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論文名稱 Title |
以電漿輔助分子束磊晶於矽(111)基板形成氮化鎵奈米柱之成長與分析 Growth and Characterization of GaN Nanorods Grown on Si(111) Substrate by Plasma-assisted Molecular Beam Epitaxy |
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系所名稱 Department |
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畢業學年期 Year, semester |
語文別 Language |
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學位類別 Degree |
頁數 Number of pages |
169 |
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研究生 Author |
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指導教授 Advisor |
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召集委員 Convenor |
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口試委員 Advisory Committee |
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口試日期 Date of Exam |
2004-09-30 |
繳交日期 Date of Submission |
2004-10-13 |
關鍵字 Keywords |
氮化鎵、奈米柱、分子束磊晶、拉曼、電子顯微鏡、光致螢光、奈米結構 Raman, MBE, nanostructure, nanorod, EM, PL, GaN |
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統計 Statistics |
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中文摘要 |
幾近於無錯位的氮化鎵奈米柱利用自組式方式經由分子束磊晶法成長於矽(111)基板上,奈米柱的成長沒有使用任何的催化劑輔助,在不同的成長條件下,這些奈米柱的寬度維持在10 nm 至大約 800 nm,而在薄膜之上的高度則介於50 nm 至 3 |
Abstract |
Nearly dislocation-free vertical GaN pillars in nanoscale were grown on Si (111) surface through self-assembly by molecular-beam epitaxy. No extra catalytic or nanostructural assistance has been employed. These nanorods have a lateral dimension from 10 nm to ~ 800 nm and a height of 50 nm to 3 |
目次 Table of Contents |
中文提要………………………………………………………….I 中文摘要…………………………………………………………II Abstract………………………………………………..…………IV Contents…………………………………………………………VI Figure list…………………………………………………VIII Chapter 1 Introduction……………………………………………1 1.1 GaN base devices and semiconductor nanodevices…… 1 1.2 Fabrication of GaN nanomaterials…………………2 1.3 Research motivation…………………………………… 3 1.4 Organization of the thesis……………………………4 References…………………………………………………………6 Chapter 2 A brief review of growth and characterization techniques………...………………………………………….9 2.1 GaN nanorod growth………………………..…………………9 2.2 Reflection high-energy electron diffraction…………...11 2.3 Luminescence of semiconductor…………………………..13 2.4 Raman spectroscopy………………………………….………15 References………………………………………………………..19 Chapter 3 System setup and experimental procedures……30 3.1 System setup……………………………………………………30 3.1.1 Plasma-assisted molecular beam epitaxy system….30 3.1.2 Photoluminescence (PL) system……………………………31 3.1.3 Micro-Raman and micro-PL system…………………………31 3.2 Experimental procedures………………………………………32 3.2.1 Sample preparation…………………………………………32 3.2.2 GaN nanorod growth…………………………………………33 3.2.3 Analyses of GaN nanorods………………………………35 References………………………………………………………….36 Chapter 4 GaN nanorod growth……………………………………45 4.1 GaN nanorod grown without buffer layer…………………45 4.1.1 Different NBEP/GaBEP ratios………………………………45 4.1.2 Different substrate temperatures……………………51 4.1.3 Summary………………………………………………………53 4.2 GaN nanorod grown with GaN buffer layer…………………55 4.2.1 Different NBEP/GaBEP ratios………………………………55 4.2.2 Different GaN buffer layer temperatures………………57 4.2.3 Time evolution of GaN nanorods…………………………59 4.2.4 Summary…………………………………………………….64 References………………………………………………………..65 Chapter 5 Optical properties of GaN nanorod…………………94 5.1 Photoluminescence