我們以電鍍的方式沉積 CuInSe2 和CuIn1-xGaxSe2 於雙層鉬金屬的基板上，我們使用RF 濺鍍沉積雙層鉬金屬在鈉玻璃基板。首先我們實驗濺鍍鉬金屬，並且討論鉬金屬的特性，如何可以同時得到好的附著力與低電阻的背電極雙層鉬金屬。接著，以電鍍方式沉積CuInSe2 和CuIn1-xGaxSe2 薄膜，我們分別針對電鍍時間、溶液酸鹼值、電鍍電流大小與電鍍溶液濃度，討論對CuInSe2 和CuIn1-xGaxSe2薄膜的影響。

We deposited CuInSe2 or CuIn1-xGaxSe2 on the substrate of bi-layer Mo by electrodeposition. Besides, we deposited bi-layer Mo by RF sputtering on soda-lime glass. First, we discussed the characteristic of Mo metal, and how can we have a good adhesion and a low resistivity simultaneously. Then, we deposited CuInSe2 and CuIn1-xGaxSe2 thin film by electrodeposition, and discussed the effect of depositing time, pH value in depositing solution, depositing current and different concentration
ions respectively.

論文審定書.....................................................................................................................i
Abstract (中).................................................................................................................ii
Abstract (英)................................................................................................................iii
Chapter 1
Introduction ………………………….……………………………………………1
1-1 Energy..............................................................................................................1
1-2 The theroy of solar cell....................................................................................3
1-2.1 The Solar Spectrum..............................................................................3
1-2.2 The theroy of operating solar cell.........................................................5
1-3 Solar cell..........................................................................................................8
1-4 CuInSe2 solar cell...........................................................................................11
1-4.1 The structure of CuInSe2 solar cell.....................................................11
1-4.2 Preparation of CuIn1-xGaxSe2 solar cell..............................................26
1-5 The theroy of electrodeposition.....................................................................29
1-5.1 The setup of electrodeposition…………………….………………30
1-6 Motivationv....................................................................................................31
Chapter 2
Experiment…………………………………………………………………………33

2-1 Preparation of soda-lime glass.......................................................................33
2-2 Mo contact by RF sputtering..........................................................................33
2-2.1 Preparation of Mo contact...................................................................33
2-2.2 Sputtering mechanism.........................................................................34
2-2.3 System of RF sputtering......................................................................35
2-3 Preparation of electrodeposited CuInSe2 and CuIn1-xGaxSe2 solution…...…37
2-3.1 Parameters of electrodeposited solution ............................................38
2-3.2 Setup of electrodeposition...................................................................39
2-4 Physical and chemical properties...................................................................41
Chapter 3
Result and Discussion …………………………………..…………………………42
3-1 Preparation of Bi-layer Mo…………………………………………………42
3-2 Effect of deposited current to thin film in solution........................................48
3-3 Effect of deposited time to thin film in solution............................................49
3-4 Effect of pH value to thin film in solution.....................................................50
3-5 Effect of ion concentration to thin film in solution........................................51
Chapter 4
Conclusion...................................................................................................................53
Reference……………………………………………………………………………54

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