軟性電子 (Flexible Electronics)屬多層膜的複合結構，當結構承受外力作用時，界面間的變形、黏附機制及透光率是值得探討地。首先以PVD (Physical Vapor Deposition)將ITO (Indium Tin Oxide)、Al (Aluminum)以及ZnO (Zinc Oxide)依序鍍於PET (Poly Ethylene Terephthalate)高分子軟性基板上。形成ZnO/ITO/PET與ZnO/Al/PET等結構，此為軟性電子中撓性傳感器的新穎多層膜結構。上述結構中的ITO/PET亦為被廣泛應用於觸控面板的基礎結構。PET基板擁有良好的光學穿透性與低的熱膨脹係數且價格便宜，但其耐熱與化學穩定性較差，本研究引進PDMS (Polydimethylsiloxane)軟性基板來驗證可行性。PDMS除了有良好的光學穿透性之外，酸鹼選擇比較PET來的高，有利於後續的酸鹼溶液製程。分析測試部分則利用週期性的外力，施加於上述軟性複合結構，並以奈米壓痕刮痕系統 (在此選用Berkovich和Conical探針，曲率半徑分別為40nm、10um)、四點探針及光譜儀，來量測薄膜的機械性質、電性及光穿透率，並比較複合結構於外力測試前後之差異。為了瞭解外力對此複合薄膜結構的影響，經由外力測試後，以刮痕試驗探討薄膜界面間的相互作用，分別比較Al與ITO對於基材與ZnO間的機械性質，了解薄膜及高分子基材界面結合性。並透過不同基材之測試比較，提供高分子基材種類上選擇的參考依據，提高軟性電子於相關領域基礎結構的發展。

The deformation between interface, adhesion mechanism and the transparency of multi-layer flexible electronics composite were discussed. First, ITO (Indium Tin Oxide), Al (Aluminum) and ZnO (Zinc Oxide) were sputtered on a PET (Poly Ethylene Terephthalate) substrate by PVD (Physical Vapor Deposition) sequentially, to form ZnO/ITO/PET and ZnO/Al/PET which is the essential multi-layer structure in the transducer of flexible electronics. ITO/PET structure was widely applied to the touch panel. PET substrate possesses a good optical penetrability, low thermal expansion coefficient and lower price. However, the heat-resisting and chemical stability are poor. In this study, we explore the feasibility of the PDMS (Polydimethylsiloxane) substrate. It not only possesses good optical penetrability, but also exhibits higher PH selectivity than PET. In the analysis, the periodic external force was pressed on the flexible composite films to realize the difference between before and after experiment. Then the composite films were examined by nanoindentation and nanoscratch system (Berkovich and Conical probe with the radius of curvature of 20nm and 10um), four-point probe and spectrometer to measure the mechanical, electrical and optical properties, respectively. To investigate the effect of external force on these composite films, the interaction of films was discussed through external force testing by nanoscratch test.

目錄 I
圖目錄 IV
表目錄 VII
符號說明 VIII
中文摘要 X
英文摘要 XI
第一章 緒論 1
1-1 前言 1
1-2 文獻回顧 2
1-3 研究目的與動機 7
1-4 本文架構 9
第二章 原理 10
　　2-1 薄膜沉積原理 10
　　　　 2-1-1 薄膜濺鍍系統之原理 10
2-1-2 輝光放電 11
2-1-3 射頻濺鍍 11
2-1-4 導電薄膜製程技術 12
　　2-2 奈米壓痕試驗 12
2-2-1 奈米壓痕之硬度及彈性模數量測 13
2-2-2 動態壓痕之原理 17
2-2-3 黏彈性材料之複合模數建立 20
2-2-4 圓錐形探針公式修正 21
　　2-3 奈米刮痕試驗 23
2-3-1 刮痕原理 23
2-3-2 薄膜磨耗變形機制 24
2-3-3 奈米刮痕模組 25
2-3-4 探針特性 29
　　2-4掃描式電子顯微鏡 31
第三章 實驗方法與步驟 33
　　3-1 實驗流程 33
　　3-2 實驗材料與製作 34
3-2-1 可撓式透明軟性基板製作 34
3-2-2 薄膜沉積 35
　　3-3實驗分析儀器 37
3-3-1 奈米壓痕刮痕量測系統 37
3-3-2 光學顯微鏡 38
3-3-3 場發射掃描式電子顯微鏡 39
3-3-4 四點探針 40
3-3-5 可見光/紫外光光譜儀 41
第四章 結果與討論 43
　　4-1 四點探針之電性分析 43
　　4-2 可見光/紫外光光譜儀之光學性質分析 44
　　4-3 奈米壓痕試驗 47
　　4-4 奈米刮痕試驗 50
4-4-1 振動測試前的刮痕試驗 50
4-4-2 振動測試後之刮痕試驗 55
　　4-5 SEM與OM之觀測 60
第五章 結論與建議 71
　　5-1 結論 71
　　5-2 建議 73
參考文獻 74

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