在這個研究裡，低溫高壓氧(臭氧)可以有效改善低溫成長金屬氧化物的介電特性。在實驗中利用sputter在常溫下沉積厚度大約為5nm的HfO2和ZrO2，再使用低溫處理技術來取代傳統高溫退火。而經
過UV光照射下，氧反應形成臭氧，在文獻上臭氧的氧化能力是比氧來的強，藉由高氧化力的臭氧可以進一步抑制漏電流以及改善電容特性。由XPS材料分析指出經過高氧化力的臭氧處理是可以有效增強Hf-O-Hf及Zr-O-Zr的鍵結，由於缺陷的減少，漏電流降為10-8，而載子傳輸機制也由原來的trap-assisted tunneling 轉變Schottky thermal emission 主導。
所有的實驗流程都是控制在150度下，這種低溫高壓氧及利用高氧化力的臭氧來改善介電質的技術是相當新穎的，將來也有機會應用於對低溫製程有很大的要求的可撓式基板上。

In this study, high-pressure oxygen (O2 and O3) technologies were employed originally to effectively improve the properties of low-temperature-deposited metal oxide dielectric films. In this work, 5 nm ultra-thin HfO2 and ZrO2 films were deposited by sputtering method at room temperature. Then, the low temperature high-pressure oxygen treatments at 150 °C were used to replace the conventional high temperature annealing for HfO2 and ZrO2 improvement. From the experimental results, O3 produced by UV light illumination in O2 ambient has the superior passivation ability than O2, and it can further suppress leakage current density and improve capacitance characteristics.
According to the XPS analyses, the absorption peaks of Hf-O and Zr-O bonding energies apparently raise and the quantity of oxygen in HfO2 and ZrO2 film also increases from XPS measurement. In addition, both the leakage current density of 5nm HfO2 and ZrO2 film can be improved to 10-8 A/cm2 at |Vg| = 3 V, and the conduction mechanisms were transferred from trap-assisted tunneling to thermal emission because of the significantly reduction of defects.
All the experiment processes in this study, the temperatures were controlled below 150 °C. The proposed low-temperature and high pressure O2 or O3 treatment for improving high-k dielectric films is novel and applicable for the future flexible electronics.

English Abstract　 --------------------------i
Chinese Abstract　 ------------------------ iii
Chinese Acknowledgment　------------------ iv
Contents　 ------------------------------------------ v
Table Captions　---------------------------------- vii
Figure Captions　-------------------------------- viii
Chapter 1 Introduction
1.1 Gate dielectric　------------------------------------------------------------------- 1
1.2 Requirement of an alternative gate dielectric --------------------------------- 2
1.3 Motivation　 ------------------------------------------------------------------------ 3
Chapter 2 Low-Temperature Enhancement of Sputter-Deposited HfOx Films by high-pressure oxygen treatment
2.1 Fabrication of Metal-Insulator-Silicon (MIS) and Experiment Process　--- 5
2.2 Analysis of Material and Discussion　 -----------------------------------------5
2.2.1 X-ray Photoelectron Spectroscopy (XPS) Analysis　------------------6
2.2.2 Transmission Electron Microscopy (TEM) Analysis 　-------------- 7
2.3 Analysis of Electrical Characteristics and Discussion　 -------------- 7
2.3.1 The current density-voltage (J-V) characteristics　 ------------------ 7
2.3.2 Conduction Mechanism 　------------------------------------------------ 8
2.3.3 The capacitance-voltage (C-V) characteristics --------------------12
2.4 Summary 　----------------- 13
Chapter 3 Low-Temperature Enhancement of Sputter-Deposited ZrOx Films by high-pressure oxygen treatment
3.1 Fabrication of Metal-Insulator-Silicon (MIS) and Experiment Process　- 14
3.2 Analysis of Material and Discussion　 ---------------------------------------- 14
3.2.1 X-ray Photoelectron Spectroscopy (XPS) Analysis　----------------- 14
3.2.2 Transmission Electron Microscopy (TEM) Analysis 　-------------- 15
3.3 Analysis of Electrical Characteristics and Discussion　 ------------------ 16
3.3.1 The current density-voltage (J-V) characteristics　 ------------------ 16
3.3.2 Conduction Mechanism 　------------------------------------------------ 16
3.3.3 The capacitance-voltage (C-V) characteristics ----------------------- 18

Chapter 4 conclusion----------------------------------------------------------20

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