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博碩士論文 etd-1024114-155855 詳細資訊
Title page for etd-1024114-155855
論文名稱
Title
以化學汽相沉積法生長高品質(0001)氧化鋅薄膜於(001)鎵酸鋰基板
Growth of high quality (0001) ZnO Films on (001) LiGaO2 Substrate by Chemical Vapor Deposition
系所名稱
Department
畢業學年期
Year, semester
語文別
Language
學位類別
Degree
頁數
Number of pages
73
研究生
Author
指導教授
Advisor
召集委員
Convenor
口試委員
Advisory Committee
口試日期
Date of Exam
2014-11-06
繳交日期
Date of Submission
2014-11-24
關鍵字
Keywords
鎵酸鋰、化學汽相沉積法、磊晶薄膜、氧化鋅
ZnO, LiGaO2, Chemical Vapor Deposition, epitaxy film.
統計
Statistics
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The thesis/dissertation has been browsed 5669 times, has been downloaded 53 times.
中文摘要
本論文研究使用化學汽相沉積法 (Chemical Vapor Deposition,CVD),磊晶成長(0001)氧化鋅(Zinc Oxide, ZnO)於(001)鎵酸鋰(LiGaO2, LGO)基板,以乙醯丙酮鋅 Zinc 2,4-pentanedionate monohydrate [Zn(C5H7O2)2.H2O] 作為鋅的前驅物(Precursor),使用高純度氧氣為反應氣體,氮氣為載流氣體。
試片以化學汽相沉積法生長後使用X光繞射儀(X-Ray Diffractometer, XRD)、掃描式電子顯微鏡(Scanning Electron Microscope, SEM)、光致螢光光譜儀 (Photoluminescence Spectroscope, PL)、原子力顯微鏡(Atomic Force Microscope, AFM)、拉曼光譜儀(Raman Spectroscope)和穿透式電子顯微鏡(Transmission Electron Microscope, TEM)來分析其結晶方向、結晶性質、表面形貌、光學性質、材料內部應力、表面粗糙度和微結構的情況,觀察氧化鋅薄膜之成長情形。
本實驗主要可分為四部分。第一部分探討不同成長壓力,觀察氧化鋅薄膜之變化。第二部分為探討在不同的成長溫度,氧化鋅薄膜之變化。第三部分為探討在氣體總流量固定時,改變反應氣體(氧氣)與載流氣體(氮氣)比,氧化鋅薄膜之變化。第四部分為改變成長時間,進而探討觀察氧化鋅薄膜之變化。
本論文中改良實驗方式,採用磁控「移動舟」之設計,使磊晶氧化鋅薄膜過程可以精準控制起始與結束,並從試片分析中得到優良的氧化鋅薄膜品質,不論是薄膜結晶性質、表面粗糙度、光學性質等均有提昇。
Abstract
In this thesis, epitaxial (0001) ZnO films were grown by chemical vapor deposition (CVD) method on LiGaO2 (LGO) (001) substrate. Zinc Acetylacetonate was used as precursor. High purity oxygen and nitrogen were used as reaction gas and carrier gas, respectively
After CVD reaction, we utilized x-ray diffractometer, scanning electron microscope, photoluminescence spectroscope, atomic force microscope, Raman Spectroscope and Transmission Electron Microscope to analyze ZnO films characteristics such as crystal structure, crystal quality, surface morphology, optical properties, residual stress, surface roughness and micro-structure properties.
The experiment has four parts. First, the dependence of growth characteristics of different growth pressures were investigated. Second, ZnO films growth under various temperatures were investigated. In the third part, the dependence of growth characteristics in different oxygen partial pressures were investigated. In last part, the dependence of ZnO film growth time were investigated.
To ensure the experimental process can be precisely controlled. Experimental method was modified by utilizing "mobile quartz boat" device. From sample analysis, we found that the ZnO films have excellent epitaxial quality. The crystallinity, surface roughness and optical properties were also improved by AFM and PL evidently.
目次 Table of Contents
致謝................................................................ ii
摘要................................................................iv
Abstract............................................................. v
目錄.................................................................vi
圖目錄............................................................. viii
表目錄.............................................................. xi
第一章 序論........................................................ 1
第二章 文獻回顧與理論基礎.......................................... 3
2.1 氧化鋅的結構與性質.............................................. 3
2.1.1 氧化鋅發光機制....................................... 5
2.1.2 氧化鋅磊晶薄膜的應用..................................... 6
2.2 鎵酸鋰的結構與性質.............................................. 7
2.3 化學汽相沉積法................................................. 11
2.4 異質磊晶成長................................................... 13
2.5 研究動機....................................................... 15
第三章 實驗內容.................................................. 16
3.1 實驗流程....................................................... 16
3.2 實驗裝置....................................................... 17
3.3 實驗方法與參數......................................,,,........ 18
3.4 量測設備簡介................................................... 21
第四章 實驗結果與討論............................................. 25
4.1 成長溫度對氧化鋅磊晶薄膜的影響................................. 25
4.1.1 X光繞射(X-ray Diffraction)分析 .............................. 25
4.1.2 掃描式電子顯微鏡(Scanning Electron Microscope)表面形貌分析.... 27
