本論文的研究對象是以脈衝雷射沉積系統( pulsed laser deposition , PLD)於不同氧含量下，成長於c-面藍寶石基板上的氧化鎳(NiO)薄膜。
測量方式包含穿透式電子顯微鏡 (Transmission Electron Microscopy, TEM) 觀察NiO與基板介面間的磊晶關係，及NiO、Al2O3介面的結構：X光繞射(X-ray diffraction)分別以2θ-ω掃描、搖擺曲線(rocking curve)、Ф-scan、低掠角繞射(grazing incidence X-ray diffraction, GIXRD) 掃描法，來了解NiO之晶面方向、晶格常數變化、結晶品質及與基板的磊晶關係；藉由量測波段於400-1050 nm之穿透率(transmittance)與反射率(reflectance)，分析NiO薄膜的光學特性。再進而得知光學上重要的係數，如折射率(refractive index, n)、消散係數 (extinction coefficient, k )、光學吸收係數(optical absorption coefficient,α) 及能隙 (band-gap energy, Eg)，觀察其隨著氧含量的變化關係，研究在不同氧含量下，NiO結構與光學的特徵變化。

In this thesis work, the NiO thin films with different oxygen contents were grown on c-plane sapphire substrates by pulsed laser deposition (PLD) methods. Transmission electron microscopy (TEM) was employed to study the epitaxial relationship and twin structure between the NiO thin films and the c-Al2O3 substrates. X-ray diffraction (XRD) studies through 2θ-ω, rocking curve, GIXRD and Ф-scans were also conducted to determine the crystallographic orientations, lattice constant changes and general qualities of the NiO samples. The optical properties were investigated by analysis of the transmittance and reflectance data measured in the spectral wavelength range between 400 and1050 nm. The values of some important parameters of the studied films are acquired, such as refractive index (n), extinction coefficient (k), optical absorption coefficient (α) and band-gap energy (Eg). The theme of the thesis was to analyze the NiO structures in correlation to the optical properties of the samples with various oxygen contents acquired by different oxygen partial pressure during the thin film deposition.

論文審定書 i
致謝 ii
摘要 iii
Abstract iv
目錄 v
圖表目錄 vii
第一章、 緒論 1
1-1氧化鎳(NiO)-結構及用途 1
1-2透明導電薄膜的發展 2
1-3透明導電薄膜 3
1-3-1 金屬薄膜 3
1-3-2 氧化物半導體薄膜 3
第二章、實驗儀器介紹及理論基礎 7
2-1脈衝雷射沉積系統( Pulsed Laser Deposition ) 7
2- 2 X光繞射 (X-Ray Diffraction) 8
2-2-1 θ-2θ scan 9
2-2-2 Grazing Incidence X-ray Diffraction (GIXRD) 10
2-2-3 Phi scan 11
2-2-4 Rocking Curves (ω-scan) 11
2-2-5 XRR scan( X-ray reflectivity) 12
2- 4紫外線可見光光譜儀 (Ultraviolet Visible Spectrometer) 15
2-5 反射光譜儀 15
第三章 實驗設計與流程 16
第四章 實驗結果與分析 17
4-1 X-Ray繞射量測 17
4-1-1 2θ-ω scan 17
4-1-2 XRR-scan 19
4-1-3 Grazing Incidence X-ray Diffraction (GIXRD) 21
4-1-4 Φ-scan 22
4-1-5 Rocking curves 25
4-2 TEM 電子繞射量測 35
4-3光學分析 41
4-3-1 穿透光譜量測 41
4-3-2反射光譜量測 43
4-3-2載子濃度計算 47
第五章 結論 49
參考文獻 50
附錄 53

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