07-21
繳交日期
Date of Submission
2011-07-26
關鍵字
Keywords
折射率、粗糙度、掺雜氮、類鑽碳、電沉積
Refractive index, Electrodeposition, Nitrogen-doped, DLC, Roughness
統計
Statistics
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中文摘要
本文研究利用電沉積法,在低電位下的ITO基板上進行沉積類鑽碳薄膜,電解液為混合醋酸和去離子水的醋酸水溶液,藉由改變不同的沉積參數包括電位(2.1V~50V)、沉積溫度(30℃~85℃)、溶液濃度(0.1%~0.8%)、沉積時間(0.5hr~4hr),探討薄膜沉積過程的成長機制,最後在改變沉積溫度下進行薄膜的摻雜。在特性的研究上,利用I-T電流曲線圖、SEM、AFM、FTIR、XPS、Raman、N&K等來作分析,隨著實驗參數溫度、時間的增加,薄膜在結構、形貌的結果顯示,類鑽碳薄膜的表面粗糙度下降,sp3/sp2+sp3的比值增加;在光學特性研究發現,類鑽碳薄膜的折射率、光能隙隨沉積溫度上升而變大;膜厚分析顯示,因水溶液中的H+會蝕刻碳膜使產生氫氣或甲烷分子,讓薄膜厚度減少,而摻雜氮的薄膜厚度亦無法有效增加,推測可能是沉積過程中產生了含有CN等的揮發性物質,使膜厚減少;根據本文研究,發現掺氮的類鑽碳薄膜表面會較均勻緻密且會趨於石墨化,但隨著沉積溫度的增加,sp3C-N的比例會增加,sp2C-C的比例相對減少,使能隙值上升、折射率變高。
Abstract
In this study, DLC thin films were electrodeposited at low DC potential using a mixture of acetic acid and DI water with different ratio. The parameters of DLC thin film deposition include the DC potential, deposition temperature, concentration of electrolyte solution, were correlated to the growth mechanism. The amount of nitrogen incorporated into DLC thin films were varied with the deposited temperature. The characteristics of DLC films by various measurements such as : the I-t curves of DLC film growth, SEM, AFM, FTIR, XPS, Raman and N&K spectroscopy, were investigated in detail. Experimental results showed that the surface roughness decreased, and sp3/sp2+sp3 value of DLC increased with the deposition temperature and deposition time. Optical properties showed that the refractive index, optical energy gap increased with the deposition temperature. For SEM cross-section measurement, it showed that the thickness of DLC films decreased due to the erosion process. However, the N-DLC films become graphitization. According to our study, we find that the surface morphology of the N-DLC films are homogeneous and compact. However, with the increase of the deposition temperature, the ratio of sp3-C-N bonds increase and the ratio of sp2-C-C bonds decrease, and these lead to the increase of refractive index and optical energy gap.
目次 Table of Contents
國立中山大學研究生學位論文審定書 i
致謝 ii
摘要 iii
Abstract iv
目錄 v
圖目錄 x
表目錄 xv
第一章 緒論 1
1-1 前言 1
1-2 研究目的 2
1-3 論文架構 3
第二章 理論背景 4
2-1 碳的結構與種類 4
2-2 類鑽碳 5
2-3 類鑽碳的能帶結構和模型 6
2-4 類鑽碳的製備方法 7
2-5 電沉積的起源 10
2-6 類鑚碳的成長機制 11
2-7 類鑚碳的應用 13
第三章 實驗方法與儀器設備 15
3-1實驗材料與儀器設備 15
3-1-1實驗材料 16
3-1-2儀器設備 16
3-2 類鑽碳成膜與實驗操作步驟 17
3-2-1基板的前製處理 17
3-2-2電解液的泡製 17
3-2-3電沉積之操作步驟 17
3-3 量測儀器與其原理 18
3-3-1 掃描式電子顯微鏡 18
3-3-2 原子力顯微鏡 18
3-3-3 傅立葉轉換紅外光譜儀 (中紅外光區域) 18
3-3-4 X光光電子能譜儀 19
3-3-5 顯微拉曼光譜儀 19
3-3-6 薄膜特性分析儀 19
第四章 結果與討論 20
4-1 電流曲線特性分析 20
4-1-1 醋酸電解液中電流與電壓的關係 20
4-1-2 工作濃度之影響 21
4-1-3 工作溫度之影響 22
4-1-4 工作電壓之影響 23
4-1-5 工作時間之影響 25
4-1-6 摻雜之影響 26
4-2化學反應機制 27
4-2-1 醋酸水溶液(未摻雜) 27
4-2-2 醋酸水溶液(摻雜氮) 28
4-3 SEM表面結構分析 28
4-3-1 濃度之影響 28
4-3-2 溫度之影響 29
4-3-3 電壓之影響 29
4-3-4 工作時間之影響 29
4-3-5 摻雜之影響 30
4-4 SEM 膜厚分析 30
4-4-1 濃度之影響 30
4-4-2 溫度之影響 30
4-4-3 電壓之影響 31
4-4-4 工作時間之影響 31
4-4-5 摻雜之影響 31
4-4-6 膜厚成長機制 31
4-5 AFM表面形貌分析 32
4-5-1濃度之影響 32
4-5-2 低電壓之影響 33
4-5-3 沉積時間之影響 33
4-5-4 沉積溫度之影響 34
4-5-5 摻雜之影響 34
4-6 FTIR表面結構分析 35
4-6-1 摻雜之影響 35
4-7 X光光電子能譜分析 36
4-7-1 濃度之比較 36
4-7-2 工作電壓之比較 36
4-7-3 工作時間之比較 37
4-7-4 工作溫度之比較 37
4-7-5 掺雜之比較 37
4-8 Raman光譜分析 38
4-8-1 溫度之影響 (未摻雜 & 摻雜) 38
4-9 光學分析 39
4-9-1 沉積溫度對穿透率、反射率、吸收率之影響 39
4-9-2 沉積溫度對折射率之影響 39
4-9-3 沉積溫度對光能隙之影響 40
第五章 結論 42
參考文獻 116
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