本研究以磁性流體力學模式模擬在兩無窮遠電極板間，低壓、高氣體密度和，瞬間給定一偏壓電位條件下之氫氣電漿的非穩態二度空間的輸送變數。近年來電漿已被廣泛且有效地運用在材料加工製造、薄膜製造、核融合發電、光源等，因此電漿輸送現象的研究非常重要。本研究考慮電場及磁場效應，並包動量交換的碰撞效應。本模型之計算結果將顯示極板在瞬間給定負直流偏壓電位條件下，離子通過鞘層到達工作表面的密度、速度、電位、溫度、黏滯係數及熱傳導係數。

This study uses the MHD (Magnetohydrodynamics) model to simulate unsteady two-dimensional transport variables in helium plasma under low pressure between two infinite planar electrodes suddenly biased by a negative voltage. Plasma has been widely used in etching, ion implantation, light source, and encountered in nuclear fusion, etc. Studying transport processes of plasmas therefore is important. By account for momentum exchange collisions, electric fields and magnetic fields the computed results in this work quantitatively show density, velocity, electric potential, temperature, viscosity, thermal conductivity of the ions and electrons across the sheath to the surfaces suddenly biased by a dc negative voltage.

目錄
謝誌 i
目錄 ii
中文摘要 vi
Abstract vii
符號說明 viii
第一章 緒論 1
1.1 研究背景與目的 1
1.2磁性流體力學模擬簡介 2
1.3 本論文研究內容簡介 3
1.4 本文架構 3
第二章 理論分析 4
2.1系統模型與假設 4
2.2 模型統御方程式 5
2.2.1連續方程 5
2.2.2動量方程 6
2.2.3能量守恆 11
2.2.4馬克斯威爾方程式 16
2.3 無因次化 19
第三章 研究結果與討論 20
3.1電漿密度 20
3.2電漿速度 23
3.3電位 26
3.4溫度、壓力 27
3.5黏度 29
3.6熱傳導係數 30
第四章 結論 32
附錄一 無因次參數及方程式 33
參考文獻 40

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