4.2 成長壓力對氧化鋅磊晶薄膜的影響................................. 29
4.2.1 X光繞射(X-ray Diffraction)分析............................. 30
4.2.1 掃描式電子顯微鏡(Scanning Electron Microscope)表面形貌分析.... 32
4.3 氣體流量比對氧化鋅磊晶薄膜的影響............................... 34
4.3.1 X光繞射(X-ray Diffraction)分析............................... 35
4.3.2 掃描式電子顯微鏡(Scanning Electron Microscope)表面形貌分析.... 37
4.4 成長時間對氧化鋅磊晶薄膜的影響................................. 40
4.4.1 X光繞射(X-ray Diffraction)分析............................... 40
4.4.2 掃描式電子顯微鏡(Scanning Electron Microscope)表面形貌分析.... 42
4.5 光致螢光光譜分析............................................... 44
4.6 原子力顯微鏡分析............................................... 46
4.7 拉曼光譜分析................................................... 47
4.8 穿透式電子顯微鏡分析........................................... 49
第五章 結論....................................................... 55
參考文獻........................................................... 57


圖2-1 氧化鋅結構示圖...............................................4
圖2-2 氧化鋅能帶與激子能階示意圖...................................6
圖2-3 LiGaO2單位晶格.............,,...............................8
圖2-4 在500°C生長試片之 rocking curves.........................9
圖2-5 氧化鋅磊晶薄膜在不同溫度LGO基板之PL光譜圖.................9
圖2-6 氧化鋅磊晶薄膜在不同溫度LGO基板之AFM影像圖...............10
圖2-7 (a),(b)為C面氧化鋅沉積在(001)LGO AFM影像圖..................10
圖2-8 化學汽相沉積法(Chemical Vapor Deposition)磊晶機制示意圖..........12
圖2-9 磊晶薄膜成長模式. ............................................14
圖3-1 實驗流程圖...................................................17
圖3-2 化學汽相沉積法(Chemical Vapor Deposition)裝置示意圖..............18
圖3-3 實驗之LGO基板 (002) rocking curve 半高寬圖.....................19
圖3-4 實驗之LGO基板AFM影像圖....................................19
圖3-5 實驗溫度變化曲線圖...........................................20
圖3-6 磁控移動舟示意圖.............................................21
圖4-1 成長壓力50 torr(試片A01)、150 torr(試片A02)、300 torr(試片A03)、450torr(試片A04)之θ-2θ掃描X-ray繞射圖譜 ...........................26
圖4-2 成長壓力50 torr(試片A01)、150 torr(試片A02)、300 torr(試片A03)、450 torr (試片A04)之rocking curve圖譜........................................26
圖4-3 成長壓力(a)50 torr(A01)、(b)150 torr(A02)、(c)300 torr(A03)、(d)450 torr (A04)之氧化鋅磊晶薄膜二次電子影像....................................27
圖4-4 成長溫度525°C(試片B01)、575°C (試片A03)、625°C (試片B02)、675°C (試片B03)之θ-2θ掃描X-ray繞射圖譜...................................31
圖4-5 成長溫度525°C(試片B01)、575°C (試片A03)、625°C (試片B02)、675°C (試片B03)之 rocking curve圖譜.........................................31
圖4-6 成長溫度(a)525°C(試片B01)、(b)575°C (試片A03)、(c)625°C (試片B02)、(d)675°C (試片B03)之氧化鋅磊晶薄膜二次電子影像...................32
圖4-7 氧氣分壓100 sccm(試片C01)、250sccm(試片C02)、500sccm(試片A03)、750sccm(試片C03) 、1000sccm(C04)之θ-2θ掃描X-ray繞射圖譜.............36
圖4-8 氧氣分壓100 sccm(試片C01)、250sccm(試片C02)、500sccm(試片A03)、750sccm(試片C03) 、1000sccm(C04)之rocking curve圖譜....................36
圖4-9 氧氣分壓(a)100 sccm(試片C01)、(b)250sccm(試片C02)、(c)500sccm(試片A03)、(d)750sccm(試片C03) 、(E)1000sccm(C04)之氧化鋅磊晶薄膜二次電子影像................................................................37
圖4-10 成長時間60min(試片D01) 、120min(試片A03) 、360min(試片D02) 之θ-2θ掃描X-ray繞射圖譜...............................................41
圖4-11 成長時間60min(試片D01) 、120min(試片A03) 、360min(試片D02) 之rocking curve圖譜.....................................................41
圖4-12 成長時間(a)60min(試片D01) 、(b)120min(試片A03) 、(c)360min(試片D02) 之氧化鋅磊晶薄膜二次電子影像...................................42
圖4-13 (001)LGO之PL光譜圖.........................................45
圖4-14 (a)試片B01、(b)試片A03、(c)試片B02及(d)試片B03之氧化鋅磊晶薄膜PL光譜圖..........................................................45
圖4-15 (a) 、(b)試片A03之AFM-2D及AFM-3D影像圖...................46
圖4-16 試片A03之氧化鋅磊晶薄膜與LGO基板之Raman光譜圖..........48
圖4-17 zone axis為ZnO[112 ̅0] 之TEM分析結果,(a)氧化鋅薄膜穿透式電子顯微鏡影像圖(b)LGO基板和氧化鋅薄膜界面之選區電子繞射圖........50
圖4-18 zone axis為ZnO[112 ̅0] 之TEM分析結果,(a) 氧化鋅薄膜穿透式電子顯微鏡影像圖(b) LGO基板和氧化鋅薄膜界面之選區電子繞射圖(c),(d)為g=0002之明視野影像及暗視野影像(e),(f)為g=11 ̅00之明視野影像及暗視野影像(g)LGO基板與氧化鋅之界面HRTEM影像(h)氧化鋅表面之HRTEM影像.................52

表2-1 氧化鋅與其他寬能隙半導體比較.................................. . 3
表2-2 氧化鋅性質................................................... 4
表2-3 LiGaO2熱膨脹係數表.......................................... 8
表4-1 以成長壓力為變異之實驗參數表............................... 25
表4-2 以成長溫度為變異之實驗參數表............................... 30
表4-3 以氣體流量比為變異之實驗參數表............................ 35
表4-4 以成長時間為變異之實驗參數表.............................. 40
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