spectroscopy of GaN nanorod…………94 5.1.1 Temperature dependent PL spectroscopy…………………94 5.1.2 Physical property of luminescent emission at 3.425 eV……………….96 5.1.3 Summary……………………………………………………….97 5.2 Micro-Raman spectroscopy of a single free-standing GaN nanorod………98 5.2.1 First-order Raman modes of a single GaN nanorod……98 5.2.2 Laser-power-density dependent Raman spectroscopy…101 5.2.3 Physical property of nanorod related phonon mode102 5.2.4 Summary………………………………………………..103 References……………………………………………………..104 Chapter 6 Conclusions………………………………………124 Appendix A Cathodoluminescence spectroscopy of single freestanding GaN nanorod.…..………………………127 Appendix B Raman spectroscopy of GaN…………………………136 Appendix C InN grown on Si(111) and sapphire substrates by PAMBE………………………………………………144 |
參考文獻 References |
[1.1] H. Morkoc; and S. N. Mohammad, Science 267, 51 (1995). [1.2] I. Akasaki and H. Amano, J. Cryst. Growth 175/176, 29 (1997). [1.3] S. Nakamura, Science 281, 956 (1998). [1.4] Gallium Nitride (GaN) II, edited by J. I. Pankove and T. D. Moustakas (Academic, New York, 1999). [1.5] L. W. Tu, W. C. Kuo, K. H. Lee, P. H. Tsao, C. M. Lai, A. K. Chu, and J. K. Sheu, Appl. Phys. Lett. 77, 3788 (2000). [1.6] L. W. Tu, P. H. Tsao, K. H. Lee, I. Lo, S. J. Bai, C. C. Wu, K. Y. Hsieh, and J. K. Sheu, Appl. Phys. Lett. 79, 4589 (2001). [1.7] M. Yoshizawa, A. Kikuchi, N. Fujita, K. Kushi, H. Sasamoto, and K. Kishino, J. Cryst. Growth 189/190, 138 (1998). [1.8] E. Calleja, M. A. Śanchez-Garćia, F. J. Śanchez, F. Calle, F. B. Naranjo, and Muňoz, Phys. Rev. B 62, 16826 (2000). [1.9] T. Araki, Y. Chiba, M. Nobata, Y. Nishioka, and Y. Nanishi, J. Cryst. Growth 209, 368 (2000). [1.10] L. T. Romano and T. H. Myers, Appl. Phys. Lett. 71, 3486 (1997). [1.11] A. M. Morales and C. M. Lieber, Science 279, 208 (1998). [1.12] C. C. Chen, C. C. Yeh, C. H. Chen, M. Y. Yu, H. L. Liu, J. J. Wu, K. H. Chen, L. C. Chen, J. Y. Peng, and Y. F. Chen, J. Am. Chem. Soc. 123, 2791 (2001). [1.13] Y. Huang, X. Duan, Y. Cui, and C. M. Lieber, Nano Lett. 2, 101 (2002). [1.14] W. Han, S. Fan, Q. Li, and Y. Hu, Science 277, 1287 (1997). [1.15] J. Zhang, L. D. Zhang, X. F. Wang, C. H. Liang, X. S. Peng, and Y. W. Wang, J. Chem. Phys. 115, 5714 (2001). [1.16] M. He, P. Zhou, S. N. Mohammad, G. L. Harris, J. B. Halpern, R. Jacobs, W. L. Sarney, and L. Salamanca-Riba, J. Cryst. Growth 231, 357 (2001). [1.17] R. Birkhahn, R. Hudgins, D. Lee, A. J. Steckl, R. J. Molnar, A. Saleh, and J. M. Zavada, J. Vac. Sci. Technol. B 17, 1195 (1999). [1.18] J. C. Johnson, H. J. Choi, K. P. Knutsen, R. D. Schaller, P. Yang and R. J. Saykally , Nature materials 1, 106 (2002). [1.19] H. M. Kim, T. W. Kang, and K. S. Chung, Adv. Mater. 15, 567 (2003). [1.20] M. H. Huang, S. Mao, H. Feick, H. Yan, Y. Wu, H. Kind, E. Weber, R. Russo, and P. Yang, Scinece 292, 1879 (2001). [1.21] X. Duan, Y. Huang, R. Agarwai, and C. M. Lieber, Nature 421, 241 (2003). [1.22] Y. Cui, Q. Wei, H. Park, and C. M. Lieber, Science 293, 1289 (2001). [1.23] Y. Huang, X. Duan, Y.Cui, Lincoln, J. Lauhon, K. H. Kim and C. M. Lieber, Science 294, 1313 (2001). [1.24] J. Y. Li, X. L. Chen, Z. Y. Qiao, Y. G. Cao, and Y. C. Lan, J. Crystal Growth 213, 408 (2000). [1.25] W. Han, P. Redlich, F. Ernst, and M. Rühle, Appl. Phys. Lett. 76, 652 (2000). [1.26] X. Chen, J. Li, Y. Cao, Y. Lan, H. Li, M. He, C. Wang, Z. Zhang, and Z. Qiao, Adv. Mater. 