本論文為利用電子束微影術，研製二維光子晶體微共振腔量子點雷射。犧牲層(Al0.5Ga0.5As) 成長在Dwells結構下方，以達成主動層上下方皆為空氣包圍。在垂直方向有極大的折射率差以侷限能量，得以成功製作出較低臨界電流之光子晶體雷射。
在製作光子晶體元件前，藉由製作微碟共振腔結構，可由此判斷樣品磊晶品質。二維光子晶體微共振腔方面，我們著手設計L3、H2與H3缺陷之共振腔，並在結構上設計不同的開窗口方式，得以支撐光子晶體薄膜共振腔不會向下塌陷。我們以金屬掀離技術做出蝕刻遮罩，再利用乾溼蝕刻技術成功地製作微碟共振腔與光子晶體薄膜共振腔。在室溫下，以μ-PL量測到直徑3μm之微碟共振腔共振模態，樣品C488共振模態波長為1.28μm，Q值可達914。此外，我們以樣品C488製作三種不同缺陷(L3、H2、H3)光子晶體薄膜結構，量測到其共振模態，其中H3結構量測到共振模態波長為1.26μm，Q值達503。

In the thesis, we fabricated the quantum dots lasers of 2D photonic crystal microcavity structures by E-beam lithography. The Al0.5Ga0.5As sacrificing layer beneath the Dwells structure is used for the purpose of suspending the active layer by air. Therefore, it has a high refractive index contrast in vertical direction to confine energy. Finally, we could fabricate a low threshold current photonic crystal laser.
We can judge the epitaxy quality by the Microdisk (MD) process before the photonic crystal device process. For the 2D photonic crystal microcavity, we design different kinds of window to support the photonic crystal membrane cavity. We use dry and wet etching technique and metal mask to fabricate MD and photonic crystal membrane cavity. We use μ-PL to measure MD cavity resonant mode for the device of diameter 3μm at room temperature. In addition, we design three kinds of defects (L3, H2, H3) of photonic crystal membrane structures using the sample C488. We measure resonant mode with H3 structure. The H3 structure measured resonant wavelength 1.26μm, with Q =503.

第一章 導論...........................................................................1
1-1 前言.................................................................................2
1-2 光子晶體簡介.................................................................3
1-3 砷化銦量子點雷射.........................................................6
1-4 論文架構.........................................................................7
第二章 基本原理 ..................................................................8
2-1基本模擬原理..................................................................8
2-1.1 前言..............................................................................8
2-1.2 TE與TM波...................................................................9
2-1.3 平面波展開法(PWM)................................................11
2-1.4 有限時域差分法(FDTD)...........................................13
2-2有效折射率計算............................................................14
2-3二維光子晶體雷射原理................................................18
第三章 模擬與樣品討論.....................................................22
3-1光子晶體微共振腔........................................................22
3-2光子晶體微共振腔模擬................................................26
3-3實驗樣品........................................................................29
3-3.1 成長樣品....................................................................29
3-3.2 樣品特性....................................................................31
3-3.3 樣品簡介....................................................................40
第四章 二維光子晶體平板微共振腔製作與量測.............44
4-1 前言...............................................................................44
4-2 微共振腔製程示意圖...................................................45
4-2.1 微碟共振腔................................................................45
4-2.2 二維光子晶體微共振腔............................................46
4-3 微共振腔製程步驟-光子晶體微共振腔、微碟共振腔..47
4-4量測結果.......................................................................56
4-4.1 量測系統簡介...........................................................56
4-4.2 微碟共振腔模態分析...............................................57
4-4.3 二維光子晶體微共振腔模態分析...........................62
第五章 結論........................................................................67
參考文獻.............................................................................68
附錄A..................................................................................70

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