氧化鋅奈米針(ZnO nanotip)的長度可以靠時間來控制，以及氧化鋅奈米針在300 oC氧氣回火中有最強的結晶性，二氧化鈦(TiO2)薄膜厚度亦可由時間來控制。
本實驗研究方向分為:
1:二氧化鈦膜厚控制與氧化鋅奈米針生長長度控制與兩者之光觸媒(Photocatalyses)能力。
2:二氧化鈦粉末(P25)與薄膜狀態的光觸媒能力比較，量測光觸媒能力是否與表面積有關。
3:利用氧化鋅奈米針/二氧化鈦薄膜與二氧化鈦薄膜/氧化鋅奈米針異質接面(Heterojunctions)來增加其光觸媒能力，本實驗所有測量都以二氧化鈦粉末作為基準來比較。

The length of ZnO nanotip can be controlled by the deposition time, and the crystal of ZnO nanotip can be enhanced by a thermal annealing at 300oC in this study.The thickness of TiO2 on ITO/glass also can be controlled by the deposition time in this investigate.
There are three major parts in this study :
1. (1). The control of thickness of TiO2 film and length of ZnO nanotip and (2). the difference of their photocatalytic activities are two major parts.
2. The relationship between the surface area and the photocatalytic activities of TiO2 powder (P25) and film.
3. The improvement of photocatalytic activity was utilized by the hetrojunction of ZnO nanotip/TiO2 and TiO2/ZnO nanotip, and the P25 is used as a reference for all measurements.

Chapter 1 16
Introduction 16
1.1 Background 16
1.2 Photocatalysis 17
1.3 Semiconductor Photocatalysis 18
1.4 Mechanism of Photocatalysis 19
1.5 Properties of TiO2 and Applications 20
1.6 Properties of ZnO and Applications 21
1.6.1 Optoelectronics: 22
1.6.2 Transparent Conductive Film: 23
1.7 Preparations of TiO2 24
1.8 Synthesis of ZnO nanotip 25
1.9 Advantages of aqueous solution Deposition (ASD) 26
1.10 Problem of photocatalytic activity 26
1.11 Motivations of Heterojunction 27
References 33
Chapter 2 44
Experiments 44
2.1 Substrate Cleaning Procedures 44
2.2 ZnO buffer layer and TiO2 thin film prepared by RF Sputtering 45
2.2.1 Sputtering mechanism 45
2.2.2 RF Sputtering 46
2.2.3 ZnO buffer layer prepared with ZnO target by RF Sputtering 46
2.2.3 TiO2 thin film prepared with TiO2 target by RF Sputtering 47
2.3 Preparation of Aqueous Solution Deposition (ASD) 47
2.3.1 Process of ASD-ZnO nanotip 48
2.3.2Basic Mechanism 48
2.4 Aqueous Solution Deposition System 50
2.4.1 Preparation of ASD-TiO2 50
2.4.1 Preparation of (NH4)2TiF6 Solution 50
2.4.2 Preparation of H3BO3 Solution 50
2.4.3 Film Deposition 51
2.4.4 Growth Mechanisms of ASD-TiO2 thin film 51
2.5 Preparation of TiO2 porous layer 52
2.6 Characterization Techniques of Physical and Chemical 52
2.6.1 Morphology-Scanning electron microscopy: 53
2.6.2 Structure X-ray diffraction : 54
2.6.3 Optical property-micro Photoluminescence (μ-PL) : 54
2.6.4 Atomic Force Microscopy (AFM) 56
2.6.5 Fourier-transform infrared spectrometer : 57
2.6.6 Utraviolet-Visible (UV-Vis) transmittance spectrum : 57
2.7 Photocatalytic Activity 58
2.8 Main measurement of Photocatalytic Activity 58
References 69
Chapter 3 71
Result and Discussion 71
3.1 The characteristics and photocatalytic activity of ASD-TiO2 film, sputtered TiO2 film and spin coating P25 on poly ITO/glass substrate 72
3.1.1 ASD-TiO2 Film on ITO/glass Substrate 72
3.1.2 The relationship between thickness and deposition time of ASD-TiO2 films 73
3.1.2 XRD Patterns of ASD-TiO2 Films by O2 Annealing 76
3.1.3 Micro PL and XRD intensity of P25 sintered in air and ASD-TiO2 with annealing treatment in O2 77
3.2 The characteristics and photocatalytic activity of ASD-ZnO nanotip / ZnO buffer layer on poly ITO/glass substrate 85
3.2.1 ZnO Buffer layer 85
3.2.2 The length ASD-ZnO nanotip as a function of deposition time 88
3.2.3 Micro PL and XRD 91
3.2.4 Photocatalytic activity measurement of transmittance of ASD-ZnO nanotip 95
3.3 The characteristics and photocatalytic activity of ASD-TiO2 film, sputtered TiO2 film and spin coating P25 on ASD-ZnO nanotip / ZnO buffer layer on poly ITO/glass substrate 96
3.3.1 Characteristics of SEM and XRD of ASD-TiO2 film, sputtered TiO2 film and spin coating P25 on ASD-ZnO nanotip 96
3.3.2 Photocatalytic activity measurement of transmittance of ASD-TiO2 film, sputtered TiO2 film and spin coating P25 on ASD-ZnO nanotip for 4 hr. and 24 hr.. 102
3.4 The characteristics and photocatalytic activity of ASD-ZnO nanotip / ZnO buffer layer on ASD-TiO2 film, sputtered TiO2 film and spin coating P25 on poly ITO/glass substrate 106
3.4.1 Characteristics of SEM and XRD of ASD-TiO2 film, sputtered TiO2 film and spin coating P25 on ASD-ZnO nanotip 106
3.3.3 Photocatalytic activity measurement of transmittance of ASD-ZnO nanotip for 4 hr. and 24 hr. on ASD-TiO2 film, sputtered TiO2 film and spin coating P25. 110
References 114
Chapter 4 115
Conclusions 115

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