12, 1432 (2000). [1.27]J. Goldberger, R. He, Y. Zhang, S. Lee, H. Yan, H. J. Choi, and P. Yang, Nature 422, 599 (2003). [1.28] H. M. Kim, D. S. Kim, D. Y. Kim, T. W. Kang, Y. H. Cho, and K. S. Chung, Appl. Phys. Lett. 81, 2193 (2002). [1.29] L. W. Tu, C. L. Hsiao, T. W. Chi, I. Lo, and K. Y. Hsieh, Appl. Phys. Lett. 82, 1601 (2003). [1.30] M. Yoshizawa, A. Kikychi, M. Mori, N. Fujita and K. Kishino, Jpn. J. Appl. Phys., Part 2 36 (1997) L459. [1.31] V. V. Mamutin, N. A. Cherkashin, V. A. Vekshin, V. N. Zhmerik and S. V. Ivanov, Phys. Solid State, 43 (2001) 151. [1.32] S. Fischer et al., J. Cryst. Growth. 189/190, 556 (1998). [2.1] R. S. Wagner and W. C. Ellis, Appl. Phys. Lett. 4 , 89 (1964). [2.2] Y. Wu and P. Yang, J. Am. Chem. Soc. 123, 3165 (2001). [2.3] E. A. Stach, P. J. Pauzauskie, T. Kuykendall, J. Goldberger, R. He and P. Yang, Nano Lett. 3 (2003) 867. [2.4] D. D. Koleske, A. E. Wickenden, R. L. Henry, J. C. Culbertson, and M. E. Twigg, J. Cryst. Growth 223, 446 (2001). [2.5] Z. A. Munir and A. W. Searcy, J. Chem. Phys. 42, 4223 (1965). [2.6] H. Z. Zhang, Y. C. Wang, X. Du, Z. G. Bai, J. J. Wang, D. P. Yu, Y. Ding, Q. L. Hang, and S. Q. Feng, Solid State Commun. 109, 677 (1999). [2.7] Z. W. Pan, Z. R. Dai, and Z. L. Wang, “Nanobelts of semiconducting oxides”, Science 291, 1947 (2001) [2.8] S. M. Zhou, Y. S. Feng, and L. D. Zhang, Chem. Phys. Lett. 369, 610 (2003). [2.9] E. Calleja, M. A. Śanchez-Garćia, F. J. Śanchez, F. Calle, F. B. Naranjo, and Muňoz, Phys. Rev. B 62, 16826 (2000). [2.10] M. Yoshizawa, A. Kikychi, M. Mori, N. Fujita and K. Kishino, Jpn. J. Appl. Phys. part 2 36, L459 (1997). [2.11] L. W. Tu, C. L. Hsiao, T. W. Chi, I. Lo, and K. Y. Hsieh, Appl. Phys. Lett. 82, 1601 (2003). [2.12] W. Braum, Applied RHEED, Springer, Berlin, (1999). [2.13] I. Hernández-Cadlderón and H. Höchst, Phys. Rev. B 27, 4961 (1983). [2.14] M. B. Panish and H. Temkin, Gas source molecular beam epitaxy, Springer-Verlag, Berlin, (1993). [2.15] B. G. Yacobi and D. B. Holt, Cathodoluminescence microscopy of inorganic solids, (Plenum press, New York and London, 1990). [3.1] M. B. Panish and H. Temkin, Gas source molecular beam epitaxy, Springer-Verlag, Berlin (1993). [3.2] P. L. A. Chr, M. V. D. Meer, L. J. Gilling, and S. G. Kroon, J. Appl. Phys. 46, 652 (1976). [3.3] S. M. Gates, P. R. Kunz, and C. M. Greenlief, Surf. Sci. 207, 364 (1989). [3.4] D. C. Streit and F. G. Allen, J. Appl. Phys. 61, 2894 (1987). [4.1] P. K. Larsen and P. J. Dobson, Reflection High-Energy Electron Diffraction and Reflection Electron Image of Surfaces, Plenum Press, New York, pp.475-499 (1988). [4.2] I. Hernández-Calderón and H. Höchst, Phys. Rev. B, 27 4961 (1983). [4.3] C. A. Arguello, D. L. Rousseau, and S. P. S. Porto, Phys. Rev. 181, 1351 (1969). [4.4] H. Siegle, L. Eckey, A. Hoffman, C. Thomsen, B. K. Meyer, D. Schikora, M. Hankelin, and K. Lischka, Solid State Comm 96, 943 (1995). [4.5] J. M. Wanger and F. Bechstedt, Appl. Phys. Lett.77, 346 (2000). [4.6] V. Y. Davydov, N. S. Averkiev, I. N. Goncharuk, D. K. Nelson, A. S. Polkovnikov, A. N. Smironv, M. A. Jacobson, and O. K. Semchinova, J. Appl. Phys. 82, 5097 (1997). [4.7] S. Tripathy, S. J. Chua, P. Chen, and Z. L. Miao, J. Appl. Phys. 92, 3503 (2002). [4.8] K. Kawasaki, D. Yamazaki, A. Kinoshita, K. Tsutsui, and