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博碩士論文 etd-0912107-194543 詳細資訊
Title page for etd-0912107-194543
論文名稱
Title
面型微加工可變電容之設計與機電分析
Design and Electromechanical Analysis of Surface-Micromachined Tunable Capacitor
系所名稱
Department
畢業學年期
Year, semester
語文別
Language
學位類別
Degree
頁數
Number of pages
72
研究生
Author
指導教授
Advisor
召集委員
Convenor
口試委員
Advisory Committee
口試日期
Date of Exam
2007-07-20
繳交日期
Date of Submission
2007-09-12
關鍵字
Keywords
微型可變電容、面型微加工、機電分析
micro tunable capacitor, surface-micromachining, electromechanical analysis
統計
Statistics
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中文摘要
本論文致力於面型微加工之微型可變電容之設計與模擬以獲得最佳化的元件幾何參數;另一方面,並進一步建立其等效電路模型以及進行相關之機電分析,例如:電場分佈、電荷分佈、共振頻率及pull-in電壓等分析。元件的基本結構是由一個上懸浮電極,以及兩個固定於基板上之底電極(分別為訊號電極與偏壓電極)所組成。元件是採用靜電力驅動方式,使上電極與偏壓底電極之間距產生變化進而調變訊號電極與上電極之電容值。為了增加電容調變率,本論文更進一步採用兩個不同電極間距之凹型結構設計。
高頻分析、等效電路分析與機電動態分析分別是利用Ansoft HFSS、Agilent ADS及IntelliSuite軟體進行模擬與分析,藉由這些模擬軟體可以在設計階段模擬出最佳化的元件參數。本研究所模擬的Q值與Pull-in電壓均與實際量測結果大致相符,證明本文所採用之模擬分析方法與所建立之等效模型是正確的。
Abstract
This paper aims to design and simulate the surface-micromachining micro tunable capacitor for parameters optimization. This work also creates an equivalent circuit model of micro tunable capacitor and proceeds relative electromechanical analysis, including the distribution of field and charge, resonant frequency and pull-in voltage analysis. This micro tunable capacitor is constructed by one suspended top metal plate and two stationary bottom metal plates (one is signal electrode and the other one is bias electrode). By driving electrostatic force, the gap between top and bottom electrodes will be changed and results in a variation of capacitance. To increase the tuning range, the micro tunable capacitor with two different gap space will be presented in this research.
High frequency analysis, equivalent circuit analysis and electromechanical dynamic analysis are using Ansoft HFSS, Agilent ADS and the IntelliSuite software respectively. Through these simulation and analysis, it is possible to obtain the optimized specification of micro tunable capacitor. The quality factor (Q) and the pull-in voltage extracted by simulation software well match to the measured results; thus, the function of the analysis method and equivalent model adopted in this thesis can be demonstrated.
目次 Table of Contents
摘要 I
Abstract II
誌謝 III
目錄 IV
圖目錄 VII
表目錄 X
第一章 緒論 1
1-1 前言 1
1-2 文獻回顧 3
1-3 研究動機及目的 7
第二章 微型可變電容器之理論介紹 8
2-1 微型可變電容器操作原理 8
2-1-1 電容器之功用 8
2-1-2 傳統平行板電容器之原理 9
2-1-3 微型可變電容器之操作原理 10
2-2 微型可變電容器調變原理 13
第三章 微型可變電容器之設計、模擬與分析 17
3-1 建立模型之重要性 17
3-2 設計流程及方式 18
3-2-1 設計流程 18
3-2-2 設計平台 19
3-3 結構設計 21
3-4 等效電路模型分析 21
3-5 三維實體模型建立 25
3-6 模擬結果分析 28
3-6-1 共振頻率分析 28
3-6-2 高頻分析 34
3-6-3 電場分佈 39
3-6-4 電荷分佈 41
3-6-5 吸附的影響 43
3-6-6 應力的影響 46
3-7 光罩設計 47
第四章 結果與討論 50
4-1 微型可變電容器特性量測分析 50
4-1-1 電容效應 50
4-1-2 電感效應 55
第五章 結論與建議 57
5-1 結論 57
5-2 建議 58
參考文獻 59
參考文獻 References
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[2] A. Dec and K. Suyama, “Micromachined varacators with wide tuning range,” IEEE transactions an microwave theory and techniques, Vol.46, No 12, pp. 2587-96, 1998.
[3] J. Zou, C. Liu, J. Schutt-Aine, J. H. Chen, and S. M. Kang, “Development of a wide tuning range MEMS tunable capacitor for wireless communication systems,” in IEDM Tech. Dig., 2000, pp.403-406.
[4] H. Nieminen, V. Ermolov, K. Nybergh, S. Silanto and T. Ryhanen,”Microelectromechanical capacitors for RF applications” J. Micromech. Microenng., 2002, 12, pp. 177-186.
[5] J. J. Yao, “RF MEMS from a device perspective,” J. Micromech. Microeng., Oct. 2000, R9-R38.
[6] J. Yoon and C. Nguyen, “A High-Q Tunable Micromechanical Capacitor with Movable Dielectric for RF Applications,” Technical Digest of the International Electron Device Meeting, 2000, pp.489-492.
[7] P. Monajemi and F. Ayazi, “A High-Q Low-Voltage HARPSS Tunable Capacitor,” Dig. IEEE MTT-S International Microwave Symposium (IMS 2005), Long Beach, CA, June 2005, pp. 749-752.

[8] A. Elshurafa and E. I. El-Masry, "Finite Element Modeling of Low Stress Suspension Structures and Applications in RF MEMS Parallel Plate Variable Capacitors," IEEE Transations On Microwave Theory and Techniques,Vol.54,No.5, MAY 2006. 2211.
[9] J. Yao, S. Park, and J. DeNatale, “High tuning ratio MEMS based tunable capacitors for RF communications,” in Tech. Dig. Sensors and Actuators Workshop, Hilton Head Island, SC, 1998, pp. 124-127.
[10] Z. Feng, H. Zhang, W. Zhang, B. Su, K. Gupta, V. Bright, and Y. Lee, “MEMS-based variable capacitor for millimeter-wave applications,” in Tech. Dig. Solid-State Sensors and Actuators Workshop, Hilton Head Island, SC, 2000, PP. 255-258.
[11] A. Dec and K. Suyama, “Micromachined electro - mechanically
tunable capacitors and their applications to RF ICs,” IEEE Trans.
Microwave Theory Tech., pp. 2587-2595, Dec. 1998.
[12] R. Castello, P. Erratico, S. Manzini, and F. Svelto, “A 30% tuning range varactor compatible with future scaled technologies,” in Symp. VLSI Circuits, 1998, pp. 34-35.
[13] 刑泰剛,「微機電技術在無線通訊領域之發展」,工業技術研究院材料研究所,2001年3月。
[14] 「微機電技術與應用」,行政院國家科學委員會精密儀器發展中心出版,2003年。
[15] 黃俊宏,「應用於電壓控制震盪器之三層多晶矽可變電容之設計」,交通大學電機與控制工程學系碩士論文,2002年
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