由於科技的進步，產品的微小化逐漸成為一種趨勢，因此製程所要求的特徵也越來越小，目前發展出一種新興的製程技術--奈米壓印技術，具有製程簡單、成本低廉、又兼具量產的優勢，並且可以輕易的製作出奈米級的微結構，是相當被看好的新製程技術。本研究為使用FIB在石英玻璃上作出線寬為100nm以下之柵型結構，之後用PDMS翻模與石英模仁結合奈米壓印技術，分別壓印出100nm線寬以下的光柵結構。由於PDMS成型方便快速，但應用小尺寸上的壓印研究卻不多，所以探討PDMS在奈米壓印小尺寸上的研究是非常重要的，以實驗探討求的PDMS最佳的成型參數，以及使用PDMS模仁進行壓印壓力的實驗探討，求得其最佳的成型壓印，再以最佳的成型參數及壓印壓力，求的最佳的實驗結果。實驗結果成功的壓印出線寬為40nm的柵型結構。

Miniaturization has become a product trend due to technological advancements, thus giving rise to nanoimprint lithography printing. Miniaturization is also a trend regarding process features. nanoimprint lithography has great potential for its simple process, low cost, mass-production capacity, and ease to produce nanoscale microstructure. After making a fence structure of line width less than 100nm on quartz glass with FIB, this study printed the fence structure of line width less than 100nm with the nanoimprint lithography using PDMS mold and quartz soft mold. Though PDMS molding is fast and convenient, it is uncommon with regard to small-size press. This study investigated the application of PDMS molds to nanoimprint lithography in order to verify the optimal parameters of PDMS molding and the results of nanoimprint lithography with PDMS soft modes. After obtaining the optimal molding press, the optimal molding parameters and press pressure were applied to find the optimal experimental results. Results show that the combination can successfully print a fence structure with a line width of 40nm.

目錄
中文摘要 Ⅰ
英文摘要 Ⅱ
誌謝 Ⅲ
目錄 Ⅳ
圖目錄 ,Ⅵ
表目錄 Ⅸ


第一章 緒論 1
1-3 前言 1
1-2 研究動機及目的 2
1-3 全文架構 3

第二章 文獻回顧 1
2-1 奈米壓印原理 4
2-1-1奈米壓印的種類 4
2-2 飲微影製程技術 9
2-3影響奈米壓印參數 14

第三章實驗儀器與材料及實驗方法和步驟 15
3-1 實驗儀器 15
3-1-1場發射型掃描式電子顯微鏡(JEOL-6330 SEM) 15
3-1-2環境掃描式電子顯微鏡（ESEM） 15
3-1-3掃描探針式電子顯微鏡 16
3-2 實驗材料 16
3-2-1模仁材料 16
3-2-2脫模劑 17
3-2-3光阻材料 17
3-3 實驗方法 19
3-4 實驗規畫 19
3-4-2石英模仁製作 20
3-4-2石英模仁的清洗烘乾及脫模劑的成長 20
3-4-3調配PDMS 20
3-4-4 PDMS上成長脫模劑 20
3-4-5清洗玻璃基材 20
3-4-6光阻塗佈 21
3-4-7軟烤 21
3-4-8壓印 21
3-4-9曝光硬化 21
3-4-10硬烤 21
3-4-11脫模 22
3-4-12壓印結構檢測 22

第四章實驗結果及探討 23
4-1 PDMS模仁成形參數探討 23
4-1-1抽真空，再灌模的方式 23
4-1-2抽真空，灌模再抽真空方式 25
4-2 PDMS模仁壓印壓力探討(溫度固定，壓印溫度為85°C) 27
4-2-1以3kg/cm2進行壓印 27
4-2-2以3.5kg/cm2進行壓印 28
4-3 PDMS模仁最佳化的壓印結果 34
4-4 線寬100nm以下石英模仁壓印高分子材料(SU-8)實驗 48
4-5 結果討論 61

第五章結論及未來期許 67
5- 1結論 67
5- 2 未來展望 68

參考文獻 69

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