本研究提出使用導電高分子當作工具電極電解複合研磨
不?袗?表面之新方法。此法是利用導電高分子之微電流下，使
工件材料電解溶出，同時配合磨粒擦過工件表面，將表面凸起
的部分去除，來達到高效率和表面粗糙度達到微奈米級的鏡面
研磨。
在 微 電解 加工 實 驗 方 面 ， 設 試 片 原 始 表 面 粗 糙 度
Rmax=1.645μ m、電極平均移動速度 25mm/sec、加工時間
10min、電解液溫度 25℃以及加工衝程 10 mm 為一定的實驗條
件。另設含不同濃度(0~40wt%)硝酸鈉(NaNO3)的電解液、加
工負荷(0~20N) 、加工電流(0~100mA)為可變條件。結果發現
在電解液濃度 20wt%、加工電流 25mA 和加工負荷 10N 下，
最小表面粗糙度 Rmax=0.3μm。
根據上述的 微 電 解 加 工 實 驗 結 果 ， 選 用 電 解 液 濃 度
20wt%、加工電流 25mA 和加工負荷 10N。再於電解液中添加
平均粒徑 9.5μm 的碳化矽磨粒進行電解複合研磨實驗。實驗
結果發現電解複合研磨與微電解加工的情況相比較，最大加工
深度增加約一倍，表面粗糙度降低約 50%。即可使工件達到加
工深度 1.5μm 和 Rmax=0.15μm 的光滑鏡面。

In this study, a conductive polymer is used as tool electrode in machining the
stainless steel surface by electrochemical buffing. Using a very small working current of
this conductive polymer, the material of the workpiece is dissolved, and the peaks on
the workpiece surface is buffed by the abrasive simultaneously. A mirror-like surface
can be achieved with high efficiency using this novel method.
In the micro-electrochemical machining experiments, the initial surface roughness
of the workpiece is about Rmax = 1.645 μm, the average speed of electrode 25
mm/sec, the machining time 10 min, the electrolyte temperature 25℃, and the stroke 10 mm. The variable conditions are given as follows: the sodium nitrate
(NaNO3) electrolyte of 0 to 40 wt%, the normal load of 0 to 20 N, and the working
current of 0 to 100 mA. Experimental results show that the minimum surface roughness
of the workpiece can be achieved to about Rmax = 0.3μm at the electrolyte concentration
of 20 wt%, the working current of 25 mA, and the normal load of 10N, which is
selected as the optimum operative parameters in the following.
The silicon carbide with average particle size of 9.5μm is added to conduct the
electrochemical buffing experiments. Compared with the micro-electrochemical
machining method, results show that the maximum machining depth increases to about
two times, and the surface roughness decreases to about 50%. In this condition, the
mirror-like surface of the workpiece with the working depth of 1.5μm and Rmax of
0.15μm can be achieved.

論文審定書 ·············································································································· i
誌謝 ························································································································· ii
中文摘要 ················································································································ iii
英文摘要 ················································································································ iv
總目錄 ····················································································································· v
圖目錄 ·················································································································· viii
表目錄 ···················································································································· xi
第一章 緒論 ·········································································································· 1
1.1研究動機 ··········································································································· 1
1.2基本原理 ··········································································································· 2
1.2.1 電解加工 ······························································································· 2
1.2.2 電解拋光 ······························································································· 3
1.2.3 電解複合研磨 ······················································································· 4
1.2.4 導電高分子 ··························································································· 5
1.3文獻回顧 ··········································································································· 6
1.3.1電解加工 ································································································ 6
1.3.2 電解拋光 ······························································································· 6
1.3.3 電解複合研磨 ······················································································· 9
1.3.4絕緣性高分子材料複合磨粒之研磨工具 ·········································· 14
1.4研究目的 ········································································································· 17
第二章 實驗設備及方法 ································································· 18
2.1 實驗設備 ········································································································ 18
2.1.1往復摩擦式鏡面加工試驗機系統 ······················································ 18
2.1.2實驗資料蒐集分析與訊號量測設備 ·················································· 20
2.2 實驗試片之材料特性與幾何形狀 ································································ 21
2.2.1不?袗?工件之材料特性與幾何形狀 ·················································· 21
2.2.2電解液的選擇 ······················································································ 22
2.2.3 工具電極 ····························································································· 23
2.3 試片處理 ········································································································ 24
2.1.3 不?袗?工件 ························································································· 24
2.3.2 工具電極 ····························································································· 25
2.4 實驗條件設定 ································································································ 26
2.5 實驗步驟 ········································································································ 27
2.5.1 NaNO3電解液之調配 ·········································································· 27
2.5.2 實驗流程 ····························································································· 27
2.5.3 不?袗?表面工件之量測 ····································································· 28
2.5.4 電流波形之量測 ················································································· 30
第三章 實驗結果與討論 ··································································· 31
3.1 電解液濃度 ···································································································· 31
3.2 加工電流 ········································································································ 37
3.3 加工負荷 ········································································································ 43
3.4 添加磨粒 ········································································································ 50
3.4.1磨粒種類 ······························································································ 56
3.4.2磨粒粒徑 ······························································································ 61
3.4.3加工電流 ······························································································ 67
第四章 結論 ······················································································· 73
4.1 結論 ················································································································ 73
4.2 未來研究方向 ································································································ 74
參考文獻 ····························································································· 75

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