Y. Aoyagi, Appl. Phys. Lett. 79, 2243 (2001). [4.9] C. W. Hu, B.Bell, F. A. Ponce, D. J. Smith, and I. S. T. Tsong, Appl. Phys. Lett. 81, 3236 (2002). [4.10] T. Zywietz, J. Neugebauer, and M. Scheffler, Appl. Phys. Lett. 73, 488 (1998). [4.11] F. Widmann, B. Daudin, G. Feuillet, Y. Samson, J. L. Rouviere, and N. Pelekanos , J. Appl. Phys. 83, 7618 (1998). [4.12] E. A. Stach, P. J. Pauzauskie, T. Kuykendall, J. Goldberger, and R. He, P. Yang, Nano Lett. 3, 867 (2003). [4.13] Z. Zhong, F. Qian, D. Wang, and M. Liber, Nano Lett. 3, 343 (2003). [4.14] S. Guha, N. A. Bojarczuk, and D. W. Kisker, Appl. Phys. Lett. 69, 2879 (1996). [4.15] B. Heying, I. Smorchkova, C. Poblenz, C. Elsass, P. Fini, S. D. Baars, U. Mishra and J. S. Speck, Appl. Phys. Lett. 77, 2885 (2000). [4.16] J. K. Tsai, I. Lo, K. L. Chuang, L. W. Tu, J. H. Huang, C. H. Hsieh and K. Y. Hsieh, J. Appl. Phys. 95, 460 (2004). [4.17] L. W. Tu, C. L. Hsiao, T. W. Chi, I. Lo and K. Y. Hsieh, Appl. Phys. Lett. 82, 1601 (2003). [4.18] H. Morko and S. N. Mohammad, Science 267, 51 (1995). [4.19] J. I. Pankove and T. D. Moustakas, Gallium Nitride (GaN) II, Academic Press, New York, 1999. [4.20] M. S. Gudiksen and C. M. Lieber, J. Am. Chem. Soc. 122, 8801(2000). [4.21] R. S. Wagner and W. C. Ellis, Appl. Phys. Lett. 4 , 89 (1964). [5.1] L. W. Tu, Y. C. Lee, D. Stocker, and E. F. Schubert, Phys. Rev. B 58, 10696 (1998). [5.2] L. W. Tu, Y. C. Lee, S. J. Chen, I. Lo, D. Stocker, and E. F. Schubert, Appl. Phys. Lett. 73, 2802 (1998). [5.3]Jacques I. Pankove, Optical processes in semiconductors, Dover publication, Inc. New York, (1975). [5.4]A. J. Fischer, W. Shan, and J. J. Song, Appl. Phys. Lett. 71, 1981 (1997). [5.5]G. D. Chen, M. Smith, J. Y. Lin, and H. X. Jiang, J. Appl. Phys. 79, 2675 (1996). [5.6]Y. Li and Y. Lu, Appl. Phys. Lett. 70, 2458 (1997). [5.7]S. Strite and H. Morkoc, J. Vac. Sci. Technol. B 10, 1237 (1992). [5.8] C. A. Arguello, D. L. Rousseau, and S. P. S. Porto, Phys, Rev. 181, 1351 (1969). [5.9] T. C. Damen, S. P. S. Porto, and B. Tell, Phys. Rev. 142, 570 (1966). [5.10] H. Harima, J. Phys.: Condens. Matter 14, R867 (2002). [5.11] H. Siegle, L. Eckey, A. Hoffmann, C. Thomsen, B. K. Meyer, D.Schikora, M. Hankeln, and K. Lischka, Solid State Comm. 96, 943 (1995). [5.12] T. Azuhata, T. Sota, K. Suzuki, and S. Nakarmura, J. Phys: Condens. Matter 7, L129 (1995). [5.13] M. Cardona, Light Scattering in Solids II , Springer, Berlin, Heidelberg, (1982). [5.14] M. S. Liu, L. A. Bursill, S. Prawer, K. W. Nugent, Y. Z. Tong, and G. Y. Zhang, Appl. Phys. Lett. 74, 3125 (1999). [5.15] M. Giehier, M. Ramsteiner, P. Waltereit, O. Brandt, K. H. Ploog, and H. Obloh, J. Appl. Phys. 89, 3634 (2001). [5.16] N. B. Colthup, L. H. Daly, and S. E. Wiberley, Introduction to Infrared and Raman Spectroscopy , Academic Press, New York, (1990). [5.17] H. D. Li, S. L. Zhang, H. B. Yang, G. T. Zou, Y. Y. Yang, K. T. Yue, X. H. Wu, and Y. Yan, J. Appl. Phys. 91, 4562 (2002). [5.18] W. Limmer, W. Ritter, R. Sauer, B. Mensching, C. Liu, and Rauschenbach, Appl. Phys. Lett. 72, 2589 (1998). [5.19] A. Bittar, H. J. Trodahl, N. T. Kemp, and A. Markwitz, Appl. Phys. Lett. 78, 619 (2001). [5.20] H. C. Van de Hulst, Light Scattering by Small Particles, Wiley, New York, (1957). |
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