本研究使用粒子網格PIC(particle-in-cell)方法模擬在兩極板間，低壓、低氣體密度，氬氣體電漿粒子的非穩態三度空間運動行為。電漿之用途極廣，可用於材料加工、薄膜製造、核融合、光源等，研究電漿的運動行為因此非常重要。本模型不考慮二次電子散射和離子與電子間的複合碰撞；中性粒子為均勻分布；速度滿足麥斯威爾分布；兩極板間給定一穩定電壓差；考慮磁場所帶來的效應。模擬結果顯示電子與離子間的速度、密度和外加能量對電漿的影響。

This study uses the PIC (particle-in-cell) method to simulate unsteady three-dimensional behavior in argon plasma under low pressure , low density between two plates. Plasma has been widely used in materials processing, film manufacturing, nuclear fusion , light source , etc. It is therefore important to study Plasma behavior . This model ignores secondary electron emission , recombination between ions and electrons and assumes a uniform distribution of the neutrals having velocity of a Maxwellian distribution. The lower plate in subject to a biased voltage and magnetic field. The result show the effects of a biased voltage in density and velocity of the ion and electron with the low plate.

目錄
摘要 II
Abstract III
謝 誌 IV
目錄 V
圖目錄 VII
符號說明 VIII
上下標符號 IX
第一章 緒論 1
1.1 研究背景與目的 1
1.2粒子網格方法(PIC)簡介 2
1.3 本論文研究內容簡介 4
1.4 本論文大綱 5
第二章 理論分析與方法 6
2.1基本假設條件 6
2.2無因次化 7
2.3模擬流程 8
2.4粒子初始的設定 9
2.5粒子運動方程式 10
2.6利用權重法求計算電場和受力 11
2.7電荷密度的計算 12
2.8電流密度的計算 13
2.9電磁場的計算 15
2.11穩定準則 20
第三章 研究結果與討論 21
3.1電位 21
3.2電場 22
3.3粒子速度 23
3.3.1離子速度 23
3.3.2電子速度 24
3.4粒子密度 25
3.4.1離子密度 25
3.4.2電子密度 26
第四章 結論 27
附錄A 模擬系統參數 28
參考文獻 29

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